IEEE Transactions on Semiconductor Manufacturing

Papers
(The TQCC of IEEE Transactions on Semiconductor Manufacturing is 4. The table below lists those papers that are above that threshold based on CrossRef citation counts [max. 250 papers]. The publications cover those that have been published in the past four years, i.e., from 2022-06-01 to 2026-06-01.)
ArticleCitations
Guest Editorial Special Section on the 2022 SEMI Advanced Semiconductor Manufacturing Conference50
Call for Papers for a Special Issue of IEEE Transactions on Electron Devices on "Semiconductor Device Modeling for Circuit and System Design"45
IEEE Transactions on Semiconductor Manufacturing Publication Information40
Call for Nominations for Editor-in-Chief: IEEE Electron Device Letters35
Fabrication of Porous Cu–Sn Microbumps for Low-Temperature Cu–Cu Bonding30
Defect Reduction and Line Width Roughness Improvement by Using a Post Precoat Treatment in Waferless Chamber Conditioning25
Scalable Multi-Site Test Architecture for Chiplet-Based Systems on ATE Platforms25
Minimization of Particle Deposition on Wafers Caused by the Pressure Change in the Vacuum Chamber Through a Pressure Control Regulation Process22
Fast and High-Precision Temperature Control in Semiconductor Vertical Furnace via Iterative Experiments20
Investigations of Fast Vacuum Pump-Down Processes Between Parallel Isothermal Disks19
High-precision Acoustic Image Reconstruction for Uneven Surfaces using a YOLO-based Approach18
Adaptive Weight Tuning of EWMA Controller via Model-Free Deep Reinforcement Learning18
Call for Papers for IEEE Transactions on Materials for Electron Devices17
Call for Papers for a Special Issue of IEEE Transactions on Electron Devices on "Wide and Ultrawide Band Gap Semiconductor Devices for RF and Power Applications"17
Editorial16
Level Set Simulation on Single Wafer Wet Processing Improvement16
Single-Mask Fabrication of Sharp SiOx Nanocones15
The Mechanism of an Etching-Back to Reduce the Density of Cone Defect in STI During the Manufacturing15
Run-to-run control of chemical mechanical polishing head with adjustable partition pressure based on deep reinforcement learning15
Nondestructive Detection of Buried and Latent Defects by Negative Mode E-Beam Inspection14
Grain Morphology Effects on Void Formation and Electromigration-Induced Failure in Copper Interconnects14
A Yield Prediction Method Based on Nonparametric Statistical and Comparison With a Networks Method13
Hotspot Prediction: SEM Image Generation With Potential Lithography Hotspots13
Synthesis of Critical Patterns for Lithography Optimizations Through Machine Learning12
Computational Study of Chemical Uniformity Impacts on Electrodeposition12
Semi-Supervised Learning for Simultaneous Location Detection and Classification of Mixed-Type Defect Patterns in Wafer Bin Maps12
Advanced Process Control System for Trench Shape of Power Devices12
TCAD-Enabled Machine Learning—An Efficient Framework to Build Highly Accurate and Reliable Models for Semiconductor Technology Development and Fabrication12
Improving RF Magnetron Sputter Parameters for a Piezoelectric AlN Thin Film Deposition11
Blank Page11
IEEE Transactions on Semiconductor Manufacturing Publication Information11
Analyzing the Impact of Inclined Airflow Within the EFEM on the Lateral Flow Around the FOUP Using Flow Visualization Techniques11
Integration Challenges on 300-mm High Resistivity Silicon Substrates10
DPFEE-Net: Enhancing Wafer Defect Classification Through Dual-Path Neural Architecture10
Source Pad Design Tradeoffs for a Power TrenchFET10
Automatic Classification of C-SAM Voids for Root Cause Identification of Bonding Yield Degradation10
