Journal of Vacuum Science & Technology A

Papers
(The TQCC of Journal of Vacuum Science & Technology A is 5. The table below lists those papers that are above that threshold based on CrossRef citation counts [max. 250 papers]. The publications cover those that have been published in the past four years, i.e., from 2022-05-01 to 2026-05-01.)
ArticleCitations
Self-powered solar blind ultraviolet photodetector based on amorphous (In0.23Ga0.77)2O3/bixbyite (In0.67Ga0.33)2O3 heterojunction101
Aminosilane small molecule inhibitors for area-selective deposition: Study of substrate-inhibitor interfacial interactions68
Implementation of an artificial spiking neuron with photoreceptor functionality using gas discharge tubes65
Enhancing chemical vapor deposition growth and fabrication techniques to maximize hole conduction in tungsten diselenide for monolithic CMOS integration61
Friction and wear behavior of C implanted copper via ion beam-assisted bombardment56
In situ metal organic chemical vapor deposition of ultrathin sp2-bonded boron nitride dielectric on gallium nitride52
Peak intensities in Auger electron spectroscopy for quantification: Relationship between differentiated spectral intensities and direct peak areas51
Nitrogen-incorporated tetrahedral amorphous carbon optically transparent thin film electrode45
Analysis of pulsed direct current reactive magnetron sputtering on a silicon target40
Erratum: “MoS2-assisted growth of highly-oriented AlN thin films by low-temperature van der Waals epitaxy” [J. Vac. Sci. Technol. A 42, 050401 (2024)]36
Novel principal component analysis tool based on python for analysis of complex spectra of time-of-flight secondary ion mass spectrometry34
Size distribution of clusters and nucleation preference of trimers during SiC (0001) surface epitaxial growth under low coverage32
Study on the modification of TC11 titanium alloy microarc oxidized film layer by ZrO2 particles32
GaN lateral pn junctions by MBE in situ selective area sublimation and regrowth29
High crystalline quality homoepitaxial Si-doped β-Ga2O3(010) layers with reduced structural anisotropy grown by hot-wall MOCVD29
Deposition of sputtered NiO as a p-type layer for heterojunction diodes with Ga2O327
Tailoring structure, morphology, and tribo-mechanical properties of HiPIMS-deposited CrxNy coatings for enhanced performance in wear and corrosion protection26
Testing commonly used background removal procedures for XPS quantitation of homogeneous material: Fe2O3, a transition metal oxide example26
High surface quality Y2SiO5 silicate-crystal waveguides etched by chlorine-based inductive coupled plasma reactive ion etching25
Hardness, adhesion, and wear behavior of magnetron cosputtered Ti:Zr-O-N thin films25
Structural, electronic, and thermodynamic properties of Li3X (X = N, P, As) compounds for solid-state lithium-ion batteries25
Effects of duty cycle and nitrogen flow rate on the mechanical properties of (V,Mo)N coatings deposited by high-power pulsed magnetron sputtering25
Cathodoluminescence of β-Ga2O3:Fe (2¯01) irradiated with boron ions24
Plasma enhanced atomic layer etching of high-k layers on WS224
Understanding the unique optical and vibrational signatures of sequential infiltration synthesis derived indium oxyhydroxide clusters for CO2 absorption23
Core-shell metallic nanotube arrays for highly sensitive surface-enhanced Raman scattering (SERS) detection22
Applications and mechanisms of anisotropic two-step Si3N4 etching with hydrogen plasma conditioning22
Comparing sputter rates, depth resolution, and ion yields for different gas cluster ion beams (GCIB): A practical guide to choosing the best GCIB for every application22
Kinetic Monte Carlo study on the effect of growth conditions on the epitaxial growth of 3C–SiC (0001) vicinal surface22
Using auxiliary electrochemical working electrodes as probe during contact glow discharge electrolysis: A proof of concept study22
Application of high-spatial-resolution distributed fiber-optic sensing technique for neutral gas temperature mapping in inductively coupled Ar plasmas21
Conformal coating of macroscopic nanoparticle compacts with ZnO via atomic layer deposition20
Transport and trap states in proton irradiated ultra-thick κ-Ga2O320
Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition19
Effect of the repeated application of First Contact™ polymer on xenon-difluoride passivated lithium fluoride on aluminum surfaces for space telescopes19
Erratum: “Microscopic origins of radiative performance losses in thin-film solar cells at the example of (Ag,Cu)(In,Ga)Se2 devices” [J. Vac. Sci. Technol. A 42, 022803 (2024)]19
