Journal of Vacuum Science & Technology A

Article	Citations
Extreme atomic-scale surface roughening: Amino acids on Ag on Au(111)	91
Deposition of sputtered NiO as a p-type layer for heterojunction diodes with Ga2O3	76
Aminosilane small molecule inhibitors for area-selective deposition: Study of substrate-inhibitor interfacial interactions	49
Applications and mechanisms of anisotropic two-step Si3N4 etching with hydrogen plasma conditioning	47
Role of nanoscale surface defects on Sn adsorption and diffusion behavior on oxidized Nb(100)	43
Size distribution of clusters and nucleation preference of trimers during SiC (0001) surface epitaxial growth under low coverage	43
Study of synthesis strategies to improve the electrical properties of magnetron sputtered copper oxide thin films	42
Comparing sputter rates, depth resolution, and ion yields for different gas cluster ion beams (GCIB): A practical guide to choosing the best GCIB for every application	40
Erratum: “Microscopic origins of radiative performance losses in thin-film solar cells at the example of (Ag,Cu)(In,Ga)Se2 devices” [J. Vac. Sci. Technol. A 42, 022803 (2024)]	37
Effects of duty cycle and nitrogen flow rate on the mechanical properties of (V,Mo)N coatings deposited by high-power pulsed magnetron sputtering	31
Kinetic Monte Carlo study on the effect of growth conditions on the epitaxial growth of 3C–SiC (0001) vicinal surface	30
Plasma enhanced atomic layer etching of high-k layers on WS2	28
Nitrogen-incorporated tetrahedral amorphous carbon optically transparent thin film electrode	28
Core-shell metallic nanotube arrays for highly sensitive surface-enhanced Raman scattering (SERS) detection	27
Peak intensities in Auger electron spectroscopy for quantification: Relationship between differentiated spectral intensities and direct peak areas	25
Self-powered solar blind ultraviolet photodetector based on amorphous (In0.23Ga0.77)2O3/bixbyite (In0.67Ga0.33)2O3 heterojunction	25
Using auxiliary electrochemical working electrodes as probe during contact glow discharge electrolysis: A proof of concept study	25
Use of in situ electrical conductance measurements to understand the chemical mechanisms and chamber wall effects during vapor phase infiltration doping of poly(aniline) with TiCl4 + H2O	24
Erratum: “MoS2-assisted growth of highly-oriented AlN thin films by low-temperature van der Waals epitaxy” [J. Vac. Sci. Technol. A 42, 050401 (2024)]	21
High surface quality Y2SiO5 silicate-crystal waveguides etched by chlorine-based inductive coupled plasma reactive ion etching	20
Transport and trap states in proton irradiated ultra-thick κ-Ga2O3	20
Correlating chemical and electronic states from quantitative photoemission electron microscopy of transition-metal dichalcogenide heterostructures	19
Implementation of an artificial spiking neuron with photoreceptor functionality using gas discharge tubes	19
Friction and wear behavior of C implanted copper via ion beam-assisted bombardment	18
High crystalline quality homoepitaxial Si-doped β-Ga2O3(010) layers with reduced structural anisotropy grown by hot-wall MOCVD	18

Enhancing chemical vapor deposition growth and fabrication techniques to maximize hole conduction in tungsten diselenide for monolithic CMOS integration	18
Novel principal component analysis tool based on python for analysis of complex spectra of time-of-flight secondary ion mass spectrometry	18
Analysis of pulsed direct current reactive magnetron sputtering on a silicon target	18
Understanding the unique optical and vibrational signatures of sequential infiltration synthesis derived indium oxyhydroxide clusters for CO2 absorption	17
Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition	17
Tailoring structure, morphology, and tribo-mechanical properties of HiPIMS-deposited CrxNy coatings for enhanced performance in wear and corrosion protection	17
Application of high-spatial-resolution distributed fiber-optic sensing technique for neutral gas temperature mapping in inductively coupled Ar plasmas	16