IEEE Transactions on Semiconductor Manufacturing Publication Information9
Physics-Informed Machine Learning-Based Edge Detection for SEM Images9
In-Situ Plasma Monitoring Using Multiple Plasma Information in SiO₂ Etch Process9
A Warpage Prediction Model for Trench Field-Plate Power MOSFET in 300mm-Diameter Process9
A Self-Powered Wireless Sensing Circuitry for On-Wafer In-Situ EUV Detection9
IEEE EDS Robert Bosch Micro and Nano Electro Mechanical Systems Award: Call for Nominations8
Systematic Search for Stabilizing Dopants in ZrO₂ and HfO₂ Using First-Principles Calculations8
Recognition and Classification of Mixed Defect Pattern Wafer Map Based on Multi-Path DCNN8
2023 Index IEEE Transactions on Semiconductor Manufacturing Vol. 368
IEEE Transactions on Semiconductor Manufacturing Publication Information8
Wafer Dicing Vibration Investigation on Novel Wafer Mounting Techniques8
Commonality Analysis for Detecting Failures Caused by Inspection Tools in Semiconductor Manufacturing Processes8
IEEE Transactions on Semiconductor Manufacturing Publication Information8
Journal of Lightwave Technology Special Issue on: OFS-298
Research Toward Wafer-Scale 3D Integration of InP Membrane Photonics With InP Electronics8
Streamlining Semiconductor Manufacturing of 200 mm and 300 mm Wafers: A Longitudinal Case Study on the Lot-to-Order-Matching Process8
Evaluation of Thick Silicon Nitride Film Properties at 300 mm Scale for High-Q Photonic Devices7
Nitrogen-Doped Czochralski Silicon Wafers as Materials for Conventional and Scaled Insulated Gate Bipolar Transistors7
Perspectives on Black Silicon in Semiconductor Manufacturing: Experimental Comparison of Plasma Etching, MACE, and Fs-Laser Etching7
Defect Detection of Photovoltaic Panels to Suppress Endogenous Shift Phenomenon7
RA-UNet: A New Deep Learning Segmentation Method for Semiconductor Wafer Defect Analysis on Fine-Grained Scanning Electron Microscope (SEM) Images7
Table of Contents7
Front Cover7
New Quality Index to Improve Overlay Measurement Accuracy Based on Moiré Marks: Method for Quantifying Moiré Pattern Quality Using the Signal Shape Index7
Characterizing Capacitor Top Plate Bias for More Accurate Electromagnetic Simulations7
Deep Clustering and Regression Ensemble Network for Lot Cycle Time Prediction in Semiconductor Wafer Fabrication7
Call for Papers for a Special Issue of IEEE Transactions on Electron Devices on "Wide and Ultrawide Band Gap Semiconductor Devices for RF and Power Applications"7
Table of Contents7
Editorial7
Advances in the Thermal Study of Polymers for Microelectronics Using the Thermally Induced Curvature Approach7
Data-Driven Production Planning Models for Wafer Fabs: An Exploratory Study7
Fabrication of On-Silicon Aperture Coupled Patch Antenna Through Micromachining and Cu-Cu Thermocompression Bonding6
Call for Nominations: 2024 EDS Early Career Award6
BCICTS 2023 Call for Papers6
Macro and Micro-Scale Non-Contact Imaging of Electrically Active Extended Defects in 4H-SiC Merged PiN Schottky Diode Devices6
IEEE Transactions on Semiconductor Manufacturing Publication Information6
Automatic Pico Laser Trimming System for Silicon MEMS Resonant Devices Based on Image Recognition6
Anomaly Detection in Batch Manufacturing Processes Using Localized Reconstruction Errors From 1-D Convolutional AutoEncoders6
Prevention of Moisture Invasion by Flow Isolation Device (FID) for Mask Automatic Storage System (Stocker Room) in a Semiconductor Fabrication Plant (Fab)6
Unsupervised Representation Learning and Explainable Clustering for Wafer Map Pattern Analysis6
