OOIR: Observatory of International Research

Papers

(The H4-Index of Microelectronic Engineering is 22. The table below lists those papers that are above that threshold based on CrossRef citation counts [max. 250 papers]. The publications cover those that have been published in the past four years, i.e., from 2021-11-01 to 2025-11-01.)

Article	Citations
Neural network for in-sensor time series recognition based on optoelectronic memristor	74
Advanced gallium nitride high electron mobility transistors for biosensing applications: Progress, challenges, and future perspectives	64
A simulation study of grayscale ice lithography for spiral phase plates in near infrared wavelengths	62
Editorial Board	50
Evolution of etch profile of <111> silicon in HNA solution	39
Plasma surface treatment of GeSn layers and its subsequent impact on Ni / GeSn solid-state reaction	38
CMOS-compatible GaN-based high electron mobility transistors with gate-first technology	38
A 10 kHz bandwidth low-power active negative feedback front-end amplifier based on unipolar IZO TFT technology	37
Growth chemistry and electrical performance of ultrathin alumina formed by area selective vapor phase infiltration	37
Stress measurement based on magnetic Barkhausen noise for thin films	35
The effect of switching and cycle-to-cycle variations of RRAM on 4-bit encryption/decryption process	35
Humidity-dependent synaptic characteristics in gelatin-based organic transistors	33
Optimizing dose parameters for enhanced maskless lithography in MoS2-based devices	32
A dual-mass fully decoupled MEMS gyroscope with optimized structural design for minimizing mechanical quadrature coupling	31
The role of etching gas purity in C4F8/Ar plasma to optimize SiO2 etching process	29
A novel and reliable approach for controlling silicon membrane thickness with smooth surface	27
Stable electrospray signal on a microfabricated glass chip with three-dimensional open edge and tiered depth geometries	26
Simulation and optimization of reactor airflow and magnetic field for enhanced thin film uniformity in physical vapor deposition	26
Research on stress mutation of fiber optic gyroscope	26
Optimization of edge bead removal (EBR) process to enhance defect reduction in optical lithography	24
Experimental and theoretical insights into electronic properties of oxygen-doped MoTe2 field effect transistor	23
Selective functionalization of silicon nitride with a water-soluble etch-resistant polymer	22