Journal of Vacuum Science & Technology A

Papers
(The median citation count of Journal of Vacuum Science & Technology A is 1. The table below lists those papers that are above that threshold based on CrossRef citation counts [max. 250 papers]. The publications cover those that have been published in the past four years, i.e., from 2021-06-01 to 2025-06-01.)
ArticleCitations
Implementation of an artificial spiking neuron with photoreceptor functionality using gas discharge tubes89
Correlating chemical and electronic states from quantitative photoemission electron microscopy of transition-metal dichalcogenide heterostructures71
Role of nanoscale surface defects on Sn adsorption and diffusion behavior on oxidized Nb(100)47
Study of synthesis strategies to improve the electrical properties of magnetron sputtered copper oxide thin films41
Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition39
Use of in situ electrical conductance measurements to understand the chemical mechanisms and chamber wall effects during vapor phase infiltration doping of poly(aniline) with TiCl4 + H2O39
Size distribution of clusters and nucleation preference of trimers during SiC (0001) surface epitaxial growth under low coverage36
Conformal coating of macroscopic nanoparticle compacts with ZnO via atomic layer deposition35
Peak intensities in Auger electron spectroscopy for quantification: Relationship between differentiated spectral intensities and direct peak areas34
Nitrogen-incorporated tetrahedral amorphous carbon optically transparent thin film electrode27
Kinetic Monte Carlo study on the effect of growth conditions on the epitaxial growth of 3C–SiC (0001) vicinal surface27
Zirconia-titania-doped tantala optical coatings for low mechanical loss Bragg mirrors26
Erratum: “MoS2-assisted growth of highly-oriented AlN thin films by low-temperature van der Waals epitaxy” [J. Vac. Sci. Technol. A 42, 050401 (2024)]26
Friction and wear behavior of C implanted copper via ion beam-assisted bombardment26
Tailoring structure, morphology, and tribo-mechanical properties of HiPIMS-deposited CrxNy coatings for enhanced performance in wear and corrosion protection26
Erratum: “Microscopic origins of radiative performance losses in thin-film solar cells at the example of (Ag,Cu)(In,Ga)Se2 devices” [J. Vac. Sci. Technol. A 42, 022803 (2024)]25
High crystalline quality homoepitaxial Si-doped β-Ga2O3(010) layers with reduced structural anisotropy grown by hot-wall MOCVD25
Enhancing chemical vapor deposition growth and fabrication techniques to maximize hole conduction in tungsten diselenide for monolithic CMOS integration25
On the interplay between a novel iron and iron-carbide atomic layer deposition process, the carbon nanotube growth, and the metal–carbon nanotube coating properties on silica substrates24
Retarded solid state dewetting of thin bismuth films with oxide capping layer24
Using auxiliary electrochemical working electrodes as probe during contact glow discharge electrolysis: A proof of concept study22
Novel principal component analysis tool based on python for analysis of complex spectra of time-of-flight secondary ion mass spectrometry22
Self-powered solar blind ultraviolet photodetector based on amorphous (In0.23Ga0.77)2O3/bixbyite (In0.67Ga0.33)2O3 heterojunction20
Testing commonly used background removal procedures for XPS quantitation of homogeneous material: Fe2O3, a transition metal oxide example20
Core-shell metallic nanotube arrays for highly sensitive surface-enhanced Raman scattering (SERS) detection19
Deposition of sputtered NiO as a p-type layer for heterojunction diodes with Ga2O318
Transport and trap states in proton irradiated ultra-thick κ-Ga2O318
Extreme atomic-scale surface roughening: Amino acids on Ag on Au(111)18
Applications and mechanisms of anisotropic two-step Si3N4 etching with hydrogen plasma conditioning18
In situ metal organic chemical vapor deposition of ultrathin sp2-bonded boron nitride dielectric on gallium nitride17
Aminosilane small molecule inhibitors for area-selective deposition: Study of substrate-inhibitor interfacial interactions17
Plasma enhanced atomic layer etching of high-k layers on WS217
High surface quality Y2SiO5 silicate-crystal waveguides etched by chlorine-based inductive coupled plasma reactive ion etching17
Understanding the unique optical and vibrational signatures of sequential infiltration synthesis derived indium oxyhydroxide clusters for CO2 absorption17
Comparing sputter rates, depth resolution, and ion yields for different gas cluster ion beams (GCIB): A practical guide to choosing the best GCIB for every application16
