Journal of Photopolymer Science and Technology

Papers
(The median citation count of Journal of Photopolymer Science and Technology is 0. The table below lists those papers that are above that threshold based on CrossRef citation counts [max. 250 papers]. The publications cover those that have been published in the past four years, i.e., from 2021-04-01 to 2025-04-01.)
ArticleCitations
Synthesis of Ordered Fluorinated BCPs with One Block Composed of Random Copolymer10
Self-assembly of Amphiphilic Peptide in Phospholipid Membrane9
Surface Nanopatterning of Bioabsorbable Materials Using Thermal Imprinting Technology8
Stabilization of Spontaneous Orientation Polarization by Preventing Charge Injection from Electrodes8
Development of Low-Residual-Stress Photosensitive Adhesive Materials for Wafer-Scale Microfluidic Device Fabrication8
Erratum to “Synthesis, Properties, and Photovoltaic Characteristics of Arch- and S-shaped Naphthobisthiadiazole-based Acceptors”[J. Photopolym. Sci. Technol. 34 (2021) 285-290]7
Spatial Distribution Analysis of Functional Groups in Resist Thin Film Using Reflection-Mode Resonant Soft X-ray Scattering6
Computational Lithography for 3-Dimensional Fine Photolithography using Sophisticated Built-in Lens Mask5
Microstructure Formation on Poly (Methyl Methacrylate) Film Using Atmospheric Pressure Low-Temperature Plasma5
Temporal Variations of Optical Emission Spectra in Microwave-Excited Plasma in Saturated Water Vapor under Reduced Pressure during Photoresist Removal5
Synthesis of Highly Ordered Si-Containing Fluorinated Block Copolymers5
Hybrid Soft Replica Molds for Residual Layer-Free Patterning5
Heat Treatment for a Membrane Composed of Polymer Nanofibers and a Perfluorosulfonic-Acid Polymer Matrix: Effect on Proton-Exchange-Membrane Properties4
Designed, Flexible Electrochromic Display Device with Fe(II)-Based Metallo-Supramolecular Polymer Using Mechanically Etched ITO Film4
Synthesis and Characterization of High Refractive Index Polythiocyanurates4
The Photopolymer Science and Technology Award4
Research on a New Lithography Method Utilizing Laser Speckles for Printing Random Patterns4
Fabrication of a Rose-Petal-Inspired Micro/Nanostructured Surface via the Ultraviolet Nanoimprint Lithography and Roll-Press Methods4
Characterization of Shape of Polymer Nano-Films Possessing Various Crosslinking Chain Length4
Synthesis of a Dipyridyl Disulfide Cross-linking Reagent and Its Application to Photo-adhesion of Dissimilar Materials4
Influence of Thermo-Light Curing on the Microhardness and Fluoride Release of Glass-Ionomer Cements4
Polyimide-based Release Material for Rapid and Precise Mass Transfer of Semiconductor Chips4
Multi-Trigger Resist for EUV lithography4
Proposal of hybrid deep learning systems for process and material design in thermal nanoimprint lithography4
Grazing-Incidence Soft-X-ray Scattering for the Chemical Structure Size Distribution Analysis in EUV Resist4
Development of High Accurate Multi-Step Deep X-ray Exposure System Using Two-axial PZT Actuators4
Novel Thermobase Generator for Low Temperature Imidization of Polyamic Acid4
Flexible and Semi-Transparent Antenna for ISM Band Fabricated by Direct Laser Writing3
Effect of 2-propanol Immersing on Organohalide Perovskite Layer in Perovskite Solar Cells Fabricated by Two-step Method3
Flexible in-plane Micro-Supercapacitor Prepared by Laser Annealing and Ablation of a Graphene/Polyamide Acid Composite3
Synthesis and Properties of Polyguanamines Containing <i>N</i>-Phenylmelamine Units3
Water-Repellency Model of the Water Strider, <i>Aquarius paludum paludum</i>, by the Curved Structure of Leg Micro-Hairs3
