Journal of Vacuum Science & Technology A

Article	Citations
Atomic layer deposition of crystalline molybdenum trioxide and suboxide thin films using molybdenum(II) acetate dimer precursor	85
Localized surface plasmon resonance of Ag nanoparticle thin films deposited by direct-current magnetron sputtering	60
Role of a cyclopentadienyl ligand in Hf precursors using H2O or O3 as oxidant in atomic layer deposition	38
Guide to XPS data analysis: Applying appropriate constraints to synthetic peaks in XPS peak fitting	38
Development of single-chamber deposition equipment for organic/inorganic nanohybrid composite material	38
High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane	35
Impact of the DC intensity and electrode distance on pulsed-DC powder-pack boride layer growth kinetics	34
Step barrier effects during early stages of the kinetic roughening of fcc(111) surfaces	34
Perspective on improving the quality of surface and material data analysis in the scientific literature with a focus on x-ray photoelectron spectroscopy (XPS)	33
In situ x-ray photoelectron spectroscopy analysis of electrochemical interfaces in battery: Recent advances and remaining challenges	32
Enhancing mechanical properties and tribocorrosion resistance of TC4 alloys via plasma nitriding	28
Corrosion behavior of the NiCrAlY and NiSiAlY alloys with salt mixtures of NaCl/Na2SO4	27
Using metal precursors to passivate oxides for area selective deposition	26
Retarded solid state dewetting of thin bismuth films with oxide capping layer	26
Erratum: “Microscopic origins of radiative performance losses in thin-film solar cells at the example of (Ag,Cu)(In,Ga)Se2 devices” [J. Vac. Sci. Technol. A 42, 022803 (2024)]	25
Effect of a-C:H:SiOx coating thickness on corrosion resistance and zeta potential level of Ti-6Al-4V	25
Area selective PECVD on metal oxide resist	23
Implementation of an artificial spiking neuron with photoreceptor functionality using gas discharge tubes	22
Enhancing chemical vapor deposition growth and fabrication techniques to maximize hole conduction in tungsten diselenide for monolithic CMOS integration	22
Evaluation of nickel self-sputtering yields by molecular-dynamics simulation	22
Novel secondary ion mass spectrometry identification system for organic materials using random forest	22
Hollow cathode plasma electron source for low temperature deposition of cobalt films by electron-enhanced atomic layer deposition	22
MoS2-assisted growth of highly-oriented AlN thin films by low-temperature van der Waals epitaxy	21
Nitrogen-incorporated tetrahedral amorphous carbon optically transparent thin film electrode	21
Tuning microstructural and oxidative characteristics of direct current- and high-power pulsed magnetron sputtered MoSi2-based thin films	21

Impact of sputtering and redeposition on the morphological profile evolution during ion-beam etching of blazed gratings	20
Analysis of pulsed direct current reactive magnetron sputtering on a silicon target	19
Elusive supported surface M2Ox dimer active site (M = Re, W, Mo, Cr, V, Nb, and Ta)	19
Promoting subsurface Sn incorporation at Nb(100) oxide surface sites leading to homogeneous Nb3Sn film growth for superconducting radiofrequency applications	18
Over 6 MV/cm operation in β-Ga2O3 Schottky barrier diodes with IrO2 and RuO2 anodes deposited by molecular beam epitaxy	18
Erratum: “Acquisition and analysis of scanning tunneling spectroscopy data—WSe2 monolayer” [J. Vac. Sci. Technol. A 39, 011001 (2021)]	18
Effect of nonvertical ion bombardment due to edge effects on polymer surface morphology evolution and etching uniformity	18
Numerical study of the effects of discharge parameters on capacitively coupled plasma in a magnetic field	17
{100}-textured piezoelectric Pb(Zr,Ti)O3 films: Influence of Pb content in the PbxTiO3 seed layer on the electrical properties of chemical solution deposited Pb(Zr,Ti)O3	17
