IEEE Electron Device Letters

Papers
(The H4-Index of IEEE Electron Device Letters is 40. The table below lists those papers that are above that threshold based on CrossRef citation counts [max. 250 papers]. The publications cover those that have been published in the past four years, i.e., from 2021-11-01 to 2025-11-01.)
ArticleCitations
Blank Page150
Table of Contents95
Table of Contents77
IEEE Electron Device Letters Publication Information72
Table of Contents67
Front Cover63
Hot Carrier Degradation Reduction in Metal Oxide Thin-Film Transistors by Implementing a Lightly Doped Drain-Like Structure63
Blank Page62
Choice of Metal as Gate Electrode of Thin-Film Transistor With High-k Gate Dielectric60
Plasma Processes for Vertical Niobium Nitride Superconducting Through Silicon Vias58
First Experiment of a 600-GHz CW Gyrotron Developed as Light Source for EMF Exposure Assessment57
High-Efficiency Metal-Insulator-Metal Electron Emitter Based on Porous Alumina Film54
Modulation of Ciss of a 4H-SiC Planar MOSFET With a Shorter Sidewall and a Thicker Gate54
0.18 dB Low-Noise Figure at 10 GHz for GaN MIS-HEMT With Plasma-Enhanced Atomic Layer Deposition SiN Layer54
Triple-Node FinFET With Non-Ohmic Schottky Junctions for Synaptic Devices53
Conductive Bridging Random Access Memory-Based Switch Matrix for Reconfigurable Interconnection of Chiplet Integration53
Ultrathin Interfacial Layer and Pre-Gate Annealing to Suppress Virtual Gate Formation in GaN-Based Transistors: The Impact of Trapping and Fluorine Inclusion52
Changes to the Editorial Board52
Highly Sensitive Mutual-Capacitive Fingerprint Sensor With Reference Electrode52
Rapid On-Wafer Quality Screening of AlGaN/GaN Superlattice Castellated Field Effect Transistors Using Short-Term Stress and Electroluminescence52
A Novel Non-Volatile Optoelectronic Memory: The Photon-Triggered FGMOS52
3D Van der Pauw Device for MOS Channel Characterization on 4H-SiC Trench Sidewalls51
Au- and Ag-Containing Contacts to GaSb-Photovoltaic Converters51
Self-Curable Synaptor With Tri-Node Charge- Trap FinFET for Semi-Supervised Learning49
RFIC 2023 Call for Papers49
Table of Contents48
EDS Meetings Calendar47
IEEE Electron Device Letters information for authors46
Blank Page46
IEEE Electron Device Letters Information for Authors46
Front Cover45
High-Performance SAW Device Based on Zinc-Oxide Substrate With Electric Field Regulating Graphene Film Conductivity for Signal Amplifier44
IEEE Electron Device Letters Information for Authors43
Exploration of the exciting world of multifunctional oxide-based electronic devices: from material to system-level applications42
Table of Contents42
GaN Optopairs With Asymmetric Spiral Patterns for High-Resolution 360° Angle Detection41
EDS Meetings Calendar41
Beneficial Hydrogen Doping in Single Spinel Phase Crystallized IZTO Thin-Film Transistors41
A Novel Insulated Gate Trigger Thyristor Integrated With Gate Transient Voltage Suppressor for Ultrahigh di/dt Pulse Switching41
A Compact Model of Amorphous InGaZnO TFTs to Predict Temperature-Dependent Characteristics40
La In Situ Doping-Engineered HZO Capacitors Achieving High- k (~56.2) and Ferroelectricity (2Pr~43.4 μ C/cm2) at 1.5 MV/Cm With 1010 Cycles Endurance40
Short-Length, High-Efficiency S-Band Coaxial Cavity Relativistic Multibeam Klystron Amplifier for Potential High Power Microwave Application40
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