On the interplay between a novel iron and iron-carbide atomic layer deposition process, the carbon nanotube growth, and the metal–carbon nanotube coating properties on silica substrates	16
Testing commonly used background removal procedures for XPS quantitation of homogeneous material: Fe2O3, a transition metal oxide example	16
Hardness, adhesion, and wear behavior of magnetron cosputtered Ti:Zr-O-N thin films	16
In situ metal organic chemical vapor deposition of ultrathin sp2-bonded boron nitride dielectric on gallium nitride	16
Study on the modification of TC11 titanium alloy microarc oxidized film layer by ZrO2 particles	16
Conformal coating of macroscopic nanoparticle compacts with ZnO via atomic layer deposition	16
Ordered deficient perovskite La2/3TiO3 films grown via molecular beam epitaxy	15
Method for extracting the intrinsic diffusion coefficient from grain boundary diffusion depth profile	15
In situ studies on atomic layer etching of aluminum oxide using sequential reactions with trimethylaluminum and hydrogen fluoride	15
Enhancing minority carrier lifetime in Ge: Insights from HF and HCl cleaning procedures	14
Stability investigation of Eu3+ doped CaF2 thin film with ZnO coating under electron beam irradiation	14
Hot corrosion behavior of NiCoCrAlY laser cladding coating on 17-4PH stainless steel before and after high-current pulsed electron beam irradiation	14
Amorphous carbon thin films: Mechanisms of hydrogen incorporation during magnetron sputtering and consequences for the secondary electron emission	14
Novel high-efficiency plasma nitriding process utilizing a high power impulse magnetron sputtering discharge	14
Significance of plasma-surface interactions in the etch behavior of low-k materials	13
Dependence of persistent photoconductivity on the thickness of β-Ga2O3 thin film photodetectors on c-plane sapphire via magnetron sputtering	13
Spin- and time-resolved photoelectron spectroscopy and diffraction studies using time-of-flight momentum microscopes	13
Evaluation of stress and elastic energy relief efficiency in a hard coating with a metal interlayer—Using TiN/Ti as a model system	13
Surface temperature of a 2 in. Ti target during DC magnetron sputtering	13
Improved growth quality of epitaxial ZnTe thin films on Si (111) wafer with ZnSe buffer layer	13
Detection of H2 facilitated by ionic liquid gating of tungsten oxide films	13
Effect of the repeated application of First Contact™ polymer on xenon-difluoride passivated lithium fluoride on aluminum surfaces for space telescopes	13
Nonpyrophoric alternative to trimethylaluminum for the atomic layer deposition of Al2O3	13
Methyl-methacrylate based aluminum hybrid film grown via three-precursor molecular layer deposition	13
Anisotropic magnetoresistance and planar Hall effect in correlated and topological materials	13
Enhanced plasma resistance of uniform ALD-Y2O3 thin films for chamber components’ coatings	12
Structure and corrosion resistance of electron-beam-strengthened and micro-arc oxidized coatings on magnesium alloy AZ31	12
Probabilistic zero-dimensional model with calibration and uncertainty quantification for capacitively coupled plasma reactor simulations	12
Modeling scale-up of particle coating by atomic layer deposition	12
Surface characterization of ultrathin atomic layer deposited molybdenum oxide films using high-sensitivity low-energy ion scattering	12
Band offsets at metalorganic chemical vapor deposited β-(AlxGa1−x)2O3/β-Ga2O3 interfaces—Crystalline orientation dependence	12
Design and fabrication of color-generating nitride based thin-film optical filters for photovoltaic applications	12
Preparation of stable and highly hydrophobic coatings via one-step spray method and study of their anti-icing performance	12
Ga+-focused ion beam damage in n-type Ga2O3	12
Metalorganic chemical vapor deposition of (100) β-Ga2O3 on on-axis Ga2O3 substrates	12
Comparison of triethylgallium and diethylgallium ethoxide for β-Ga2O3 growth by metalorganic vapor phase epitaxy	12