Zirconia-titania-doped tantala optical coatings for low mechanical loss Bragg mirrors	16
Transformation from dendritic to triangular growth of WS2 via NaCl assisted low-pressure chemical vapor deposition	16
Effect of NH3 flow rate to titanium nitride as etch hard mask in thermal atomic layer deposition	15
Enhanced nucleation mechanism in ruthenium atomic layer deposition: Exploring surface termination and precursor ligand effects with RuCpEt(CO)2	15
Molecule deposition in mask-shielded regions revealed by selective Mg vapor deposition	15
Arsenic-flux dependence of surface morphology in InAs homoepitaxy	15
Titanium infiltration into ultrathin PMMA brushes	15
Area selective deposition of iron films using temperature sensitive masking materials and plasma electrons as reducing agents	14
Growth of pentacene molecules on Tsai-type quasicrystals and related crystal surfaces	14
Influence of hydrogen-bonded 3-mercaptopropionic acid bilayers on binary self-assembled monolayer formation	14
Role of nanoscale surface defects on Sn adsorption and diffusion behavior on oxidized Nb(100)	14
Localized phase transition of TiO2 thin films induced by sub-bandgap laser irradiation	14
Erratum: “Formation and desorption of nickel hexafluoroacetylacetonate Ni(hfac)2 on a nickel oxide surface in atomic layer etching processes” [J. Vac. Sci. Technol. A 38, 052602 (2020)]	14
Extreme atomic-scale surface roughening: Amino acids on Ag on Au(111)	13
Role of oxygen flow rate on the structure and stoichiometry of cobalt oxide films deposited by reactive sputtering	13
Homoepitaxial GaN micropillar array by plasma-free photo-enhanced metal-assisted chemical etching	13
Comparison of 2D crystals formed by dissociative adsorption of fluorinated and nonfluorinated alkyl iodides on Cu(111)	13
On the interplay between a novel iron and iron-carbide atomic layer deposition process, the carbon nanotube growth, and the metal–carbon nanotube coating properties on silica substrates	12
Hierarchical colloid-based lithography for wettability tuning of semiconductor surfaces	12
Use of in situ electrical conductance measurements to understand the chemical mechanisms and chamber wall effects during vapor phase infiltration doping of poly(aniline) with TiCl4 + H2O	12
Scalable synthesis of supported catalysts using fluidized bed atomic layer deposition	12
Surface study of Pt-3d transition metal alloys, Pt3M (M = Ti, V), under CO oxidation reaction with ambient pressure x-ray photoelectron spectroscopy	12
Atomic layer etching of SiO2 with self-limiting behavior on the surface modification step using sequential exposure of HF and NH3	12
Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices	12
Study of synthesis strategies to improve the electrical properties of magnetron sputtered copper oxide thin films	12
Effect of substrate and substrate temperature on the deposition of MoS2 by radio frequency magnetron sputtering	12
Low-temperature plasma atomic layer etching of molybdenum via sequential oxidation and chlorination	12
Reevaluation of XPS Pt 4f peak fitting: Ti 3s plasmon peak interference and Pt metallic peak asymmetry in Pt@TiO2 system	12
Molecular layer deposition of Nylon 2,6 polyamide polymer on flat and particle substrates in an isothermal enclosure containing a rotary reactor	12
High resolution depth profiling using near-total-reflection hard x-ray photoelectron spectroscopy	12
Elucidating interactions of the epoxide ring on Pt(111) by comparing reaction pathways of propylene oxide and 1-epoxy-3-butene	12
Reconstruction changes drive surface diffusion and determine the flatness of oxide surfaces	11
Controlling electron and hole concentration in MoS2 through scalable plasma processes	11
Size distribution of clusters and nucleation preference of trimers during SiC (0001) surface epitaxial growth under low coverage	11