Preparation of stable and highly hydrophobic coatings via one-step spray method and study of their anti-icing performance18
Enhancing minority carrier lifetime in Ge: Insights from HF and HCl cleaning procedures18
Modeling scale-up of particle coating by atomic layer deposition18
Amorphous carbon thin films: Mechanisms of hydrogen incorporation during magnetron sputtering and consequences for the secondary electron emission18
Nonpyrophoric alternative to trimethylaluminum for the atomic layer deposition of Al2O318
Structure and corrosion resistance of electron-beam-strengthened and micro-arc oxidized coatings on magnesium alloy AZ3118
Designing pulsed plasma etch processes by genetic algorithm18
Hot corrosion behavior of NiCoCrAlY laser cladding coating on 17-4PH stainless steel before and after high-current pulsed electron beam irradiation17
Novel high-efficiency plasma nitriding process utilizing a high power impulse magnetron sputtering discharge17
Ga+-focused ion beam damage in n-type Ga2O317
Method for extracting the intrinsic diffusion coefficient from grain boundary diffusion depth profile17
Surface temperature of a 2 in. Ti target during DC magnetron sputtering17
Impact of arsenic species on InAs/GaSb type II superlattice grown by molecular beam epitaxy17
Ordered deficient perovskite La2/3TiO3 films grown via molecular beam epitaxy17
Significance of plasma-surface interactions in the etch behavior of low-k materials17
Stability investigation of Eu3+ doped CaF2 thin film with ZnO coating under electron beam irradiation16
Adsorption mechanism of dimeric Ga precursors in metalorganic chemical vapor deposition of gallium nitride16
Polydimethylsiloxane surface irradiated by nitrogen ions: Influence of low molecular fractions16
Microstructure and performance of microarc oxidation coatings doped with yttrium on TA4 commercial pure titanium16
Dependence of persistent photoconductivity on the thickness of β-Ga2O3 thin film photodetectors on c-plane sapphire via magnetron sputtering16
My times with Bill Wolfer16
Design and fabrication of color-generating nitride based thin-film optical filters for photovoltaic applications16
Reactive magnetron sputtering of copper oxide coatings using the metallic mode assisted by RF-ICP source: Experiment and calculation16
Bayesian-optimized kinetic Monte Carlo modeling of Na electrodeposition on Cu16
Enhanced plasma resistance of uniform ALD-Y2O3 thin films for chamber components’ coatings16
Enhancement of CrN-polyetherimide adhesion by hardening substrate’s surface16
Evaluation of stress and elastic energy relief efficiency in a hard coating with a metal interlayer—Using TiN/Ti as a model system16
Nucleation and quantum confinement of nano-platelet Bi2–Bi2Se315
Probabilistic zero-dimensional model with calibration and uncertainty quantification for capacitively coupled plasma reactor simulations15
Radiation damage effects on electronic and optical properties of β-Ga2O3 from first-principles15
Gliding arc discharge plasma treatment for promoting germination of wheat seed at low ambient temperature14
Effect of atomic layer annealing in plasma-enhanced atomic layer deposition of aluminum nitride on silicon14
Material and electrical characterization of ultrawide bandgap BN/AlN metal-insulator-semiconductor (MIS) Schottky diodes14
Spatial atomic layer deposition: Transport-reaction modeling and experimental validation of film geometry14
Series resonance effects of a variable inductor termination on the nonpowered electrode in capacitively coupled plasmas14
Comparison of triethylgallium and diethylgallium ethoxide for β-Ga2O3 growth by metalorganic vapor phase epitaxy14
Correlation of interfacial and dielectric characteristics in atomic layer deposited Al2O3/TiO2 nanolaminates grown with different precursor purge times14
Probing copper-boron interactions in the Cu2B8− bimetallic cluster14
Molybdenum erosion in iodine plasma at hollow cathode conditions14
Quantifying the resonant photoemission of radiation damaged Pu14
Probing surface corrosion in δ-Pu with synchrotron radiation13
Structure and properties of piezoelectric aluminum nitride thin films deposited by radio-frequency magnetron sputtering for surface acoustic wave applications13
Temperature dependence of the growth per cycle during molecular layer deposition of polyurea on plasma deposited SiO213
Substrate induced composition change during Ge2Sb2Te5 atomic layer deposition and study of initial reactions on SiO2 surface13
Photoemission study of plutonium oxycarbide13
Increasing the spatial uniformity of SiO2 films produced by plasma enhanced chemical vapor deposition using capacitively coupled plasmas with structured electrodes13
