IEEE Transactions on Semiconductor Manufacturing

Papers
(The TQCC of IEEE Transactions on Semiconductor Manufacturing is 3. The table below lists those papers that are above that threshold based on CrossRef citation counts [max. 250 papers]. The publications cover those that have been published in the past four years, i.e., from 2021-04-01 to 2025-04-01.)
ArticleCitations
Prevention of Moisture Invasion by Flow Isolation Device (FID) for Mask Automatic Storage System (Stocker Room) in a Semiconductor Fabrication Plant (Fab)46
Call for Papers for a Special Issue of IEEE Transactions on Materials for Electron Devices: "Exploration of the Exciting World of Multifunctional Oxide-Based Electronic Devices: From Material to Syste41
Fabrication of Porous Cu-Sn Microbumps for Low Temperature Cu-Cu Bonding39
Table of Contents33
IEEE Transactions on Semiconductor Manufacturing Information for Authors31
BCICTS 2023 Call for Papers28
Table of Contents28
IEEE Transactions on Semiconductor Manufacturing Publication Information27
Table of Contents24
Call for Papers for a Special Issue of IEEE Transactions on Electron Devices on "Semiconductor Device Modeling for Circuit and System Design"24
Blank Page23
Simulation and Experimental Analysis of Contactless Chip Pickup Process Based on a Vortex Flow Gripper22
Fully Automated Wafer-Level Edge Coupling Measurement System for Silicon Photonics Integrated Circuits21
IEEE Transactions on Semiconductor Manufacturing Information for Authors19
Call for Papers for RFIC 202319
IEEE Transactions on Semiconductor Manufacturing Publication Information19
IEEE Transactions on Semiconductor Manufacturing Information for Authors17
2021 EDS Education Award Call for Nominations16
IEEE Transactions on Semiconductor Manufacturing publication information16
Front Cover16
IEEE Transactions on Semiconductor Manufacturing Publication Information15
Self-Assured Deep Learning With Minimum Pre-Labeled Data for Wafer Pattern Classification13
Edge Effects of an Eddy-Current Thickness Sensor During Chemical Mechanical Polishing13
Significant Lifetime Improvement of Negative Bias Thermal Instability by Plasma Enhanced Atomic Layer Deposition SiN in Stress Memorization Technique12
A Lightweight Chip-Scale Chemical Mechanical Polishing Model Based on Polynomial Network12
A Study on the Improvement of Safety and Efficiency of Clean Rooms in Semiconductor Factories Through Real Fire Experiments12
Minimization of Particle Deposition on Wafers Caused by the Pressure Change in the Vacuum Chamber Through a Pressure Control Regulation Process12
Defect Reduction And Line Width Roughness Improvement By Using A Post Precoat Treatment In Waferless Chamber Conditioning12
3-D NAND Oxide/Nitride Tier Stack Thickness and Zonal Measurements With Infrared Metrology12
Improving the Reliability of Through Silicon Vias: Reducing Copper Protrusion by Artificial Defect Manipulation and Annealing12
Photoresist Spray Coating on Silicon Wafers With Acoustic Resonance Atomization11
Why Contour Averaging Works for SEM Metrology: Analysis and Validation11
Reducing Datacenter Compute Carbon Footprint by Harnessing the Power of Specialization: Principles, Metrics, Challenges and Opportunities10
Quantitative Comparison of Simulation and Experiment Enabling a Lithography Digital Twin10
Feature Extraction From Diffraction Images Using a Spatial Light Modulator in Scatterometry9
Quantitative 3-D Flow Visualization of Conventional Purge Flow Within a Front Opening Unified Pod (FOUP)9
Elimination of Si-C Defect on Wafer Surface in High-Temperature SPM Process Through Nitrogen Purge in 300-mm Single-Wafer Chamber9
Overlay Measurement Algorithm for Moiré Targets Using Frequency Analysis9
Boundless Engineering for Yield to Cope With the Complexity of High-Volume Manufacturing9
Chamber and Recipe-Independent FDC Indicator in High-Mix Semiconductor Manufacturing8
ℓ₁ Trend Filtering-Based Change Point Detection for Pumping Line Balance of Deposition Equipment8
A Novel Foundry Yield Model Using Critical Area Analysis8
Parametric Optimization for Moisture Infiltration Prevention Into a FOUP (Front Opening Unified Pod)8
Influence and Suppression of Harmful Effects Due to By-Product in CVD Reactor for 4H-SiC Epitaxy8
Adaptive Cautious Regularized Run-to-Run Controller for Lithography Process8
Dynamic Down-Selection of Measurement Markers for Optimized Robust Control of Overlay Errors in Photolithography Processes7
Double Coating Process Using the Single Photoresist and the Thickness Prediction7
Automatic Defect Detection in Epitaxial Layers by Micro Photoluminescence Imaging7
Preparation and Application of Sol-Gel Polishing Pad for Polishing CVD Single Crystal Diamond at High Speed7
Study on Measurement Method of Microscopic ζ Potential7
Shear Force Classification Before Wire Bonding Based on Probe Mark 2-D Images Using Machine Learning Methods7
A Modified Lasso Model for Yield Analysis Considering the Interaction Effect in a Multistage Manufacturing Line7
Planned Maintenance Schedule Update Method for Predictive Maintenance of Semiconductor Plasma Etcher7
A Numerical Study on the Effects of Purge and Air Curtain Flow Rates on Humidity Invasion Into a Front Opening Unified Pod (FOUP)6
Watermark Detection in CMOS Image Sensors Using Cosine-Convolutional Semantic Networks6
Investigations of Fast Vacuum Pump-Down Processes Between Parallel Isothermal Disks6