Deposit and etchback approach for ultrathin Al2O3 films with low pinhole density using atomic layer deposition and atomic layer etching	11
Peak intensities in Auger electron spectroscopy for quantification: Relationship between differentiated spectral intensities and direct peak areas	11
Long and flexible atmospheric pressure plasma jet probes for operation in humid environments	11
Best practices for performing quantitative TOF-SIMS analyses	11
Studies on the growth mechanism of aluminide coating on K444 alloy surface by chemical vapor deposition	11
Core-shell metallic nanotube arrays for highly sensitive surface-enhanced Raman scattering (SERS) detection	11
Study of the surface and interface properties of ultrathin nickel film on cerium layer by in situ magnetic sputtering	10

Novel principal component analysis tool based on python for analysis of complex spectra of time-of-flight secondary ion mass spectrometry	10
Design principle of gradient elastic modulus transition layer via substrate mechanical property	10
Case study in machine learning for predicting moderate pressure plasma behavior	10
Residual stress depth profiles self-developed in cathodic arc deposited Ti-Al-N coatings prepared at different constant substrate bias values	10
Hardness, adhesion, and wear behavior of magnetron cosputtered Ti:Zr-O-N thin films	10
Numerical ellipsometry: Artificial intelligence for real-time, in situ absorbing film process control	10
Processing and characterization of chalcopyrite semiconductors for photovoltaic applications	10
Plasma nitridation for atomic layer etching of Ni	10
Thermal transport of defective β-Ga2O3 and B(In)GaO3 alloys from atomistic simulations	10
Optimized thermoelectric performance of flexible Bi0.5Sb1.5Te3 thin film through PbTe incorporation	10
Cr2O3–NiO mixed oxides thin films for p-type transparent conductive electrodes	9
Characterizing the composition, structure, and mechanical properties of magnetron sputtering physical vapor deposition TiN and TiSiN coatings	9
Photoemission spectroscopy on photoresist materials: A protocol for analysis of radiation sensitive materials	9
Molecular dynamics simulation of amine formation in plasma-enhanced chemical vapor deposition with hydrocarbon and amino radicals	9
Erratum: “MoS2-assisted growth of highly-oriented AlN thin films by low-temperature van der Waals epitaxy” [J. Vac. Sci. Technol. A 42, 050401 (2024)]	9
Modeling of microtrenching and bowing effects in nanoscale Si inductively coupled plasma etching process	9
Immersion ellipsometry for the uncorrelated determination of ultrathin film thickness and index of refraction: Theory and examples	9
Lattice defects distribution of H+ implanted 4H-SiC investigated by deep-ultraviolet Raman spectroscopy	9
Remote inductively coupled plasmas in Ar/N2 mixtures and implications for plasma enhanced ALD	9
Materials’ properties of low temperature deposited Cu/W and Cu/Cr multilayer thin films using high power impulse magnetron sputtering	9
Ultrahigh density InGaN/GaN nanopyramid quantum dots for visible emissions with high quantum efficiency	9
Friction and wear behavior of C implanted copper via ion beam-assisted bombardment	9
Adhesion layers between piezoelectric and magnetostrictive layers in a MEMS magneto-sensor stack: Influence on the phase transformation of deposited Co/Fe multilayers to magnetostrictive CoxFe1	9
VAMAS TWA2 interlaboratory comparison: Surface analysis of TiO2 nanoparticles using ToF-SIMS	9
PbS quantum dot thin film dry etching	9
Heterovalent semiconductor structures and devices grown by molecular beam epitaxy	9
Nanostructured bi-metallic Pd–Ag alloy films for surface-enhanced Raman spectroscopy-based sensing application	9
Novel amide-based deep eutectic solvent electrolytes for high-performance lithium-ion batteries	9
Plasma-enhanced atomic layer deposition of WO3-SiO2 films using a heteronuclear precursor	8