Magnetic-Pneumatic Hybrid Soft Actuator3
Synthesis of Radiation Curable Trimethylolpropane Epoxy Acrylate3
Visible-Light Sensitive Reworkable Resins for Dental Application: Improved Stability3
High Speed Ashing of Ion Implanted Photoresist by Microwave Excited Water Vapor Plasma with Powered Substrate3
Effect of UV-Light Irradiation on Charge-Accumulation States in PTzBT Polymer Solar Cells3
Fabrication of Freestanding Double-sided Through-hole Electrode Films using Imprint Technique3
Developing a Laparoscope Lens with Super Water-Repellent Antifouling Function using Biomimetic Materials3
Reliability Study for Photosensitive RDL Material3
Novel Effective Photoinitiators for the Production of Dental Fillings3
Glass Microchannel Formation by Mycelium3
Formation and Stability of Cs<sub>2</sub>SnBr<sub>6</sub> Perovskite Nanocrystals from CsSn<sub>2</sub>Br<sub>5</sub> Nanocubes3
Affinity Analysis of Photoacid Generator in the Thin Film of Chemical Amplification Resist by Contact Angle Measurement3
Evaluation of Electron Blur for Different Electron Energies3
High Resolution and Low Stress Photo-Definable Polyimide3
Dependence of Dissolution Kinetics of Main-Chain Scission Type Resists on Molecular Weight3
Development of Bile Direct Stent Having Antifouling Properties by Atmospheric Pressure Low-Temperature Plasma2
Behavior of Secondary Electrons: Estimation of the Ionization Yield in Poly(hydroxystyrene) under EUV Irradiation Based on Binary Encounter Theory and Continuous Slowing-Down Spectrum2
Application of Self-aligned Quadruple Patterning to Fabrication of Nanoimprint Mold with Sub-12-nm Half-pitch2
The Impact of (Poly)glycerol in Developer on the Dissolution and Sensitivity of Positive-tone Photosensitive Polyimides2
The Development of Bile Duct Stent Having Antifouling Properties by Using Atmosphere Pressure Cold Plasma (2)2
Fabrication of Moth-eye Antireflective Nanostructures via Oxygen Ion-beam Etching on a UV-curable Polymer2
Synthesis of Photo-degradable Polyphthalaldehyde Macromonomer and Adhesive Property Changes of its Copolymer with Butyl Acrylate on UV-irradiation2
Nodule Deformation on Cleaning of PVA Roller Brushes and its Relation to Cross-contamination2
Development of Non-Fullerene Acceptors with π-Extended Central Unit for Organic Photovoltaic Devices2
Chemical Mechanisms of Metal-Based Extreme Ultraviolet Resists2
Evaluation of Basic Behavior of Acrylic Polymer Changing Composition by KrF, ArF and EUV Exposure2
Surface Hardness of UV-Solidified Coatings Containing In-situ Synthesized, Self-dispersed Nano-gel Domains as a Function of Surface Roughness and Viscoelastic Characteristics2
Positive-Tone Organoantimony Resists2
Speculation of Mechanical Properties of Ni-W Micro-gears Fabricated by LIGA Process2
Investigation of Pressure Dependence in Photoresist Ashing Process using Microwave Excited Water Vapor Plasma2
Effect of pH on Decomposition of Organic Compounds Using Ozone Microbubble Water2
Fabrication of SiO:CH Particle-agglomerated Films by PECVD with Vinyl-group Organosilicon Reactants2
Molecular Assemblies of Minor Trigonal Molecules Regulated with the Help of Major Light-sensitive Components2
Fabrication of Moth-eye-structured Films with Two Types of Resin Separated by Micro-order Regions2
Spin-on Metal Oxide Hard Mask as Underlayer for EUV Lithography with Chemically Amplified Resist2
Relationship between Tg of Polyimide Resin and Resist Sensitivity in Three-Component Chemically Amplified Polyimide Resist2
Printing of Random Patterns on Stepped Surfaces Using Speckle Lithography2
Control of Radical Polymerization and Cationic Polymerization in Photocurable Resin for 3D Printers2
