Microelectronic Engineering

Papers
(The H4-Index of Microelectronic Engineering is 21. The table below lists those papers that are above that threshold based on CrossRef citation counts [max. 250 papers]. The publications cover those that have been published in the past four years, i.e., from 2021-06-01 to 2025-06-01.)
ArticleCitations
Stress measurement based on magnetic Barkhausen noise for thin films66
A 10 kHz bandwidth low-power active negative feedback front-end amplifier based on unipolar IZO TFT technology53
Optimizing dose parameters for enhanced maskless lithography in MoS2-based devices47
Growth chemistry and electrical performance of ultrathin alumina formed by area selective vapor phase infiltration40
Evolution of etch profile of <111> silicon in HNA solution37
A novel process for adjusting the gate-drain spacing in InP-HEMTs with34
Editorial Board32
The effect of switching and cycle-to-cycle variations of RRAM on 4-bit encryption/decryption process30
A simulation study of grayscale ice lithography for spiral phase plates in near infrared wavelengths30
Neural network for in-sensor time series recognition based on optoelectronic memristor29
Plasma surface treatment of GeSn layers and its subsequent impact on Ni / GeSn solid-state reaction28
CMOS-compatible GaN-based high electron mobility transistors with gate-first technology28
Humidity-dependent synaptic characteristics in gelatin-based organic transistors26
A dual-mass fully decoupled MEMS gyroscope with optimized structural design for minimizing mechanical quadrature coupling26
Experimental and theoretical insights into electronic properties of oxygen-doped MoTe2 field effect transistor24
Optimization of edge bead removal (EBR) process to enhance defect reduction in optical lithography24
A novel and reliable approach for controlling silicon membrane thickness with smooth surface23
Simulation and optimization of reactor airflow and magnetic field for enhanced thin film uniformity in physical vapor deposition23
Impact of interfacial trap states on achieving bias stability in polymer field-effect transistors23
Selective functionalization of silicon nitride with a water-soluble etch-resistant polymer22
Stable electrospray signal on a microfabricated glass chip with three-dimensional open edge and tiered depth geometries21
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