Effects of duty cycle and nitrogen flow rate on the mechanical properties of (V,Mo)N coatings deposited by high-power pulsed magnetron sputtering16
Hardness, adhesion, and wear behavior of magnetron cosputtered Ti:Zr-O-N thin films16
Analysis of pulsed direct current reactive magnetron sputtering on a silicon target16
Novel high-efficiency plasma nitriding process utilizing a high power impulse magnetron sputtering discharge15
Hot corrosion behavior of NiCoCrAlY laser cladding coating on 17-4PH stainless steel before and after high-current pulsed electron beam irradiation15
Enhancing minority carrier lifetime in Ge: Insights from HF and HCl cleaning procedures15
Nonpyrophoric alternative to trimethylaluminum for the atomic layer deposition of Al2O315
Enhanced plasma resistance of uniform ALD-Y2O3 thin films for chamber components’ coatings14
Anisotropic magnetoresistance and planar Hall effect in correlated and topological materials14
Amorphous carbon thin films: Mechanisms of hydrogen incorporation during magnetron sputtering and consequences for the secondary electron emission14
Dependence of persistent photoconductivity on the thickness of β-Ga2O3 thin film photodetectors on c-plane sapphire via magnetron sputtering14
Improved growth quality of epitaxial ZnTe thin films on Si (111) wafer with ZnSe buffer layer13
Silicon-ion implantation induced doping and nanoporosity in molecular beam epitaxy grown GaSb epitaxial films13
Detection of H2 facilitated by ionic liquid gating of tungsten oxide films13
Surface characterization of ultrathin atomic layer deposited molybdenum oxide films using high-sensitivity low-energy ion scattering13
Methyl-methacrylate based aluminum hybrid film grown via three-precursor molecular layer deposition13
Preparation of stable and highly hydrophobic coatings via one-step spray method and study of their anti-icing performance13
Depth profile reconstruction of YCrO3/CaMnO3 superlattices by near total reflection hard x-ray photoelectron spectroscopy13
Significance of plasma-surface interactions in the etch behavior of low-k materials12
Method for extracting the intrinsic diffusion coefficient from grain boundary diffusion depth profile12
Modeling scale-up of particle coating by atomic layer deposition12
Effect of the repeated application of First Contact™ polymer on xenon-difluoride passivated lithium fluoride on aluminum surfaces for space telescopes12
Design and fabrication of color-generating nitride based thin-film optical filters for photovoltaic applications12
Ordered deficient perovskite La2/3TiO3 films grown via molecular beam epitaxy12
Stability investigation of Eu3+ doped CaF2 thin film with ZnO coating under electron beam irradiation12
Surface temperature of a 2 in. Ti target during DC magnetron sputtering12
Structure and corrosion resistance of electron-beam-strengthened and micro-arc oxidized coatings on magnesium alloy AZ3112
In situ studies on atomic layer etching of aluminum oxide using sequential reactions with trimethylaluminum and hydrogen fluoride12
Ga+-focused ion beam damage in n-type Ga2O312
Evaluation of stress and elastic energy relief efficiency in a hard coating with a metal interlayer—Using TiN/Ti as a model system12
Band offsets at metalorganic chemical vapor deposited β-(AlxGa1−x)2O3/β-Ga2O3 interfaces—Crystalline orientation dependence12
Spin- and time-resolved photoelectron spectroscopy and diffraction studies using time-of-flight momentum microscopes12
Enhancement of CrN-polyetherimide adhesion by hardening substrate’s surface12
Adsorption mechanism of dimeric Ga precursors in metalorganic chemical vapor deposition of gallium nitride11
Engineering ordered arrangements of oxygen vacancies at the surface of superconducting La2CuO4 thin films11
Selective vapor sensors with thin-film MoS2-coated optical fibers11
Effect of atomic layer annealing in plasma-enhanced atomic layer deposition of aluminum nitride on silicon11
Comprehensive ion-molecule reactive collision model for processing plasmas11
Deposition of tungsten oxide films by reactive magnetron sputtering on different substrates11
Origin of enhanced thermal atomic layer etching of amorphous HfO211
Polydimethylsiloxane surface irradiated by nitrogen ions: Influence of low molecular fractions11
Enhancing laser-driven flyer velocity by optimizing of modulation period of Al/Ti reactive multilayer films11
Substrate induced composition change during Ge2Sb2Te5 atomic layer deposition and study of initial reactions on SiO2 surface10
Nucleation and quantum confinement of nano-platelet Bi2–Bi2Se310