Switching the Solubility of Polymers using Intermolecular Reactions and Diffusion of Small Molecules2
Synthesis, Properties, and Photovoltaic Characteristics of Arch- and S-shaped Naphthobisthiadiazole-based Acceptors2
Synthesis of High Refractive Linear to Branched Polyguanamines from 2-Amino-4,6-dichloro-1,3,5-triazine with Aromatic Diamines1
Removal of Novolac Photoresist with Various Concentrations of Photo-active Compound Using H<sub>2</sub>/O<sub>2</sub> Mixtures Activated on a Tungsten Hot-wire Catalyst1
Emission Properties of Hybrid Films of Benzylideneaniline-based Amorphous Molecular Materials with Organic Acids1
Improvement of Resist Characteristics by Synthesis of a Novel Dissolution Inhibitor for Chemically Amplified Three-Component Novolac Resist1
Improved Uniformity of Photoresist Ashing for a Half-Inch Wafer with Double U-shaped Antenna Structure in a Microwave-Excited Water Vapor Plasma1
Development of Positive Tone-Type Photosensitive Materials Based on A Phenolic Resin with A Low Coefficient of Thermal Expansion1
Evolution of Secondary Electrons Emission During EUV Exposure in Photoresists1
EUV Metal Oxide Resist Development Technology for Improved Sensitivity, Roughness and Pattern Collapse Margin for High Volume Manufacturing1
Synthesis of Pyrene-Substituted Azobenzene Derivatives and Their Assembly into Flat Structures for Stimuli-Induced Switching1
Networked Polyphthalaldehydes Linked with Oxime Ether and Urethane Units and Their Photo-induced Depolymerization1
Spatial Distribution Imaging of Resist Thin Film with Micrometer Resolution using Reflection Type Soft X-ray Projection Microscope1
Top Thermal Annealing of 2D/3D Lead Halide Perovskites: Anisotropic Photoconductivity and Vertical Gradient of Dimensionality1
Synthesis and Optical Properties of Completely Etherified Hydroxypropyl Cellulose Derivatives1
A Study On Ant Colony Optimization1
Development of Dimethylaminotolane-Incorporated Poly(<i>N</i>-Isopropylacrylamide) Gel Exhibiting External Stimuli Responsive Fluorescence1
The Synthesis of the High Resolution i Line Novolak Resist1
Synthesis and Electrophoretic Deposition of Polyimide with Methacrylic Groups on the Side Chain1
Biomimetic Diamond-like Carbon Coating on a Lumen of Small-diameter Long-sized Tube Modified Surface Uniformly with Carboxyl Group using Oxygen Plasma1
Resist Characteristic of Chemically Amplified Three-Component Novolac Resist Containing a Dissolution Inhibitor with Different Protection Ratio1
Photoactive Compounds Effects on Removal Rate for Polystyrene-type Polymers by H<sub>2</sub>/O<sub>2</sub> Mixture Activated by Hot Tungsten Wire1
Photoresist for Water-developable Photolithography Process Using Plant-derived Hemicellulose1
Synthesis of Amino Acid-derived Curing Reagents Containing a Disulfide Bond and Their Application to Anionic UV Curing Materials1
Electron Generation in Tin-oxo Cage Extreme Ultraviolet Photoresists1
Theory of Photodecomposable Base in Chemically Amplified Resist1
The Measurement of the Refractive Index <i>n</i> and <i>k</i> Value of the EUV Resist by EUV Reflectivity Measurement Method1
Progress in EUV Photoresists for High-Resolution Patterning1
Ultraviolet-curable Material with High Fluorine Content for Biomimetic Functional Structures Achieved by Nanoimprint Lithography with Gas-permeable Template for Life Science and Electronic Application1
Insight into Charge Carrier Recombination Mechanisms in Lead Based Mixed Cation and Halide Perovskite1
Investigations of Matrix-Exposure Lithography Using Stacked Linear Arrays of Squared Optical Fibers1
Photo-reactivity of 2,4,6-Tris(benzylthio)-1,3,5-triazines and Accompanying Refractive Index Change1