Molybdenum erosion in iodine plasma at hollow cathode conditions	11
My times with Bill Wolfer	11
Influence of annealing temperature of nickel oxide as hole transport layer applied for inverted perovskite solar cells	11
Engineering ordered arrangements of oxygen vacancies at the surface of superconducting La2CuO4 thin films	11
Spatial atomic layer deposition: Transport-reaction modeling and experimental validation of film geometry	11
Enhancement of CrN-polyetherimide adhesion by hardening substrate’s surface	11
Room-temperature and high-quality HfO2/SiO2 gate stacked film grown by neutral beam enhanced atomic layer deposition	11

Photoemission study of plutonium oxycarbide	11
Optical emission spectroscopy and Langmuir probe studies of an intermediate pressure, supersonic microplasma jet deposition source	11
Plasma enhanced atomic layer deposition of HfO2—A potential gate dielectric for GaN-based devices	11
Probing copper-boron interactions in the Cu2B8− bimetallic cluster	10
Series resonance effects of a variable inductor termination on the nonpowered electrode in capacitively coupled plasmas	10
Comprehensive ion-molecule reactive collision model for processing plasmas	10
Micromechanical properties of micro- and nanocrystalline CVD diamond thin films with gradient microstructures and stresses	10
Origin of enhanced thermal atomic layer etching of amorphous HfO2	10
Substrate induced composition change during Ge2Sb2Te5 atomic layer deposition and study of initial reactions on SiO2 surface	10
Correlation of interfacial and dielectric characteristics in atomic layer deposited Al2O3/TiO2 nanolaminates grown with different precursor purge times	10
Radiation damage effects on electronic and optical properties of β-Ga2O3 from first-principles	10
Polydimethylsiloxane surface irradiated by nitrogen ions: Influence of low molecular fractions	10
Gliding arc discharge plasma treatment for promoting germination of wheat seed at low ambient temperature	10
Stoichiometry tuning of TaN films through ion treatment: Molecular dynamics study	10
Quantifying the resonant photoemission of radiation damaged Pu	10
Deposition of tungsten oxide films by reactive magnetron sputtering on different substrates	10
Effect of atomic layer annealing in plasma-enhanced atomic layer deposition of aluminum nitride on silicon	10
Zn:DLC films via PECVD-HIPIMS: Evaluation of antimicrobial activity and cytotoxicity to mammalian cells	9
Conformal and superconformal chemical vapor deposition of silicon carbide coatings	9
Impact of working pressure on the crystallinity and mechanical properties of vanadium nitride coatings deposited in helium/nitrogen reactive plasma	9
Preparation and hot corrosion properties of the AlCrFeCoNi0.5Si high-entropy alloy coating deposited by the air plasma spraying	9
Plasma induced damage on AlGaN/GaN heterostructure during gate opening for power devices	9
Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition	9
Adsorption mechanism of dimeric Ga precursors in metalorganic chemical vapor deposition of gallium nitride	9
Atomic layer deposition of transition metal chalcogenide TaSx using Ta[N(CH3)2]3[NC(CH3)3] precursor and H2S plasma	9
Room-temperature atomic layer deposition of iron oxide using plasma excited humidified argon	9
Study of microstructure and mechanical properties of cBN coatings on nanocrystalline diamond transition layer prepared by magnetron sputtering	9
MOS structure with as-deposited ALD Al2O3/4H-SiC heterostructure with high electrical performance: Investigation of the interfacial region	9
Cathodoluminescence spectroscopy and Kelvin probe work function correlation of native point defect distributions with piezoelectric voltage in strained ZnO microwires	9
Selective vapor sensors with thin-film MoS2-coated optical fibers	9
Nitrogen ion-implanted resistive regions for edge termination of vertical Ga2O3 rectifiers	9