Series resonance effects of a variable inductor termination on the nonpowered electrode in capacitively coupled plasmas10
Photoemission study of plutonium oxycarbide10
Correlation of interfacial and dielectric characteristics in atomic layer deposited Al2O3/TiO2 nanolaminates grown with different precursor purge times10
Plasma induced damage on AlGaN/GaN heterostructure during gate opening for power devices10
Preparation and hot corrosion properties of the AlCrFeCoNi0.5Si high-entropy alloy coating deposited by the air plasma spraying10
Radiation damage effects on electronic and optical properties of β-Ga2O3 from first-principles10
Comparison of triethylgallium and diethylgallium ethoxide for β-Ga2O3 growth by metalorganic vapor phase epitaxy10
Molybdenum erosion in iodine plasma at hollow cathode conditions10
Influence of annealing temperature of nickel oxide as hole transport layer applied for inverted perovskite solar cells9
Spatial atomic layer deposition: Transport-reaction modeling and experimental validation of film geometry9
Stoichiometry tuning of TaN films through ion treatment: Molecular dynamics study9
XPS investigation of monoatomic and cluster argon sputtering of zirconium dioxide9
Two step synthesis of ultrathin transition metal tellurides9
Erratum: “Ion beam assisted chemical vapor deposition of hybrid coatings—Process diagnostics and mechanisms” [J. Vac. Sci. Technol. A 39, 063003 (2021)]9
Plasma-enhanced atomic layer deposition of crystalline GaN thin films on quartz substrates with sharp interfaces9
Disclosing the response of the surface electronic structure in SrTiO3 (001) to strain9
Surface plasmon resonance is possible in an optical fiber tapered to a point9
Quantifying the resonant photoemission of radiation damaged Pu9
Metalorganic chemical vapor deposition of (100) β-Ga2O3 on on-axis Ga2O3 substrates9
Experimental study of transport properties of Weyl semimetal LaAlGe thin films grown by molecular beam epitaxy9
Chemical mechanism for nucleation enhancement in atomic layer deposition of Pt by surface functionalization9
In situ diagnostics of the Si etching structures profile in ICP SF6/C4F8 plasma: Macrostructures9
My times with Bill Wolfer9
Nitrogen ion-implanted resistive regions for edge termination of vertical Ga2O3 rectifiers9
Gliding arc discharge plasma treatment for promoting germination of wheat seed at low ambient temperature9
Probing copper-boron interactions in the Cu2B8− bimetallic cluster9
Room-temperature and high-quality HfO2/SiO2 gate stacked film grown by neutral beam enhanced atomic layer deposition9
Plasma enhanced atomic layer deposition of manganese nitride thin film from manganese amidinate and ammonia plasma9
Moisture barrier coating of AlN and Al2O3 multilayer film prepared by low-temperature atomic layer deposition9
Insight into the effect of coexistence of CO2 and H2 on stoichiometric and defective PuO2 surfaces hydriding from first-principles study9
Micromechanical properties of micro- and nanocrystalline CVD diamond thin films with gradient microstructures and stresses9
Optical emission spectroscopy and Langmuir probe studies of an intermediate pressure, supersonic microplasma jet deposition source9
Effect of additive type and amount on structural and mechanical properties of ZrO2/B4C/Al2O3/SiC added Al 1050 based composite structures produced by vacuum infiltration—Comparative study8
Room-temperature atomic layer deposition of iron oxide using plasma excited humidified argon8
Deposition rate and optical emissions in niobium oxide processes by reactive sputtering8
Scanning electron microscopy imaging of multilayer-doped GaN: Effects of surface band bending, surface roughness, and contamination layers on doping contrast8
Spatiotemporal evolution of excitation temperature of vacuum arcs by tomography8
Conformal and superconformal chemical vapor deposition of silicon carbide coatings8
Zn:DLC films via PECVD-HIPIMS: Evaluation of antimicrobial activity and cytotoxicity to mammalian cells8
On the growth kinetics, texture, microstructure, and mechanical properties of tungsten carbonitride deposited by chemical vapor deposition8
Uppsala and Berkeley: Two essential laboratories in the development of modern photoelectron spectroscopy8
Continuous wave laser-assisted evaporation of halide perovskite thin films from a single stoichiometric source8
High throughput multiplexing reactor design for rapid screening of atomic/molecular layer deposition processes8
Photoelectron diffraction: Early demonstrations and alternative modes8
Study of microstructure and mechanical properties of cBN coatings on nanocrystalline diamond transition layer prepared by magnetron sputtering8