Molecular Dynamics Simulation of the Resist Filling Process in UV-nanoimprint Lithography1
Synthesis and Structure-Activity Relationship of <i>N</i>-Substituted Carbazole Oxime Ester Photoinitiators1
Substitution Effect on Self-Assembly and the Resulting Fluorescence Efficiency of Triangular Azo Chromophores1
Printing of Random Needle-like Resist Patterns Utilizing Laser Speckle Lithography1
Surface Functionalization of Diamond-like Carbon Film with Biocompatible Polymer Brushes1
Micro Stirrer with Heater Mounted on SAW Actuator for High-speed Chemical Reaction1
Meeting Challenges of Advanced Packaging Designs with a Preimidized Polymer as Dielectric Material1
Designing Er<sup>3+</sup>/Ho<sup>3+</sup>-Doped Near-Infrared (NIR-II) Fluorescent Ceramic Particles for Avoiding Optical Absorption by Water1
Novel Low <i>D<sub>f</sub></i> Photosensitive Materials for Redistribution Layer1
Oriented Nanowire Arrays with Phthalocyanine – C<sub>60</sub> Multi-Heterojunctions1
Present Status of EUV Interference Lithography at NewSUBARU1
Low Transmission Loss Cu Wirings with Smooth Seed Layer and High Adhesion against Prepregs1
Influence of Glycerol in Developer on Novolak-Type Positive-Tone Resist Solubility1
Stochastic Simulation Study of Pattern Formation in EUV resists with Photo-Decomposable Quenchers1
Novel Temporary Bonding/Debonding System Enabling Advanced Packaging Process1
Comparison of Photoresist Sensitivity between KrF, EB and EUV Exposure1
Clarification of Degradation of Aromatic Compounds by Oxygen Microbubbles Water1
Preparation of poly(methyl methacrylate) photochromic microcapsules containing spiro-pyran by solvent volatilization1
Birefringent Control of Photo-Oriented Polymeric Films by <i>in situ</i> Exchange of Functional Moieties1
Analyses of Charge Accumulation of PTzBT Ternary Polymer Solar Cells Using ESR Spectroscopy1
Synthesis of Highly Ordered Fluorinated Copolymers with One Polyhydroxystyrene Block for Subsequent Metal Incorporation1
Improved Hole-Transporting Properties in Conjugated Polymers Mixed with Polystyrene as an Insulating Polymer1
Projection Exposure Technology Using a Cone Mirror for Printing Patterns in a Lump on Inner Surfaces of Cylindrical Pipes1
Influence of Counteranions on the Performance of Tin-based EUV Photoresists1
Preparation of Rigid Polyimides from Various Dianhydrides and 4,4’’’-Diaminoquaterphenyl and Comparison with Properties of Polyimides from 3,3’’’,4,4’’’-<i>p</i>-Quaterphenyltetracarboxyli1
Process and Sensitivity Optimisation of the Multi-Trigger Resist1
Soft Motion of Dielectric Driven Balloon Actuator1
Retraction: Synthesis of Monomers Having a 2-Hydroxypyridyl Group and Their Application to Photo-adhesive Materials1
Evaluating the Anti-biofilm Performance of Si and Resin Based Nanopillars1
Properties of Imidazolinium-containing Multiblock Amphiphile in Lipid Bilayer Membranes0
Metal Purifiers Specific to Lithography Related Chemicals0
Direct Observation of Gastropod's Locomotion for Soft Robot Application0
Study on Irradiation Effects by Femtosecond-pulsed Extreme Ultraviolet in Resist Materials0
Colloidal Crystal Films Consisting of Silica Particles Surface-modified with Polyacrylates Containing Branched Alkyl Chains0
Nanoimprint Lithography for Collagen Micropatterning at Low-Temperature 5℃ with TiO<sub>2</sub>-SiO<sub>2</sub> Gas-Permeable Porous Mold0
Green-Solvent Processed Green-Light Wavelength-Selective Organic Solar Cells Towards Agrivoltaics0
Naphthoic Acid Derivatives as Photosensitizers for Short-wavelength α-Hydroxyacetophenone Photoinitiators0
Impact of Water Treatment Reactor using TiO<sub>2</sub>-coated Micropillar Made by UV-NIL0