Preparation and hot corrosion properties of the AlCrFeCoNi0.5Si high-entropy alloy coating deposited by the air plasma spraying13
Numerical ellipsometry: Advanced methods for design, testing, and use of artificial intelligence for absorbing films using Jones and/or Mueller measurements13
Deposition of tungsten oxide films by reactive magnetron sputtering on different substrates13
Cathodoluminescence spectroscopy and Kelvin probe work function correlation of native point defect distributions with piezoelectric voltage in strained ZnO microwires12
Vibrational studies of gas source molecular beam epitaxy grown InAs1−x−yPySbx epilayers by infrared reflectivity and Raman scattering12
Comprehensive ion-molecule reactive collision model for processing plasmas12
Plasma induced damage on AlGaN/GaN heterostructure during gate opening for power devices12
In situ diagnostics of the Si etching structures profile in ICP SF6/C4F8 plasma: Macrostructures12
Plasma enhanced atomic layer deposition of HfO2—A potential gate dielectric for GaN-based devices12
Enhancing laser-driven flyer velocity by optimizing of modulation period of Al/Ti reactive multilayer films12
Micromechanical properties of micro- and nanocrystalline CVD diamond thin films with gradient microstructures and stresses12
Metalorganic chemical vapor deposition of (100) β-Ga2O3 on on-axis Ga2O3 substrates12
Spatiotemporal evolution of excitation temperature of vacuum arcs by tomography11
High-quality GaN thin film deposition at low temperature by ECR plasma-assisted sputter deposition method and its dependence of sapphire substrate misorientation angle11
AI-guided frame prediction techniques to model single crystal diamond growth11
Moisture barrier coating of AlN and Al2O3 multilayer film prepared by low-temperature atomic layer deposition11
Plasma-enhanced atomic layer deposition of crystalline GaN thin films on quartz substrates with sharp interfaces11
Conformal and superconformal chemical vapor deposition of silicon carbide coatings11
Uppsala and Berkeley: Two essential laboratories in the development of modern photoelectron spectroscopy11
Plasma enhanced atomic layer deposition of manganese nitride thin film from manganese amidinate and ammonia plasma11
Impact of working pressure on the crystallinity and mechanical properties of vanadium nitride coatings deposited in helium/nitrogen reactive plasma11
Empirical analysis of a hollow cathode’s intensity distribution in the vacuum ultraviolet range11
Spin-related negative magnetoresistance in germanium films11
On the growth kinetics, texture, microstructure, and mechanical properties of tungsten carbonitride deposited by chemical vapor deposition11
Quantification in high-energy resolution Auger electron spectroscopy; Proposal of a reference target convolution technique for direct spectra11
Effect of additive type and amount on structural and mechanical properties of ZrO2/B4C/Al2O3/SiC added Al 1050 based composite structures produced by vacuum infiltration—Comparative study11
Bottom angle control mechanism and optimization of slanted gratings for optical applications11
Morphology transformation of Ge2Sb2Te5 films induced by ultrashort laser pulses11
High throughput multiplexing reactor design for rapid screening of atomic/molecular layer deposition processes10
Chemical mechanism for nucleation enhancement in atomic layer deposition of Pt by surface functionalization10
Bio-tribocorrosion resistance of CoB–Co2B and Co2B layers on CoCrMo alloy10
Low-temperature ALD of metallic cobalt using the CoCOhept precursor: Simulation-assisted process development for deposition on temperature sensitive 3D-structures10
Study of microstructure and mechanical properties of cBN coatings on nanocrystalline diamond transition layer prepared by magnetron sputtering10
Infinite selectivity in dry etching process for high-aspect-ratio hole using C7HF7 gas plasma10
Controlled nucleation of metal-sulfide layers via surface functionalization with sulfur species: Enhanced initial growth of GaSx thin films10
First-principles investigation on pressure-induced phase transitions and electronic properties in GeTe10
Plasma characteristics of fixed and swept frequency power supplies in pulsed inductively coupled plasma10
Comparison of three titanium-precursors for atomic-layer-deposited TiO2 for passivating contacts on silicon10
XPS investigation of monoatomic and cluster argon sputtering of zirconium dioxide10
Zn:DLC films via PECVD-HIPIMS: Evaluation of antimicrobial activity and cytotoxicity to mammalian cells10