Enhancing laser-driven flyer velocity by optimizing of modulation period of Al/Ti reactive multilayer films	9
Quantification in high-energy resolution Auger electron spectroscopy; Proposal of a reference target convolution technique for direct spectra	9
Infinite selectivity in dry etching process for high-aspect-ratio hole using C7HF7 gas plasma	9
Uppsala and Berkeley: Two essential laboratories in the development of modern photoelectron spectroscopy	9
High-quality GaN thin film deposition at low temperature by ECR plasma-assisted sputter deposition method and its dependence of sapphire substrate misorientation angle	9
Bio-tribocorrosion resistance of CoB–Co2B and Co2B layers on CoCrMo alloy	9
Erratum: “Ion beam assisted chemical vapor deposition of hybrid coatings—Process diagnostics and mechanisms” [J. Vac. Sci. Technol. A 39, 063003 (2021)]	9
Disclosing the response of the surface electronic structure in SrTiO3 (001) to strain	9
Nucleation and quantum confinement of nano-platelet Bi2–Bi2Se3	9
Deposition rate and optical emissions in niobium oxide processes by reactive sputtering	9
Two step synthesis of ultrathin transition metal tellurides	9
Polarized photoluminescence from Sn, Fe, and unintentionally doped β-Ga2O3	9
Effect of vacuum heat treatment on tribological properties of metal-doped CuS/MoS2 coating	8
Chemical mechanism for nucleation enhancement in atomic layer deposition of Pt by surface functionalization	8
Empirical analysis of a hollow cathode’s intensity distribution in the vacuum ultraviolet range	8
Plasma-enhanced atomic layer deposition of crystalline GaN thin films on quartz substrates with sharp interfaces	8
Experimental study of transport properties of Weyl semimetal LaAlGe thin films grown by molecular beam epitaxy	8
Moisture barrier coating of AlN and Al2O3 multilayer film prepared by low-temperature atomic layer deposition	8
Microstructure and properties of laser cladding NiFeCrCoMo high entropy alloy coating on the surface of TP347 steel	8
Plasma enhanced atomic layer deposition of manganese nitride thin film from manganese amidinate and ammonia plasma	8
Shake loss intensities in x-ray photoelectron spectroscopy: Theory, experiment, and atomic composition accuracy for MgO and related compounds	8
AI-guided frame prediction techniques to model single crystal diamond growth	8
Comparison of three titanium-precursors for atomic-layer-deposited TiO2 for passivating contacts on silicon	8
Insight into the effect of coexistence of CO2 and H2 on stoichiometric and defective PuO2 surfaces hydriding from first-principles study	8
Gas source molecular epitaxy of Ge1−ySny materials and devices using high order Ge4H10 and Ge5H12 hydrides	8
Scanning electron microscopy imaging of multilayer-doped GaN: Effects of surface band bending, surface roughness, and contamination layers on doping contrast	8
Low-temperature ALD of metallic cobalt using the CoCOhept precursor: Simulation-assisted process development for deposition on temperature sensitive 3D-structures	8
Spin-related negative magnetoresistance in germanium films	8
On the growth kinetics, texture, microstructure, and mechanical properties of tungsten carbonitride deposited by chemical vapor deposition	8
Bottom angle control mechanism and optimization of slanted gratings for optical applications	8
In situ diagnostics of the Si etching structures profile in ICP SF6/C4F8 plasma: Macrostructures	8
Comparison of BCl3, TiCl4, and SOCl2 chlorinating agents for atomic layer etching of TiO2 and ZrO2 using tungsten hexafluoride	8
Continuous wave laser-assisted evaporation of halide perovskite thin films from a single stoichiometric source	8
Spatiotemporal evolution of excitation temperature of vacuum arcs by tomography	8
XPS investigation of monoatomic and cluster argon sputtering of zirconium dioxide	8
In situ growth of ultrathin Y2O3 capping layers for Eu-organic thin films via atomic/molecular layer deposition	8
High throughput multiplexing reactor design for rapid screening of atomic/molecular layer deposition processes	8