Preparation and study of high entropy alloy layer with double glow plasma NiCrMoWTi gradient	8
Conformal coating of macroscopic nanoparticle compacts with ZnO via atomic layer deposition	8
Studies of electrical resistivity and magnetic properties of CuFe and CuNiFe films prepared by magnetron sputtering	8
Using auxiliary electrochemical working electrodes as probe during contact glow discharge electrolysis: A proof of concept study	8
Applications and mechanisms of anisotropic two-step Si3N4 etching with hydrogen plasma conditioning	8
Effects of nitrogen flow on the microstructure and mechanical properties of (TiZrNbMoTa)N high-entropy nitride films by magnetron sputtering	8
First-principles calculations on adsorption-diffusion behavior of transition layer Ti atoms on the Fe surface	8
Corrosion resistance and conductivity of CrN, CrAlN, and CrTiN coatings applied to bipolar plates for proton exchange membrane fuel cells	8
Revisitation of reactive direct current magnetron sputtering discharge: Investigation of Mg–CF4, Mg–O2, and Ti–O2 discharges by probe measurements	8
Epitaxial growth of Bi, Sb, and Sn	8
Highly efficient plasma generation in inductively coupled plasmas using a parallel capacitor	8
On the limitations of thermal atomic layer deposition of InN using ammonia	8
Tailoring structure, morphology, and tribo-mechanical properties of HiPIMS-deposited CrxNy coatings for enhanced performance in wear and corrosion protection	8
Impact of plasma operating conditions on the ion energy and angular distributions in dual-frequency capacitively coupled plasma reactors using CF4 chemistry	8
Dislocation avalanches in nanostructured molybdenum nanopillars	8
Effects of metal redeposition in plasma sputtering	8
Sn-modified BaTiO3 thin film with enhanced polarization	8
Significant decrease in surface charging of electrically isolated ionic liquid by cluster ion bombardment	7
Inhibition of the atomic layer deposition of ZnO and SnO2 using a vapor-based polymer thin film	7
X-ray absorption measurements at a bending magnet beamline with an Everhart–Thornley detector: A monolayer of Ho3N@C80 on graphene	7
CF4 plasma-based atomic layer etching of Al2O3 and surface smoothing effect	7
Assessing the feasibility of laser ablation coating removal (LACR) on legacy bridge steel: Coating removal and adhesion, and effects on mechanical properties	7
Early stage nucleation mechanism for SiC(0001) surface epitaxial growth	7
Modulation of the LaFeO3 film growth by the terrace width of SrTiO3 substrates	7
Al2O3 atomic layer deposition on a porous matrix of carbon fibers (FiberForm) for oxidation resistance	7
Transport and trap states in proton irradiated ultra-thick κ-Ga2O3	7
Chemical conversion of MoS2 thin films deposited by atomic layer deposition (ALD) into molybdenum nitride monitored by in situ reflectance measurements	7
Effect of annealing on the magnetic anisotropy of GaMnAsP layers with graded P concentration	7
NiO/β-(AlxGa1−x)2O3/Ga2O3 heterojunction lateral rectifiers with reverse breakdown voltage >7 kV	7
Comparing sputter rates, depth resolution, and ion yields for different gas cluster ion beams (GCIB): A practical guide to choosing the best GCIB for every application	7
Effect of SiO2 buffer layer on phase transition properties of VO2 films fabricated by low-pressure chemical vapor deposition	7
Manipulation of thin metal film morphology on weakly interacting substrates via selective deployment of alloying species	7
Structure evolution and mechanical properties of co-sputtered Zr-Al-B2 thin films	7
In situ atom-resolved observation of Si (111) 7×7 surface with F radical and Ar ion irradiation simulated atomic layer etching	7
Effects of the focus ring on the ion kinetics at the wafer edge in capacitively coupled plasma reactors	7
Area-selective atomic layer deposition of palladium	7