Modular Fluid Delivery System Architectures Drive Configurability Options, Enhance Semiconductor Manufacturing Equipment Productivity, and Improve Process Performance6
Multiobjective Order Promising for Outsourcing Supply Network of IC Design Houses6
Bayesian Nonparametric Classification for Incomplete Data With a High Missing Rate: an Application to Semiconductor Manufacturing Data6
Joint Dynamic Dispatching and Preventive Maintenance for Unrelated Parallel Machines With Equipment Health Considerations6
Machine Learning-Based Process-Level Fault Detection and Part-Level Fault Classification in Semiconductor Etch Equipment6
Adaptive Weight Tuning of EWMA Controller via Model-Free Deep Reinforcement Learning6
Wafer Lot Assignment for Parallel-Producing Tools Based on Heuristic Clustering Algorithm6
IEEE Transactions on Semiconductor Manufacturing Information for Authors5
Table of contents5
Observation and Suppression of Growth Pits Formed on 4H-SiC Epitaxial Films Grown Using Halide Chemical Vapor Deposition Process5
Guest Editorial Special Section on the 2022 SEMI Advanced Semiconductor Manufacturing Conference5
A Novel Multiscale Residual Aggregation Network-Based Image Super-Resolution Algorithm for Semiconductor Defect Inspection5
Front Cover5
IEEE Transactions on Semiconductor Manufacturing Information for Authors5
IEEE Transactions on Semiconductor Manufacturing publication information5
A Hybrid Method of Frequency and Spatial Domain Techniques for TFT-LCD Circuits Defect Detection5
Supply Chain Planning for IC Design House Back-End Production Network With Turnkey Service5
Integrated Electrochemical Technology for Efficient Metal Recovery in Semiconductor Wastewater5
Front Cover5
Table of Contents5
Call for Nominations for Editor-in-Chief: IEEE Transactions on Semiconductor Manufacturing5
Effect of SiO2 Interfacial Layer Reduction on MFSFET With 5 nm-Thick Ferroelectric Nondoped HfO2 by Deposition Rate Control5
Leveraging Machine Learning for Capacity and Cost on a Complex Toolset: A Case Study5
Defect Localization Approach for Wafer-to-Wafer Hybrid Bonding Interconnects5
Attention Mechanism-Based Root Cause Analysis for Semiconductor Yield Enhancement Considering the Order of Manufacturing Processes4
Table of Contents4
Fuzzy Selection Model for Quality-Based IC Packaging Process Outsourcers4
Call for Papers for a Special Issue of IEEE Transactions on Electron Devices on "Wide and Ultrawide Band Gap Semiconductor Devices for RF and Power Applications"4
Table of contents4
IEEE Transactions on Semiconductor Manufacturing Publication Information4
Nondestructive Detection of Buried and Latent Defects by Negative Mode E-Beam Inspection4
Modeling and Optimizing the Impact of Process and Equipment Parameters in Sputtering Deposition Systems Using a Gaussian Process Machine Learning Framework4
Quality-Oriented Statistical Process Control Utilizing Bayesian Modeling4
An Advanced Finite Element Model for BiCMOS Process Oriented Ultra-Thin Wafer Deformation4
Investigation of Variation in On-Si On-Wafer TRL Calibration in Sub-THz4
Call for Papers for a Special Issue of IEEE Transactions on Electron Devices on "Solid-State Image Sensors"4
The Effect of Si Surface Flattening Process on the MISFET With High-k HfNx Multilayer Gate Dielectrics4
Improving Liquid Film Thickness Uniformity of Semiconductor Etching Equipment Using Flow Field Visualization and CFD Simulation4
A Hierarchical Spatial-Test Attention Network for Explainable Multiple Wafer Bin Maps Classification4
Editorial4
A Comparative Study on Velocity Fields, Humidity and Oxygen Concentration in a Front Opening Unified Pod (FOUP) During Purge4
Call for Papers for IEEE Transactions on Materials for Electron Devices4
CMP Process Optimization Engineering by Machine Learning4
Interface Characteristics, Erosion Behavior, and Thermal Shock Resistance of Al–Ta Alloy Coatings Produced by Arc Spraying3
The Effect of Purge Flow Rate and Wafer Arrangement on Humidity Invasion Into a Loaded Front Opening Unified Pod (FOUP)3
Semi-Supervised Learning for Simultaneous Location Detection and Classification of Mixed-Type Defect Patterns in Wafer Bin Maps3
Editorial3
Virtual Metrology Modeling for Wafer Edges via Graph Attention Networks3
A Yield Prediction Method Based on Nonparametric Statistical and Comparison With a Networks Method3
Effective Variational-Autoencoder-Based Generative Models for Highly Imbalanced Fault Detection Data in Semiconductor Manufacturing3
Level Set Simulation on Single Wafer Wet Processing Improvement3
Advanced Process Control System for Trench Shape of Power Devices3
Automated Visual Inspection of Defects in Transparent Display Layers Using Light-Field 3-D Imaging3
Gas-Delivery Fluid-Mechanical Timescales in Semiconductor Manufacturing3
Improved Color Defect Detection With Machine Learning for After Develop Inspections in Lithography3
Editorial3
Image-Based Defect Classification for TFT-LCD Array via Convolutional Neural Network3
TCAD-Enabled Machine Learning—An Efficient Framework to Build Highly Accurate and Reliable Models for Semiconductor Technology Development and Fabrication3
Thermal and Electrical Analysis of the Electrostatic Chuck for the Etch Equipment3
Deep Learning-Based Multi-Horizon Forecasting for Automated Material Handling System Throughput in Semiconductor Fab3
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