Effect of additive type and amount on structural and mechanical properties of ZrO2/B4C/Al2O3/SiC added Al 1050 based composite structures produced by vacuum infiltration—Comparative study	8
Atomic step disorder on polycrystalline surfaces leads to spatially inhomogeneous work functions	8
Effect of data preprocessing and machine learning hyperparameters on mass spectrometry imaging models	8
Crystallization kinetics during layer exchange of 28Si implanted Al films for fabrication of quantum computers: A theoretical model	7
Probing trade-off between critical size and velocity in cold-pray: An atomistic simulation	7
Cu2O/ZnO heterojunction self-powered photodetector performance regulation	7
Combining molecular beam epitaxy and low-energy electron microscopy with in situ magnetic susceptibility measurements within an integrated ultrahigh vacuum system	7
Effect of interface roughness on the tribo-corrosion behavior of diamond like carbon coatings on titanium alloy	7
Surface treatment of TaN for sub-2 nm, smooth, and conducting atomic layer deposition Ru films	7
Insufficient reporting of x-ray photoelectron spectroscopy instrumental and peak fitting parameters (metadata) in the scientific literature	7
Characterization of a broad beam Kaufman-type ion source operated with CHF3 and O2	7
Growth and properties of Sn-doped sol-gel Ga2O3 thin films	7

Microkinetic based growth and property modeling of plasma enhanced atomic layer deposition silicon nitride thin film	7
Influence of HfO2 and SiO2 interfacial layers on the characteristics of n-GaN/HfSiOx capacitors using plasma-enhanced atomic layer deposition	7
Enhancing biocompatibility, mechanical properties, and corrosion resistance of laser cladding β-TiNb coatings	7
Benchmarking large language models for materials synthesis: The case of atomic layer deposition	7
Microstructure and properties of Mg/Ti joint welded by resistance spot welding with an aluminum interlayer	7
Machine learning-based prediction of the electron energy distribution function and electron density of argon plasma from the optical emission spectra	7
Growth and optical properties of NiO thin films deposited by pulsed dc reactive magnetron sputtering	7
Neutral transport during etching of high aspect ratio features	7
Theoretical analysis of thermal spikes during ion bombardment of amorphous silicon nitride surfaces	7
Transparent conductive properties of TiON thin films	7
The growth of self-intercalated Nb1+xSe2 by molecular beam epitaxy: The effect of processing conditions on the structure and electrical resistivity	7
Numerical ellipsometry: Artificial intelligence for rapid analysis of indium tin oxide films on silicon	7
Self-assembled oligomeric structures of an asymmetric molecular linker; 4-isocyanophenyl disulfide on Au(111)	7
Link between cracking mechanisms of trilayer films on flexible substrates and electro-mechanical reliability under biaxial loading	7
Effect of magnetic field on capacitively coupled plasma modulated by electron beam injection	7
Optoelectronic properties of transparent oxide semiconductor ASnO3 (A = Ba, Sr, and Ca) epitaxial films and thin film transistors	7
Sn-doping concentration dependence of electrical, optical, and magnetic properties in epitaxial Mn-doped indium tin oxide films deposited by RF magnetron sputtering	7
Evolution of β-Ga2O3 to γ -Ga2O3 solid-solution epitaxial films after high-temperature annealing	7
Thermal atomic layer etching of cobalt using sulfuryl chloride for chlorination and tetramethylethylenediamine or trimethylphosphine for ligand addition	7
Revealing the mechanism of interfacial adhesion enhancement between the SiO2 film and the GaAs substrate via plasma pre-treatments	7
Evaluation of electrical characteristics through band alignment and defect analysis of ultrathin Pt/ZrO2–Al2O3–ZrO2/TiN DRAM metal–insulator–metal capacitors	7
Wear and corrosion resistance of zinc-oxide and zirconium-oxide coated WE43 magnesium alloy	7