Bio-tribocorrosion resistance of CoB–Co2B and Co2B layers on CoCrMo alloy8
Empirical analysis of a hollow cathode’s intensity distribution in the vacuum ultraviolet range8
In situ growth of ultrathin Y2O3 capping layers for Eu-organic thin films via atomic/molecular layer deposition8
Improved properties of atomic layer deposited ruthenium via postdeposition annealing8
Atomic layer deposition of transition metal chalcogenide TaSx using Ta[N(CH3)2]3[NC(CH3)3] precursor and H2S plasma8
Spin-related negative magnetoresistance in germanium films8
Gas source molecular epitaxy of Ge1−ySny materials and devices using high order Ge4H10 and Ge5H12 hydrides8
Precise control of time-varying effusion cell flux in molecular beam epitaxy8
Bottom angle control mechanism and optimization of slanted gratings for optical applications8
Quantification in high-energy resolution Auger electron spectroscopy; Proposal of a reference target convolution technique for direct spectra8
Effect of data preprocessing and machine learning hyperparameters on mass spectrometry imaging models8
Atomic step disorder on polycrystalline surfaces leads to spatially inhomogeneous work functions8
Low-temperature ALD of metallic cobalt using the CoCOhept precursor: Simulation-assisted process development for deposition on temperature sensitive 3D-structures8
High-quality GaN thin film deposition at low temperature by ECR plasma-assisted sputter deposition method and its dependence of sapphire substrate misorientation angle8
Thermal atomic layer etching of cobalt using sulfuryl chloride for chlorination and tetramethylethylenediamine or trimethylphosphine for ligand addition7
Self-assembled oligomeric structures of an asymmetric molecular linker; 4-isocyanophenyl disulfide on Au(111)7
Revealing the mechanism of interfacial adhesion enhancement between the SiO2 film and the GaAs substrate via plasma pre-treatments7
Shake loss intensities in x-ray photoelectron spectroscopy: Theory, experiment, and atomic composition accuracy for MgO and related compounds7
Comparison of three titanium-precursors for atomic-layer-deposited TiO2 for passivating contacts on silicon7
Microstructure and properties of laser cladding NiFeCrCoMo high entropy alloy coating on the surface of TP347 steel7
Transparent conductive properties of TiON thin films7
Link between cracking mechanisms of trilayer films on flexible substrates and electro-mechanical reliability under biaxial loading7
Theoretical analysis of thermal spikes during ion bombardment of amorphous silicon nitride surfaces7
Role of SiCl4 addition in CH3F/O2 based chemistry for Si3N4 etching selectively to SiO2, SiCO, and Si7
Optoelectronic properties of transparent oxide semiconductor ASnO3 (A = Ba, Sr, and Ca) epitaxial films and thin film transistors7
Surface treatment of TaN for sub-2 nm, smooth, and conducting atomic layer deposition Ru films7
Numerical ellipsometry: Artificial intelligence for rapid analysis of indium tin oxide films on silicon7
Preface for the special topic collection Honoring Dr. Art Gossard’s 85th Birthday and his Leadership in the Science and Technology of Molecular Beam Epitaxy7
Impact of working pressure on the crystallinity and mechanical properties of vanadium nitride coatings deposited in helium/nitrogen reactive plasma7
MOS structure with as-deposited ALD Al2O3/4H-SiC heterostructure with high electrical performance: Investigation of the interfacial region7
Operando study of the preferential growth of SiO2 during the dry thermal oxidation of Si0.60Ge0.40(001) by ambient pressure x-ray photoelectron spectroscopy7
Influence of HfO2 and SiO2 interfacial layers on the characteristics of n-GaN/HfSiOx capacitors using plasma-enhanced atomic layer deposition7
Low temperature epitaxial growth of Cantor-nitride thin films by magnetic field assisted magnetron sputtering7
Comparison of BCl3, TiCl4, and SOCl2 chlorinating agents for atomic layer etching of TiO2 and ZrO2 using tungsten hexafluoride7
Large redshift in photoluminescence of InAs/AlAs short-period superlattices due to highly ordered lateral composition modulation7
Effect of interface roughness on the tribo-corrosion behavior of diamond like carbon coatings on titanium alloy7
Effect of magnetic field on capacitively coupled plasma modulated by electron beam injection7
AI-guided frame prediction techniques to model single crystal diamond growth7
Polarized photoluminescence from Sn, Fe, and unintentionally doped β-Ga2O37
Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition7