Fundamental Evaluation of Resist on EUV Lithography at NewSUBARU Synchrotron Light Facility0
Negative Photo-Definable Polyimide Dry Films for Fine and High Aspect Ratio Patterning0
The Removal of Acid Violet 7 from Aqueous Solutions by Photocatalytic-Poly(Ethylene Glycol Dimethacrylate-<i>co</i>-4-Vinylpyridine)-Titanium Dioxide Nanocomposite Beads: Kinetic, Isotherm0
Nanoimprint with CO<sub>2</sub> Ambient0
Polymeric Antibacterial Surfaces with Nano-pillar Arrays Mimicking Cicada Wings0
Surface Modification of Fluoropolymers by Atomic Hydrogen0
Polymer-Based Near-Infrared Afterglow Fluorescent Complex of Dye and Rare-Earth-Doped Ceramics0
Effect of Alternative Developer Solutions on EUVL Patterning0
Dispersion Stability of Organic Nanoparticles Prepared by Pulsed Laser Induced Fragmentation in Protein Solution0
Degradation of Modified Polystyrenes Having Degradable Units by Near Infrared Light Irradiation in The Presence of A Photon Upconversion Nanoparticle and A Photoacid Generator0
Feature-size Control by Pattern Transfer Etching in Nanoimprint Lithography for Half-pitch 24 nm Damascene Interconnect0
Hybrid Bonding Technology Utilizing Molding Compound and Photo Imageable Dielectric Systems0
Composite Membrane of Bi<sub>2</sub>WO<sub>6</sub>-NCQDs Laminated Hetero-junction Loaded on PES Support for Photo-catalytic Degradation of Organic Pollutants0
Design of High-sensitive Resist Materials Based on Polyacetals0
Manipulation of Polymer Solubility: Crosslinking, Thermal Activation and Variable-Temperature Bakes0
Etching Mechanism of Si-rich SiO<sub>x</sub> Film by Atomic Hydrogen Annealing0
Effect of Modified Chemical Junction of a Diblock Copolymer on the Microphase Separation Behavior0
Immobilization of CYP1A2 and CYP Reductase onto Self-assembled Phospholipid Layer and Evaluation of their Activity0
Investigation of Control of Water Contact Angle by Composition Control of SiCO<sub>x</sub>H<sub>y</sub> Film Formed on Si Substrate0
Spatial Distribution Analysis of Polymers in Resist Thin Film by Reflection-mode Resonant Soft X-ray Scattering0
Biocompatibility of Different Universal Adhesives During Short and Long Periods on Rat Model0
Effect on Suppression of Biofilm Growth using Microstructures Inspired by Living Organism0
Photo-thermal Dual Cured Blends of TiO<sub>2</sub>/diarylfluorene Films with High Refractive Indices0
Optical Oxygen Measurement using Microneedle of Bioabsorable Polymer0
A Novel Process to Reduce Roughness in Chemically Amplified Resist (CAR) for Next-Generation Lithography0
Experimental Evaluation and Modeling of Adsorption Phenomena of Nanoliposomes on Poly(dimethylsiloxane) Surfaces0
The Photopolymer Science and Technology Award0
Functional Group Influence on Block Copolymer Segment Interactions: An Analysis via Flory–Huggins and Hansen Solubility Parameters0
Self-assembly of Crosslinked Polyimides Templated by Block Copolymers for Fabrication of Porous Films0
Resist Removal Using Laser Irradiation Combined with Ozone Water Treatment0
Observation Result of Chemical Composition Distribution of Resist Thin Film by Photoemission Electron Microscopy0
Electrical and Optical Model of Reverse Mode Liquid Crystal Cells with Low Driving Voltage0
The Photopolymer Science and Technology Award0
Filling Behavior Observation of UV-curable Resin Using Bridge-Structure Mold0
Characterization of Surface Variation of Chemically Amplified Photoresist to Evaluate Extreme Ultraviolet Lithography Stochastics Effects0
EUV Photochemistry of α-Substituted Antimony Carboxylate Complexes0
Synthesis and characteristics of maleic anhydride-based photopolymers with pendant POSS groups for negative tone photoresists0
