Microelectronic Engineering

Papers
(The H4-Index of Microelectronic Engineering is 22. The table below lists those papers that are above that threshold based on CrossRef citation counts [max. 250 papers]. The publications cover those that have been published in the past four years, i.e., from 2021-08-01 to 2025-08-01.)
ArticleCitations
Stress measurement based on magnetic Barkhausen noise for thin films70
Optimizing dose parameters for enhanced maskless lithography in MoS2-based devices58
Growth chemistry and electrical performance of ultrathin alumina formed by area selective vapor phase infiltration55
Evolution of etch profile of <111> silicon in HNA solution44
Editorial Board39
A simulation study of grayscale ice lithography for spiral phase plates in near infrared wavelengths36
Neural network for in-sensor time series recognition based on optoelectronic memristor34
The effect of switching and cycle-to-cycle variations of RRAM on 4-bit encryption/decryption process33
Plasma surface treatment of GeSn layers and its subsequent impact on Ni / GeSn solid-state reaction32
A 10 kHz bandwidth low-power active negative feedback front-end amplifier based on unipolar IZO TFT technology32
CMOS-compatible GaN-based high electron mobility transistors with gate-first technology30
A dual-mass fully decoupled MEMS gyroscope with optimized structural design for minimizing mechanical quadrature coupling29
Selective functionalization of silicon nitride with a water-soluble etch-resistant polymer28
A novel and reliable approach for controlling silicon membrane thickness with smooth surface28
Humidity-dependent synaptic characteristics in gelatin-based organic transistors28
Simulation and optimization of reactor airflow and magnetic field for enhanced thin film uniformity in physical vapor deposition27
Optimization of edge bead removal (EBR) process to enhance defect reduction in optical lithography25
Stable electrospray signal on a microfabricated glass chip with three-dimensional open edge and tiered depth geometries25
Experimental and theoretical insights into electronic properties of oxygen-doped MoTe2 field effect transistor24
Spin coating in semiconductor lithography: Advances in modeling and future prospects23
Local strain modification effects on global properties of AlGaN/GaN high electron mobility transistors22
Static and dynamic interaction between polyvinyl acetal brushes and flat surfaces—Measuring near-surface brush volume ratio and nodule volume change for moving brushes22
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