Large redshift in photoluminescence of InAs/AlAs short-period superlattices due to highly ordered lateral composition modulation	7
Low temperature epitaxial growth of Cantor-nitride thin films by magnetic field assisted magnetron sputtering	7
Role of SiCl4 addition in CH3F/O2 based chemistry for Si3N4 etching selectively to SiO2, SiCO, and Si	7
Homogeneous high In content InxGa1−x N films by supercycle atomic layer deposition	7
Synthesis and electrical behavior of VO2 thin films grown on SrRuO3 electrode layers	7
Electroconductive and photoelectric properties of Pt/(100) β-Ga2O3 Schottky barrier diode based on Czochralski grown crystal	7
Comparison of 2D crystals formed by dissociative adsorption of fluorinated and nonfluorinated alkyl iodides on Cu(111)	6
Atomic layer etching of SiO2 using sequential exposures of Al(CH3)3 and H2/SF6 plasma	6
Insight into the mechanism of lattice damage in ground and polished InAs substrates	6
Conduction band nonparabolicity, chemical potential, and carrier concentration of intrinsic InSb as a function of temperature	6
Cut-and-pasting ligands: The structure/function relationships of a thermally robust Mo(VI) precursor	6
Improved optical efficiency of GaAs-based infrared vertical-cavity surface-emitting laser enabled by combining a metallic reflector and a Bragg reflector	6
Reevaluation of XPS Pt 4f peak fitting: Ti 3s plasmon peak interference and Pt metallic peak asymmetry in Pt@TiO2 system	6
X-ray photoelectron spectroscopy study of Pt-cluster-induced electronic-state change of CeO2(111) surfaces	6
Growth of topological insulator Bi2Se3 particles on GaAs via droplet epitaxy	6
In situ and ex situ quantification of nanoparticle fluxes in magnetron sputter inert gas condensation: A Cu nanoparticle case study	6
Oxygen incorporation in AlN films grown by plasma-enhanced atomic layer deposition	6
Plasma-enhanced atomic layer deposition of crystalline Ga2S3 thin films	6
CF4 plasma-based atomic layer etching of Al2O3 and surface smoothing effect	6
Bacterial and corrosion resistance of polytetrafluoroethylene-silver composite coatings by magnetron sputtering	6
Effect of SiO2 buffer layer on phase transition properties of VO2 films fabricated by low-pressure chemical vapor deposition	6
Half-century old Berkeley idea now finding missing links of nuclear quadrupole moments	6
Variability of band alignment between WS2 and SiO2: Intrinsic versus extrinsic contributions	6
Optimizing indium concentration in ZnO thin films for enhanced optical, electronic, and thermoelectric applications	6
Sequence modeling for predicting three-dimensional plasma etching profiles with deep learning	6
Near-surface electronic structure in strained Ni-ferrite films: An x-ray absorption spectroscopy study	6
Influence of nitriding time on the microstructural evolution, mechanical properties, and tribological performance of Ti–N nitrided layers via microwave plasma nitriding	6
Effects of N2 and O2 plasma treatments of quartz surfaces exposed to H2 plasmas	6
Interfacial oxide and other species in trimethylaluminum-pretreated atomic layer deposition-Al2O3/GaN characterized by sputter-assisted ToF-SIMS	6
VAMAS TWA2 interlaboratory comparison: Surface analysis of TiO2 nanoparticles using ToF-SIMS	6
Effect of ozone and humidity addition on hydrogen peroxide generation characteristics of plasmas in oxygen bubbles	6
Practical guide on chemometrics/informatics in x-ray photoelectron spectroscopy (XPS). II. Example applications of multiple methods to the degradation of cellulose and tartaric acid	6
Atomic layer deposition of nanofilms on porous polymer substrates: Strategies for success	6
Over 6 MV/cm operation in β-Ga2O3 Schottky barrier diodes with IrO2 and RuO2 anodes deposited by molecular beam epitaxy	6
Chemical significance of x-ray photoelectron spectroscopy binding energy shifts: A Perspective	6
David Shirley: Pioneer, teacher, mentor, and visionary scientific leader	6
Foldable electrochromic NiO films	6
Adapting FEFF to 5f angular momentum coupling	6
