OOIR: Observatory of International Research

Papers

(The H4-Index of Microelectronic Engineering is 22. The table below lists those papers that are above that threshold based on CrossRef citation counts [max. 250 papers]. The publications cover those that have been published in the past four years, i.e., from 2022-05-01 to 2026-05-01.)

Article	Citations
Neural network for in-sensor time series recognition based on optoelectronic memristor	87
The effect of switching and cycle-to-cycle variations of RRAM on 4-bit encryption/decryption process	74
Digital filter on FPGA for subcellular resolution electrophysiology using a high-density CMOS-based microelectrode array	57
A 10 kHz bandwidth low-power active negative feedback front-end amplifier based on unipolar IZO TFT technology	50
Editorial Board	46
Growth chemistry and electrical performance of ultrathin alumina formed by area selective vapor phase infiltration	44
CMOS-compatible GaN-based high electron mobility transistors with gate-first technology	43
Optimizing dose parameters for enhanced maskless lithography in MoS2-based devices	41
Stress measurement based on magnetic Barkhausen noise for thin films	39
Advanced gallium nitride high electron mobility transistors for biosensing applications: Progress, challenges, and future perspectives	39
A dual-mass fully decoupled MEMS gyroscope with optimized structural design for minimizing mechanical quadrature coupling	32
Humidity-dependent synaptic characteristics in gelatin-based organic transistors	30
A simulation study of grayscale ice lithography for spiral phase plates in near infrared wavelengths	29
Performance enhancement of InSnZnO thin-film transistors by dual-active-layer architecture with various oxygen flow rates	28
The role of etching gas purity in C4F8/Ar plasma to optimize SiO2 etching process	27
Selective functionalization of silicon nitride with a water-soluble etch-resistant polymer	26
Spin coating in semiconductor lithography: Advances in modeling and future prospects	25
Optimization of edge bead removal (EBR) process to enhance defect reduction in optical lithography	25
Stable electrospray signal on a microfabricated glass chip with three-dimensional open edge and tiered depth geometries	23
Comprehensive statistical analysis of random telegraph noise: Impact of gate voltage, temperature, and Bias time	23
Simulation and optimization of reactor airflow and magnetic field for enhanced thin film uniformity in physical vapor deposition	22
Research on stress mutation of fiber optic gyroscope	22