Nanostructured MoS2 thin films: Effect of substrate temperature on microstructure, optical, and electrical properties	7
Control by atomic layer deposition over the chemical composition of nickel cobalt oxide for the oxygen evolution reaction	7
Preparation and performance analysis of Ti-25Nb-3Zr-2Sn-3Mo microarc oxidized macro-micro-nano tertiary structure film layers	7
Kinetic Monte Carlo study on the effect of growth conditions on the epitaxial growth of 3C–SiC (0001) vicinal surface	7
Practical guide on chemometrics/informatics in x-ray photoelectron spectroscopy (XPS). II. Example applications of multiple methods to the degradation of cellulose and tartaric acid	7
Photoelectron spectroscopic studies on metal halide perovskite materials	7
Hole selective nickel oxide as transparent conductive oxide	7
High enhancement, low cost, large area surface enhanced Raman scattering substrates all by atomic layer deposition on porous filter paper	7
Effects of duty cycle and nitrogen flow rate on the mechanical properties of (V,Mo)N coatings deposited by high-power pulsed magnetron sputtering	7
Influence of γ'N and ɛ'N phases on the properties of AISI 304L after low-temperature plasma nitrocarburizing	7
Band structure and strain distribution of InAs quantum dots encapsulated in (Al)GaAs asymmetric matrixes	7
Extending area selective deposition of ruthenium onto 3D SiO2-Si multilayer stacks	7
Quasiatomic layer etching of silicon nitride enhanced by low temperature	7
Inner surface modification of polyethylene tubing induced by dielectric barrier discharge plasma	7
Density functional theory calculations of mechanical and electronic properties of W1−xTaxN6, W1−xMoxN6, and Mo1−xTaxN6 (0 ≤ x ≤ 1) alloys in a hexagonal structure	7

Deep level defect states in β-, α-, and ɛ-Ga2O3 crystals and films: Impact on device performance	6
Correlating chemical and electronic states from quantitative photoemission electron microscopy of transition-metal dichalcogenide heterostructures	6
High crystalline quality homoepitaxial Si-doped β-Ga2O3(010) layers with reduced structural anisotropy grown by hot-wall MOCVD	6
Plasma enhanced atomic layer etching of high-k layers on WS2	6
High entropy alloy CrFeNiCoCu sputter deposited films: Structure, electrical properties, and oxidation	6
Selective molecular gas phase etching in layered high aspect-ratio nanostructures for semiconductor processing. I. Modeling framework and simulation	6
Cinnamaldehyde adsorption and thermal decomposition on copper surfaces	6
Deposition of sputtered NiO as a p-type layer for heterojunction diodes with Ga2O3	6
Low temperature growth of single-phase and preferentially oriented ɛ-Ga2O3 films on sapphire substrates via atomic layer deposition	6
Investigation of arc spot splitting behavior on aluminum, titanium, and their alloy cathodes under different gas flows	6
Challenges in atomic layer etching of gallium nitride using surface oxidation and ligand-exchange	6
Temporal evolution of the ion flux to the target in rotational RF multimagnetron plasma	6
Molecular beam epitaxy of Pd-Fe graded alloy films for standing spin waves control	6
Following the propagation of erroneous x-ray photoelectron spectroscopy peak fitting through the literature. A genealogical approach	6
Oxidative molecular layer deposition of PEDOT using volatile antimony(V) chloride oxidant	6
Elaboration and characterization of porous ultrathin gold films grown by ion beam assisted deposition	6
Machine-learning-enabled on-the-fly analysis of RHEED patterns during thin film deposition by molecular beam epitaxy	6
CrN/AlN nanolaminates: Architecture, residual stresses, and cracking behavior	6
Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition	6
David Shirley: Pioneer, teacher, mentor, and visionary scientific leader	6
Optical constants of single-crystalline Ni(100) from 77 to 770 K from ellipsometry measurements	6