Wear and corrosion resistance of zinc-oxide and zirconium-oxide coated WE43 magnesium alloy7
Effect of vacuum heat treatment on tribological properties of metal-doped CuS/MoS2 coating7
Microkinetic based growth and property modeling of plasma enhanced atomic layer deposition silicon nitride thin film7
Homogeneous high In content InxGa1−x N films by supercycle atomic layer deposition7
The growth of self-intercalated Nb1+xSe2 by molecular beam epitaxy: The effect of processing conditions on the structure and electrical resistivity7
Synthesis and electrical behavior of VO2 thin films grown on SrRuO3 electrode layers7
Crystallization kinetics during layer exchange of 28Si implanted Al films for fabrication of quantum computers: A theoretical model6
Foldable electrochromic NiO films6
Interaction of Mg with the ionic liquid 1-butyl-1-methylpyrrolidinium bis(trifluoromethylsulfonyl)imide—An experimental and computational model study of the electrode–electrolyte interface in post-lit6
In situ and ex situ quantification of nanoparticle fluxes in magnetron sputter inert gas condensation: A Cu nanoparticle case study6
Probing trade-off between critical size and velocity in cold-pray: An atomistic simulation6
Conduction band nonparabolicity, chemical potential, and carrier concentration of intrinsic InSb as a function of temperature6
A high-power impulse magnetron sputtering global model for argon plasma–chromium target interactions6
An examination of the performance of molecular dynamics force fields: Silicon and silicon dioxide reactive ion etching6
Plasma-enhanced atomic layer deposition of crystalline Ga2S3 thin films6
Insufficient reporting of x-ray photoelectron spectroscopy instrumental and peak fitting parameters (metadata) in the scientific literature6
Bacterial and corrosion resistance of polytetrafluoroethylene-silver composite coatings by magnetron sputtering6
Machine learning-based prediction of the electron energy distribution function and electron density of argon plasma from the optical emission spectra6
Practical guide on chemometrics/informatics in x-ray photoelectron spectroscopy (XPS). II. Example applications of multiple methods to the degradation of cellulose and tartaric acid6
Effect of fabrication processes before atomic layer deposition on β-Ga2O3/HfO2/Cr/Au metal–oxide–semiconductor capacitors6
Improved optical efficiency of GaAs-based infrared vertical-cavity surface-emitting laser enabled by combining a metallic reflector and a Bragg reflector6
Challenges in porosity characterization of thin films: Cross-evaluation of different techniques6
X-ray photoelectron spectroscopy study of Pt-cluster-induced electronic-state change of CeO2(111) surfaces6
XPS guide for insulators: Electron flood gun operation and optimization, surface charging, controlled charging, differential charging, useful FWHMs, problems and solutions, and advice6
Cu2O/ZnO heterojunction self-powered photodetector performance regulation6
Chemical significance of x-ray photoelectron spectroscopy binding energy shifts: A Perspective6
Fabrication of antireflective coatings with self-cleaning function using Si–Ti modified hollow silicon mixed sol6
In situ, simultaneous spectroscopic ellipsometry and quadrupole mass spectrometry studies of ZnO etching using Hacac and O2 plasma6
Optical properties of La1−xSrxVO3 (0 ≤ x ≤ 1) films grown on LSAT substrates using radio frequency sputtering deposition6
Design method for generating multiple colors with thickness-modulated thin-film optical filters for silicon solar cells6
Enhancing biocompatibility, mechanical properties, and corrosion resistance of laser cladding β-TiNb coatings6
Electroconductive and photoelectric properties of Pt/(100) β-Ga2O3 Schottky barrier diode based on Czochralski grown crystal6
Characterization of a broad beam Kaufman-type ion source operated with CHF3 and O26
Effect of O2 plasma exposure time during atomic layer deposition of amorphous gallium oxide6
Effect of SiO2 buffer layer on phase transition properties of VO2 films fabricated by low-pressure chemical vapor deposition6
Oxygen incorporation in AlN films grown by plasma-enhanced atomic layer deposition6
Effect of ozone and humidity addition on hydrogen peroxide generation characteristics of plasmas in oxygen bubbles6
Near-surface electronic structure in strained Ni-ferrite films: An x-ray absorption spectroscopy study6
Microstructure and properties of Mg/Ti joint welded by resistance spot welding with an aluminum interlayer6
Atomic layer deposition of nanofilms on porous polymer substrates: Strategies for success6