In situ growth of ultrathin Y2O3 capping layers for Eu-organic thin films via atomic/molecular layer deposition10
Deposition rate and optical emissions in niobium oxide processes by reactive sputtering10
Scanning electron microscopy imaging of multilayer-doped GaN: Effects of surface band bending, surface roughness, and contamination layers on doping contrast10
Erratum: “Ion beam assisted chemical vapor deposition of hybrid coatings—Process diagnostics and mechanisms” [J. Vac. Sci. Technol. A 39, 063003 (2021)]10
Microstructure and properties of laser cladding NiFeCrCoMo high entropy alloy coating on the surface of TP347 steel10
Textured growth and electrical characterization of zinc sulfide on back-end-of-the-line compatible substrates10
MOS structure with as-deposited ALD Al2O3/4H-SiC heterostructure with high electrical performance: Investigation of the interfacial region10
Atomic layer deposition of transition metal chalcogenide TaSx using Ta[N(CH3)2]3[NC(CH3)3] precursor and H2S plasma10
Two step synthesis of ultrathin transition metal tellurides10
Insight into the effect of coexistence of CO2 and H2 on stoichiometric and defective PuO2 surfaces hydriding from first-principles study10
Electroconductive and photoelectric properties of Pt/(100) β-Ga2O3 Schottky barrier diode based on Czochralski grown crystal9
Role of SiCl4 addition in CH3F/O2 based chemistry for Si3N4 etching selectively to SiO2, SiCO, and Si9
Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition9
Effect of data preprocessing and machine learning hyperparameters on mass spectrometry imaging models9
Wear and corrosion resistance of zinc-oxide and zirconium-oxide coated WE43 magnesium alloy9
Combining molecular beam epitaxy and low-energy electron microscopy with in situ magnetic susceptibility measurements within an integrated ultrahigh vacuum system9
Effect of vacuum heat treatment on tribological properties of metal-doped CuS/MoS2 coating9
Growth and properties of Sn-doped sol-gel Ga2O3 thin films9
Microkinetic based growth and property modeling of plasma enhanced atomic layer deposition silicon nitride thin film9
Self-assembled oligomeric structures of an asymmetric molecular linker; 4-isocyanophenyl disulfide on Au(111)9
The growth of self-intercalated Nb1+xSe2 by molecular beam epitaxy: The effect of processing conditions on the structure and electrical resistivity9
Revealing the mechanism of interfacial adhesion enhancement between the SiO2 film and the GaAs substrate via plasma pre-treatments9
Crystalline β-Ga2O3 thin films deposited via reactive magnetron sputtering of a liquid Ga target9
Continuous wave laser-assisted evaporation of halide perovskite thin films from a single stoichiometric source9
Numerical ellipsometry: Artificial intelligence for rapid analysis of indium tin oxide films on silicon9
Surface treatment of TaN for sub-2 nm, smooth, and conducting atomic layer deposition Ru films9
Synthesis and electrical behavior of VO2 thin films grown on SrRuO3 electrode layers9
Homogeneous high In content InxGa1−x N films by supercycle atomic layer deposition9
Low temperature epitaxial growth of Cantor-nitride thin films by magnetic field assisted magnetron sputtering9
Link between cracking mechanisms of trilayer films on flexible substrates and electro-mechanical reliability under biaxial loading9
Regression analysis of temperature-dependent alumina atomic layer deposition growth per cycle using trimethylaluminum and water as precursors9
Theoretical analysis of thermal spikes during ion bombardment of amorphous silicon nitride surfaces9
Study investigating the thermal behavior of an atmospheric pressure plasma jet on conductive and nonconductive mesh surfaces9
Polarized photoluminescence from Sn, Fe, and unintentionally doped β-Ga2O39
Large redshift in photoluminescence of InAs/AlAs short-period superlattices due to highly ordered lateral composition modulation9
Characterization of a broad beam Kaufman-type ion source operated with CHF3 and O29
Comparison of BCl3, TiCl4, and SOCl2 chlorinating agents for atomic layer etching of TiO2 and ZrO2 using tungsten hexafluoride9
GeSn alloys with ∼21% Sn grown by effusion cell molecular beam epitaxy9
Thermal atomic layer etching of cobalt using sulfuryl chloride for chlorination and tetramethylethylenediamine or trimethylphosphine for ligand addition9
Interfacial oxide and other species in trimethylaluminum-pretreated atomic layer deposition-Al2O3/GaN characterized by sputter-assisted ToF-SIMS8
Machine learning-based prediction of the electron energy distribution function and electron density of argon plasma from the optical emission spectra8