Effects of processing parameters on the morphologies of complex sesquioxide thin films	6
Hyperfine interaction studies in the David Shirley group, 1960–1975. I. Low-temperature nuclear orientation	6
Dependence of film structure on the film structure-independent equivalent film thickness in magnetron sputtering deposition of Ag thin films	6
Angle resolved x-ray photoelectron spectroscopy assessment of the structure and composition of nanofilms—including uncertainties—through the multilayer model	6
Epitaxial growth of the first two members of the Ban+1InnO2.5n+1 Ruddlesden–Popper homologous series	6
Catalytic atomic layer deposition of amorphous alumina–silica thin films on carbon microfibers	6
Autonomous hybrid optimization of a SiO2 plasma etching mechanism	6
Effect of fabrication processes before atomic layer deposition on β-Ga2O3/HfO2/Cr/Au metal–oxide–semiconductor capacitors	6
Temperature dependent performance of ITO Schottky contacts on β-Ga2O3	6
Control of etch profiles in high aspect ratio holes via precise reactant dosing in thermal atomic layer etching	6
Internal chemical potential in mixed covalent-ionic photosensitive systems	6
Oxygen incorporation in AlN films grown by plasma-enhanced atomic layer deposition	6
Self-powered solar blind ultraviolet photodetector based on amorphous (In0.23Ga0.77)2O3/bixbyite (In0.67Ga0.33)2O3 heterojunction	6
Effect of bias voltage and nitrogen content on the morphological, structural, mechanical, and corrosion resistance properties of micro-alloyed Ti1−xAl0.8xP0.2XNy films deposited by high power impulse	6
Growth of topological insulator Bi2Se3 particles on GaAs via droplet epitaxy	6
Area selective deposition of ruthenium on 3D structures	6
Adapting FEFF to 5f angular momentum coupling	6
Study on etch characteristics of magnetic tunnel junction materials using rf-biased H2/NH3 reactive ion beam	6
Effects of frequency and pulse width on electron density, hydrogen peroxide generation, and perfluorooctanoic acid mineralization in a nanosecond pulsed discharge gas-liquid plasma reactor	6
Plasma-enhanced atomic layer deposition of aluminum-indium oxide thin films and associated device applications	6
Cut-and-pasting ligands: The structure/function relationships of a thermally robust Mo(VI) precursor	6
Trap states and hydrogenation of implanted Si in semi-insulating Ga2O3(Fe)	5
Effect of electrochemical cycling on microstructures of nanocomposite silicon electrodes using hyperpolarized 129Xe and 7Li NMR spectroscopy	5
Atomic layer deposition of MoNx thin films using a newly synthesized liquid Mo precursor	5
On simulating thin-film processes at the atomic scale using machine-learned force fields	5
Performance and stability of Al-doped HfGaO thin-film transistors deposited by vapor cooling condensation system	5
Effect of WC particle size on the microstructural evolution and wear resistance of laser cladding Inconel 718/WC-12Co composite coating	5
Ultrawide bandgap vertical β-(AlxGa1−x)2O3 Schottky barrier diodes on free-standing β-Ga2O3 substrates	5
Dependence of persistent photoconductivity on the thickness of β-Ga2O3 thin film photodetectors on c-plane sapphire via magnetron sputtering	5
Atomic layer etching of SiO2 using sequential exposures of Al(CH3)3 and H2/SF6 plasma	5
Growth and characterization of α-Ga2O3 on sapphire and nanocrystalline β-Ga2O3 on diamond substrates by halide vapor phase epitaxy	5
Nanosecond pulsed plasma discharge for remediation of simulated wastewater containing thiazine and azo dyes as model pollutants	5
Structural evolution and thermoelectric properties of Mg3SbxBi2−x thin films deposited by magnetron sputtering	5
Submicrometer spectromicroscopy of UO2 aged under high humidity conditions	5
Influence of substrate temperature on graphene oxide thin films synthesis by laser ablation technique	5