Influence of magnetic field strength on plasma, microstructure, and mechanical properties of Cr thin films deposited by MPPMS and DOMS6
David Shirley: Pioneer, teacher, mentor, and visionary scientific leader6
Variability of band alignment between WS2 and SiO2: Intrinsic versus extrinsic contributions6
Benchmarking large language models for materials synthesis: The case of atomic layer deposition6
Effect of focus ring with external circuit on cathode edge sheath dynamics in a capacitively coupled plasma6
Sn-doping concentration dependence of electrical, optical, and magnetic properties in epitaxial Mn-doped indium tin oxide films deposited by RF magnetron sputtering6
Neutral transport during etching of high aspect ratio features6
Growth and optical properties of NiO thin films deposited by pulsed dc reactive magnetron sputtering6
Effects of N2 and O2 plasma treatments of quartz surfaces exposed to H2 plasmas6
Evolution of β-Ga2O3 to γ -Ga2O3 solid-solution epitaxial films after high-temperature annealing6
Insight into the mechanism of lattice damage in ground and polished InAs substrates6
Half-century old Berkeley idea now finding missing links of nuclear quadrupole moments6
Investigation of arc spot splitting behavior on aluminum, titanium, and their alloy cathodes under different gas flows6
Reevaluation of XPS Pt 4f peak fitting: Ti 3s plasmon peak interference and Pt metallic peak asymmetry in Pt@TiO2 system5
Wettability and corrosion resistance of zirconium nitride films obtained via reactive high-power impulse magnetron sputtering5
Isotropic plasma-thermal atomic layer etching of superconducting titanium nitride films using sequential exposures of molecular oxygen and SF6/H2 plasma5
Critical review of Ohmic and Schottky contacts to β-Ga2O35
Ultrathin stable Ohmic contacts for high-temperature operation of β-Ga2O3 devices5
Crystallinity degradation and defect development in (AlxGa1−x)2O3 thin films with increased Al composition5
Defining the relative proton irradiation hardness of β-Ga2O35
Performance evaluation of GaN etching using Cl2-based plasma with bias pulsing5
Computational modeling of a surfatron mode microwave plasma in NH3/N2 for remote radical generation in a silicon native oxide cleaning process5
Atomic layer deposition of GdF3 thin films5
Atomic layer etching of SiO2 using sequential exposures of Al(CH3)3 and H2/SF6 plasma5
Dynamical reverse folding and residual gas expansion models of flexible thin films5
Properties of Schottky barrier diodes on heteroeptixial α-Ga2O3 thin films5
Effect of drift layer doping and NiO parameters in achieving 8.9 kV breakdown in 100 μm diameter and 4 kV/4 A in 1 mm diameter NiO/β-Ga2O3 rectifiers5
Stabilizing far-from-equilibrium (Mo,Ti)S2 thin films by metal sulfurization at reduced temperature5
Proton irradiation effect on InAs/GaAs quantum dot solar cells5
Epitaxial film growth by thermal laser evaporation5
Optical studies of pure and (Cu, Co) doped nickel zinc ferrite films deposited on quartz substrate5
Practical guides for x-ray photoelectron spectroscopy: Use of argon ion beams for sputter depth profiling and cleaning5
Interface-mediated ferroelectricity in PMN-PT/PZT flexible bilayer via pulsed laser deposition5
Kinetic Monte Carlo simulations of aging in δ-Pu5
Erratum: “Secondary ion mass spectrometry quantification: Do you remember when a factor of 2 was good enough?” [J. Vac. Sci. Technol. B 41, 030803 (2023)]5
Mechanism of residue formation on Ge-rich germanium antimony tellurium alloys after plasma etching5
Correlating surface stoichiometry and termination in SrTiO3 films grown by hybrid molecular beam epitaxy5
Layer thickness dependent interface strengthening of nanolayered W/NbMoTaW medium-entropy alloys5
Prospects for the expansion of standing wave ambient pressure photoemission spectroscopy to reactions at elevated temperatures5
Investigation of the dielectric recovery process of vacuum arc in double breaks by planar laser-induced fluorescence5
Development of a process for flame retardant coating of textiles with bio-hybrid anchor peptides5
Growth of conformal TiN thin film with low resistivity and impurity via hollow cathode plasma atomic layer deposition5
Measurements of atomic hydrogen recombination coefficients and the reduction of Al2O3 using a heat flux sensor5
Low temperature, area-selective atomic layer deposition of NiO and Ni5
Type II band alignment of NiO/α-Ga2O3 for annealing temperatures up to 600 °C5
In-cycle evolution of thickness and roughness parameters during oxygen plasma enhanced ZnO atomic layer deposition using in situ spectroscopic ellipsometry5
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