Semantic Context Information Modeling With Neural Networks in Customer Order Behavior Classification6
IEEE Transactions on Semiconductor Manufacturing Publication Information6
Unrelated Parallel Machine Photolithography Scheduling Problem With Dual Resource Constraints6
Multiobjective Order Promising for Outsourcing Supply Network of IC Design Houses6
Suppressing Hexagonal Defects in Ex Situ Remote Plasma Dry Etch Processing6
Guest Editorial Special Section on the 2025 International Conference on Compound Semiconductor Manufacturing Technology (CS-MANTECH)5
Coherent Fourier Scatterometry for Detection of Killer Defects on Silicon Carbide Samples5
Quantitative 3-D Flow Visualization of Conventional Purge Flow Within a Front Opening Unified Pod (FOUP)5
Why Contour Averaging Works for SEM Metrology: Analysis and Validation5
Improving Endpoint Detection Sensitivity in Plasma Etching With Small Openings5
Editorial5
Surface Reconstruction for Enhancing the Overlay Modeling Optimization Procedure in Photolithography Processes5
Guest Editorial Introduction to the Joint Special Issue on Semiconductor Design for Manufacturing (DFM)5
IEEE Transactions on Semiconductor Manufacturing Information for Authors5
Current Status of Bulk β-Ga₂O₃ and β-(AlxGa₁-ₓ)₂O₃ Crystal Growth5
Defect Localization Approach for Wafer-to-Wafer Hybrid Bonding Interconnects5
DSH to Extend-DSH: Chip-Level Chemical Mechanical Planarization (CMP) Model Upgrade Based on Decoupling Regression Strategy5
A Boundary-Aware Surrogate Model for Predicting Feature-Scale TiN Etching Profiles5
Efficient and Refined Deep Convolutional Features Network for the Crack Segmentation of Solar Cell Electroluminescence Images5
Deep Learning-Based Multi-Horizon Forecasting for Automated Material Handling System Throughput in Semiconductor Fab5
Fast Global Sparse Principal Component Analysis for Sensor Reduction in Virtual Metrology5
Overlay Measurement Algorithm for Moiré Targets Using Frequency Analysis5
Table of Contents5
Integrated Electrochemical Technology for Efficient Metal Recovery in Semiconductor Wastewater5
Guest Editorial Special Section on Sustainability5
Chemical Mechanical Polishing of Single-Crystalline Diamond Epitaxial Layers for Electronics Applications5
Editorial4
Sustainable Technologies for Responsible Products and a More Sustainable Future4
A Transformer-Based Sequence Prediction Architecture for Etch Profile Evolution in Semiconductor Manufacturing4
Geometry-Based Curvilinear Mask Process Correction for Enhanced Pattern Fidelity, Contrast, and Manufacturability4
IEEE Transactions on Semiconductor Manufacturing Publication Information4
Development of SiGe Indentation Process Control for Gate-All-Around FET Technology Enablement4
IEEE Transactions on Semiconductor Manufacturing Information for Authors4
Blank Page4
A Diffusion-Model-Based Methodology for Virtual Silicon Data Generation4
TechRxiv: Share Your Preprint Research With the World!4
Table of Contents4
Performance Evaluation of Supervised Learning Model Based on Functional Data Analysis and Summary Statistics4
Understanding and Improving Virtual Metrology Systems Using Bayesian Methods4
Model-Based OPC With Adaptive PID Control Through Reinforcement Learning4
Multi-Scale Content-Aware Enhancement Dual-Branch CNN for LED-Chip Defect Classification4
Call for Papers for a Special Issue of IEEE Transactions on Electron Devices: Reliability of Advanced Nodes4
Density-Based Spatial Clustering of Applications With Noise (DBSCAN) for Probe Card Production for Advanced Quality Control of Wafer Probing Test4
Automating Root Cause Analysis in Semiconductor Manufacturing Using Transformer Models With Explainable AI4
0.98830604553223