Selective molecular gas phase etching in layered high aspect-ratio nanostructures for semiconductor processing. II. Experiments and model validation	5
Strengths of plasmon satellites in XPS: Real-time cumulant approach	5
Nonpyrophoric alternative to trimethylaluminum for the atomic layer deposition of Al2O3	5
Depth profile reconstruction of YCrO3/CaMnO3 superlattices by near total reflection hard x-ray photoelectron spectroscopy	5
The case for denoising/smoothing X-ray photoelectron spectroscopy data by Fourier analysis	5
Surprising stability of polar (001) surfaces of the Mott insulator GdTiO3	5
Working with Wilhelm (Bill) Wolfer … reflections on the early years	5
Influence of helium bubbles on the bulk equation of state of gold under static compression	5
Molybdenum carbonitride Schottky contacts prepared by thermal atomic layer deposition on gallium nitride	5
Investigation of ruthenium etching induced by electron beam irradiation and O2/Cl2 remote plasma-based neutral fluxes: Mechanistic insights and etching model	5
Aminosilane small molecule inhibitors for area-selective deposition: Study of substrate-inhibitor interfacial interactions	5
Isotropic plasma-thermal atomic layer etching of superconducting titanium nitride films using sequential exposures of molecular oxygen and SF6/H2 plasma	5
Correlating surface stoichiometry and termination in SrTiO3 films grown by hybrid molecular beam epitaxy	5
Pursuing science with vigor: Remembering Wilhelm G. Wolfer	5
Epitaxial film growth by thermal laser evaporation	5
Atomic scale friction properties of confined water layers	5
Quantum size effects in Ag thin films grown on the fivefold surface of the icosahedral Al-Cu-Fe quasicrystal: Influence of the growth temperature	5
Silicon-ion implantation induced doping and nanoporosity in molecular beam epitaxy grown GaSb epitaxial films	5
Spherical-periodic order and relevant short-range structural units in simple crystal structures	5
Damage-indicating and self-healing anticorrosion coatings based on fluorescence resonance energy transfer and photothermal shape memory mechanism	5
Chirality-induced zigzag domain wall in in-plane magnetized ultrathin films	5
Quantitative depth profiling of Al in SiC using time of flight–secondary ion mass spectroscopy	5
Erosion of focus rings in capacitively coupled plasma etching reactors	5
Low temperature, area-selective atomic layer deposition of NiO and Ni	5
Erratum: “Atomic layer deposition of high purity Ga2O3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H2O and O2 plasma” [J. Vac. Sci. Technol. A 38, 022412 (2020)]	5
Anisotropic magnetoresistance and planar Hall effect in correlated and topological materials	5
Searching for superconductivity in high entropy oxide Ruddlesden–Popper cuprate films	5
Optimizing GaAs/AlGaAs growth on GaAs (111)B for enhanced nonlinear efficiency in quantum optical metasurfaces	5
Solid-source metal-organic MBE for elemental Ir and Ru films	5
Understanding the unique optical and vibrational signatures of sequential infiltration synthesis derived indium oxyhydroxide clusters for CO2 absorption	5
Critical review of Ohmic and Schottky contacts to β-Ga2O3	5
Thermal atomic layer etching of amorphous and crystalline Al2O3 films	5
Low-temperature etching of silicon oxide and silicon nitride with hydrogen fluoride	5
Methyl-methacrylate based aluminum hybrid film grown via three-precursor molecular layer deposition	5
Self-assembled vertically aligned nanocomposite systems integrated on silicon substrate: Progress and future perspectives	5
Direct optical absorption detection of metal vapor in mechanically stimulated gas emission	5
Influence of the carrier wafer during GaN etching in Cl2 plasma	5
Preparation of stable and highly hydrophobic coatings via one-step spray method and study of their anti-icing performance	5
Improved growth quality of epitaxial ZnTe thin films on Si (111) wafer with ZnSe buffer layer	5