Crystallization kinetics during layer exchange of 28Si implanted Al films for fabrication of quantum computers: A theoretical model8
Foldable electrochromic NiO films8
Transition metal nanolines grown on a functionalized silver substrate8
In situ, simultaneous spectroscopic ellipsometry and quadrupole mass spectrometry studies of ZnO etching using Hacac and O2 plasma8
Neutral transport during etching of high aspect ratio features8
Area selective atomic layer deposition of ruthenium with phenol as a small molecule inhibitor8
In situ and ex situ quantification of nanoparticle fluxes in magnetron sputter inert gas condensation: A Cu nanoparticle case study8
Effect of scanning speed on microstructure and wear resistance of AlFeNb0.5NiTi high-entropy alloy coatings by laser cladding8
Atomic layer deposition of nanofilms on porous polymer substrates: Strategies for success8
Vapor phase deposition of alumina on interior surfaces of tritium storage containers8
Growth and optical properties of NiO thin films deposited by pulsed dc reactive magnetron sputtering8
Variability of band alignment between WS2 and SiO2: Intrinsic versus extrinsic contributions8
Influence of magnetic field strength on plasma, microstructure, and mechanical properties of Cr thin films deposited by MPPMS and DOMS8
Fabrication of antireflective coatings with self-cleaning function using Si–Ti modified hollow silicon mixed sol8
Bacterial and corrosion resistance of polytetrafluoroethylene-silver composite coatings by magnetron sputtering8
Design method for generating multiple colors with thickness-modulated thin-film optical filters for silicon solar cells8
Effects of N2 and O2 plasma treatments of quartz surfaces exposed to H2 plasmas8
Enhancing biocompatibility, mechanical properties, and corrosion resistance of laser cladding β-TiNb coatings8
Explainable integration of process and optical parameters for plasma etch depth prediction8
Boosting hole mobility in p-type SnOx (x < 2) film through Ge incorporation via co-sputtering8
Half-century old Berkeley idea now finding missing links of nuclear quadrupole moments8
β-Ga2O3 MOSFETs on highly uniform 2-in. unintentionally doped vertical Bridgman substrates8
Sn-doping concentration dependence of electrical, optical, and magnetic properties in epitaxial Mn-doped indium tin oxide films deposited by RF magnetron sputtering8
Probing trade-off between critical size and velocity in cold-pray: An atomistic simulation8
Effect of ozone and humidity addition on hydrogen peroxide generation characteristics of plasmas in oxygen bubbles8
Area-selective atomic/molecular layer deposition via block copolymer approach: Zn-benzene dithiol deposition as a case study8
Insight into the mechanism of lattice damage in ground and polished InAs substrates8
Cu2O/ZnO heterojunction self-powered photodetector performance regulation8
Insufficient reporting of x-ray photoelectron spectroscopy instrumental and peak fitting parameters (metadata) in the scientific literature8
Annealing effect on the Si-Ga2O3 thin films by PEALD for various applications with mechanism analysis8
Effect of magnetic field on capacitively coupled plasma modulated by electron beam injection8
Near-surface electronic structure in strained Ni-ferrite films: An x-ray absorption spectroscopy study8
Stabilizing far-from-equilibrium (Mo,Ti)S2 thin films by metal sulfurization at reduced temperature7
Effect of deposition temperature on the phase structure, mechanical performance, and corrosion resistance of CrMoN coatings prepared by magnetron sputtering7
Effect of fabrication processes before atomic layer deposition on β-Ga2O3/HfO2/Cr/Au metal–oxide–semiconductor capacitors7
Review of the research status and development of laser cladding high-entropy alloys7
Adapting FEFF to 5f angular momentum coupling7
Materials’ properties of low temperature deposited Cu/W and Cu/Cr multilayer thin films using high power impulse magnetron sputtering7
Effect of annealing on the magnetic anisotropy of GaMnAsP layers with graded P concentration7
Molecular beam epitaxy growth of wafer-scale SnSe van der Waals ultrathin layers7
Challenges in porosity characterization of thin films: Cross-evaluation of different techniques7
Cut-and-pasting ligands: The structure/function relationships of a thermally robust Mo(VI) precursor7
XPS guide for insulators: Electron flood gun operation and optimization, surface charging, controlled charging, differential charging, useful FWHMs, problems and solutions, and advice7
Improved optical efficiency of GaAs-based infrared vertical-cavity surface-emitting laser enabled by combining a metallic reflector and a Bragg reflector7
