IEEE Electron Device Letters

Papers
(The H4-Index of IEEE Electron Device Letters is 41. The table below lists those papers that are above that threshold based on CrossRef citation counts [max. 250 papers]. The publications cover those that have been published in the past four years, i.e., from 2022-01-01 to 2026-01-01.)
ArticleCitations
Blank Page159
Table of Contents99
Table of Contents78
IEEE Electron Device Letters Publication Information78
Table of Contents71
Front Cover69
Blank Page65
High-Efficiency Metal-Insulator-Metal Electron Emitter Based on Porous Alumina Film64
Plasma Processes for Vertical Niobium Nitride Superconducting Through Silicon Vias64
Modulation of Ciss of a 4H-SiC Planar MOSFET With a Shorter Sidewall and a Thicker Gate63
Conductive Bridging Random Access Memory-Based Switch Matrix for Reconfigurable Interconnection of Chiplet Integration59
Rapid On-Wafer Quality Screening of AlGaN/GaN Superlattice Castellated Field Effect Transistors Using Short-Term Stress and Electroluminescence59
Triple-Node FinFET With Non-Ohmic Schottky Junctions for Synaptic Devices59
A Novel Non-Volatile Optoelectronic Memory: The Photon-Triggered FGMOS58
Changes to the Editorial Board58
Au- and Ag-Containing Contacts to GaSb-Photovoltaic Converters56
Ultrathin Interfacial Layer and Pre-Gate Annealing to Suppress Virtual Gate Formation in GaN-Based Transistors: The Impact of Trapping and Fluorine Inclusion56
RFIC 2023 Call for Papers55
Self-Curable Synaptor With Tri-Node Charge- Trap FinFET for Semi-Supervised Learning55
Table of Contents54
EDS Meetings Calendar54
Blank Page53
Front Cover52
IEEE Electron Device Letters Information for Authors52
Table of Contents52
IEEE Electron Device Letters Information for Authors52
Exploration of the exciting world of multifunctional oxide-based electronic devices: from material to system-level applications50
On the Dynamic RON, Vertical Leakage and Capacitance Behavior in pGaN HEMTs With Heavily Carbon-Doped Buffers48
A Novel Insulated Gate Trigger Thyristor Integrated With Gate Transient Voltage Suppressor for Ultrahigh di/dt Pulse Switching48
Fabrication of Bilayer Stacked Antiferroelectric/ Ferroelectric HfxZr1-xO2 FeRAM and FeFET With Improved Leakage Current and Robust Reliability by Modifying Atomic Lay47
Influence of Annealing Temperature on ZrO2 Nanoparticles for Improved Photodetection47
EDS Meetings Calendar46
Beneficial Hydrogen Doping in Single Spinel Phase Crystallized IZTO Thin-Film Transistors45
GaN Optopairs With Asymmetric Spiral Patterns for High-Resolution 360° Angle Detection45
La In Situ Doping-Engineered HZO Capacitors Achieving High- k (~56.2) and Ferroelectricity (2Pr~43.4 μ C/cm2) at 1.5 MV/Cm With 1010 Cycles Endurance45
BEOL-Compatible Amorphous Oxide Semiconductor High-Voltage Transistors Achieving BFoM Beyond the GaAs Limit43
Asymmetric Interference Behavior in 3D NAND Cell and the Reverse Trend Induced by Undercut of Sacrificial Nitride Film43
Call for Papers for a Special Issue of IEEE Transactions on Electron Devices: Reliability of Advanced Nodes43
A Flexible Graphene-Based Fabric Ultrasound Source for Machine Learning Enhanced Information Encryption43
Organic-Inorganic Hybrid Integrated Optical Waveguide Gain Compensator Based on CsPbBr3 Perovskite Nanocrystals41
Guar Gum-WTe2 Nanohybrid-Based Biomemristor Synapse With Short- and Long-Term Plasticity41
Modeling of a Multi-Gigawatt Ka-Band Superradiant Source With a Slow Traveling Wave41
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