XPS guide for insulators: Electron flood gun operation and optimization, surface charging, controlled charging, differential charging, useful FWHMs, problems and solutions, and advice	6
Effect of O2 plasma exposure time during atomic layer deposition of amorphous gallium oxide	6
Growth of pentacene molecules on Tsai-type quasicrystals and related crystal surfaces	6
Effect of fabrication processes before atomic layer deposition on β-Ga2O3/HfO2/Cr/Au metal–oxide–semiconductor capacitors	6
Investigation of arc spot splitting behavior on aluminum, titanium, and their alloy cathodes under different gas flows	6
In situ, simultaneous spectroscopic ellipsometry and quadrupole mass spectrometry studies of ZnO etching using Hacac and O2 plasma	6
Numerical study of the effects of discharge parameters on capacitively coupled plasma in a magnetic field	6
Challenges in porosity characterization of thin films: Cross-evaluation of different techniques	6
Fabrication of antireflective coatings with self-cleaning function using Si–Ti modified hollow silicon mixed sol	6
Elucidating interactions of the epoxide ring on Pt(111) by comparing reaction pathways of propylene oxide and 1-epoxy-3-butene	6
Optical properties of La1−xSrxVO3 (0 ≤ x ≤ 1) films grown on LSAT substrates using radio frequency sputtering deposition	6
On the limitations of thermal atomic layer deposition of InN using ammonia	6
Influence of magnetic field strength on plasma, microstructure, and mechanical properties of Cr thin films deposited by MPPMS and DOMS	6
Materials’ properties of low temperature deposited Cu/W and Cu/Cr multilayer thin films using high power impulse magnetron sputtering	6
Interaction of Mg with the ionic liquid 1-butyl-1-methylpyrrolidinium bis(trifluoromethylsulfonyl)imide—An experimental and computational model study of the electrode–electrolyte interface in post-lit	6
Area selective PECVD on metal oxide resist	6
Design method for generating multiple colors with thickness-modulated thin-film optical filters for silicon solar cells	6
Effect of annealing on the magnetic anisotropy of GaMnAsP layers with graded P concentration	6
Effect of focus ring with external circuit on cathode edge sheath dynamics in a capacitively coupled plasma	6
An examination of the performance of molecular dynamics force fields: Silicon and silicon dioxide reactive ion etching	6
Arsenic-flux dependence of surface morphology in InAs homoepitaxy	6
Flow-modulated deposition of sp2-boron nitride using diborane and ammonia on chemomechanically polished (0001) 4H-SiC substrates	5
Erosion of focus rings in capacitively coupled plasma etching reactors	5
Comparative study of film quality on c axis oriented AlN deposited by pulsed DC and RF reactive sputtering with optical emission spectroscopy big data analysis	5
Cyclone-type vaporizer for mass delivery of atomic layer deposition precursors: Simulation and experimental studies	5
High-performance of ZnO/TiO2 heterostructured thin-film photocatalyst fabricated via atomic layer deposition	5
Synthesis of ultrathin heteroepitaxial 3C-SiC films by pyrolysis of molecular layer deposition polyamide films on Si	5
Practical guides for x-ray photoelectron spectroscopy: Use of argon ion beams for sputter depth profiling and cleaning	5
Using the inelastic background in hard x-ray photoelectron spectroscopy for a depth-resolved analysis of the CdS/Cu(In,Ga)Se2 interface	5
Integrated design of covalent organic frameworks-based solid-state electrolytes and cathode materials for constructing high-performance lithium metal batteries	5
Homoepitaxial growth of CaWO4	5
Dynamical reverse folding and residual gas expansion models of flexible thin films	5
Observations of the Ag(3 × 1) phase on Ge(111)	5
Active learning with moment tensor potentials to predict material properties: Ti0.5Al0.5N at elevated temperature	5
Study on the thermocyclic protection performance of ultrahigh temperature ceramic SiC–Si–Hf(Ta)B2 coating for static oxidation and ablation environments up to 2300 °C	5