An examination of the performance of molecular dynamics force fields: Silicon and silicon dioxide reactive ion etching7
Numerical study of the effects of discharge parameters on capacitively coupled plasma in a magnetic field7
Thermoelectric performance of bulklike MoS2 thin films: Fabrication, characterization, and Seebeck coefficient analysis7
Rapid preparation of superhydrophobic and corrosion-resistant surfaces based on etching-assisted phosphating modification and analysis of their corrosion resistance mechanisms7
Reevaluation of XPS Pt 4f peak fitting: Ti 3s plasmon peak interference and Pt metallic peak asymmetry in Pt@TiO2 system7
Arsenic-flux dependence of surface morphology in InAs homoepitaxy7
Atomic layer etching of SiO2 using sequential exposures of Al(CH3)3 and H2/SF6 plasma7
Effect of SiO2 buffer layer on phase transition properties of VO2 films fabricated by low-pressure chemical vapor deposition7
On the limitations of thermal atomic layer deposition of InN using ammonia7
Chemical significance of x-ray photoelectron spectroscopy binding energy shifts: A Perspective7
CF4 plasma-based atomic layer etching of Al2O3 and surface smoothing effect7
Effect of focus ring with external circuit on cathode edge sheath dynamics in a capacitively coupled plasma7
Practical guide on chemometrics/informatics in x-ray photoelectron spectroscopy (XPS). II. Example applications of multiple methods to the degradation of cellulose and tartaric acid7
Evolution of β-Ga2O3 to γ -Ga2O3 solid-solution epitaxial films after high-temperature annealing7
Plasma-enhanced atomic layer deposition of crystalline Ga2S3 thin films7
VAMAS TWA2 interlaboratory comparison: Surface analysis of TiO2 nanoparticles using ToF-SIMS7
Investigation of arc spot splitting behavior on aluminum, titanium, and their alloy cathodes under different gas flows7
Origin of chemical shifts in K 2p x-ray photoelectron spectra7
Sequence modeling for predicting three-dimensional plasma etching profiles with deep learning7
Conduction band nonparabolicity, chemical potential, and carrier concentration of intrinsic InSb as a function of temperature7
Adsorption-controlled epitaxy and twin control of γ -GaSe on GaAs (111)B7
David Shirley: Pioneer, teacher, mentor, and visionary scientific leader7
Investigation of the dielectric recovery process of vacuum arc in double breaks by planar laser-induced fluorescence7
Erratum: “Isotropic atomic layer etching of MgO-doped lithium niobate using sequential exposures of H2 and SF6/Ar plasmas” [J. Vac. Sci. Technol. A 42, 062603 (2024)]7
Influence of nitriding time on the microstructural evolution, mechanical properties, and tribological performance of Ti–N nitrided layers via microwave plasma nitriding7
Benchmarking large language models for materials synthesis: The case of atomic layer deposition7
Optimizing indium concentration in ZnO thin films for enhanced optical, electronic, and thermoelectric applications7
Evaluation of carbon incorporation in sulfide thin films grown by hybrid pulsed laser deposition7
Over 6 MV/cm operation in β-Ga2O3 Schottky barrier diodes with IrO2 and RuO2 anodes deposited by molecular beam epitaxy7
Effect of space charge-limited mechanism on the x-ray detection performance of Ni/Au β-Ga2O3 Schottky diode at high temperature7
Microstructure and properties of Mg/Ti joint welded by resistance spot welding with an aluminum interlayer7
Evaluation of electrical characteristics through band alignment and defect analysis of ultrathin Pt/ZrO2–Al2O3–ZrO2/TiN DRAM metal–insulator–metal capacitors7
Area selective PECVD on metal oxide resist7
Low temperature, area-selective atomic layer deposition of NiO and Ni6
Active learning with moment tensor potentials to predict material properties: Ti0.5Al0.5N at elevated temperature6
Area-selective atomic layer deposition of Al2O3 film on Cu and Si substrates using bulky Al precursor AlMe2(iPr-AMD)6
Nonlinear decomposition of gallium x-ray induced Auger transitions: A new path to quantify gallium-based III–V materials6
Hydrogen bond-mediated activation of HF in SiO2 thermal dry etching: A first-principles study of catalytic additives6
Convolutional neural network-based visual classification of melt-fraction levels in phase change materials6
Measurements of atomic hydrogen recombination coefficients and the reduction of Al2O3 using a heat flux sensor6
Ultrathin stable Ohmic contacts for high-temperature operation of β-Ga2O3 devices6
On simulating thin-film processes at the atomic scale using machine-learned force fields6
On the possible nature of deep centers in Ga2O36
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