Development of A Low <i>k</i> Thermosetting Resin Based on 5,5’6,6’-Tetrahydroxy-3,3,3’,3’-Tetramethylspirobisindane with Decafluorobiphenyl Having Ethynyl Terminals0
Transfer Durability of Re-release Coated Replica Mold on Ultraviolet Nanoimprint Lithography0
Going Beyond the Ohnishi Parameter: Correlating Dissociation Energies to Polymer Etch Rates0
Recent Status of the Stochastic Issues of Photoresist Materials in EUV Lithography0
Adhesion Improvement Mechanism of Polytetrafluoroethylene by Heat-assisted Atmospheric Pressure Glow Plasma Treatment0
Synthesis and Resist Sensitive Property of Iodine-Containing Materials using Extreme Ultraviolet (EUV) Exposure Tool0
Photoluminescence Properties of Copolyimides Containing Naphthalene Core and Analysis of Excitation Energy Transfer between the Dianhydride Moieties0
Soft Actuator with DN-gel Dispersed with Magnetic Particles0
Preparation and Applications of a Polysilane-allyl Methacrylate Copolymer0
Development of Bile Duct Stent with Antifouling Property Using Atmospheric Pressure and Low Temperature Plasma0
Evaluation of Color Stability of Experimental Dental Composite Resins Prepared from Bis-EFMA, A Novel Monomer System0
Photo-degradation of Di- and Trifunctional Oxime Ethers Bearing Polyphthalaldehyde Arms0
Synthesis and Higher-order Structural Characterization of Polyimides Containing Chain-length-controlled Polysiloxanes0
Ultrasound-Assisted Degradation of Poly(<i>p</i>-<i>tert</i>-butoxycarbonyloxystyrene) using TiO<sub>2</sub> and Photoacid Generators0
Photoresist Design to Address Stochastics Issues in EUV Resists0
Siloxane Oligomer with Random Structure for Use in Photosensitive White Decorative Coatings0
Molecular Dynamics Study of Dependence of Loading Pressure on Shear Properties of Organic Nanofilms0
Current Status of EUV Flood Exposure Tool at NewSUBARU BL030
Thermal, Optical, and Dielectric Properties of Bio-based Polyimides Derived from an Isosorbide-containing Dianhydride and Diamines with Long Alkyl Chains0
Characterization of Hydrogel Films with Reflective Colors Templated by Colloidal Crystals0
Using Machine Learning to Predict the Durability of a Mold for Producing Nanostructures in Ultraviolet Nanoimprint Lithography0
Photoreaction of Polysilyne and Methyl Methacrylate0
Development of Photo-curable Resin for 3D Printing Using Acrylic Monomers with Bisphenol Skeleton0
Amylopectin-based Eco-friendly Photoresist Material in Water-developable Lithography Processes for Surface Micropatterns on Polymer Substrates0
Effect of Acrylic and Epoxy Hybrid Crosslinker on the Mechanical Strength of Photocurable Resin for 3D Printing0
Advanced Development Techniques for Extreme-Tight Pitch Patterning0
Synthesis of Thermosetting Polycarbonate with Ethynyl Terminals0
Expanding the Formation Region of Double Gyroid Structures from ABC Triblock Terpolymers by Solution Casting0
Micropatterning Performance and Physical Characteristics of Water-soluble High Molecular Weight Polysaccharide Photoresist Materials0
Miniaturization of Scattered Random Patterns Formed by Lens·less Speckle Lithography0
Photo-induced Decrosslinking of Oxime-ester Based Covalent Adaptable Networks in Film State0
Synthesis of ABC/ACB-Type Triblock Copolymers Composed of Polystyrene and Polymethacrylate via Living Anionic Polymerization and Analyzing the Effect of Casting Solvents on Higher-Order Structures0
Ultra-hydrophilic Diamond-like Carbon Coating on an Inner Surface of a Small-diameter Long Tube with an Amino Group by AC High-voltage Plasma Discharge0
Physical and Chemical Drying of Coatings with NIR Absorbers to Replace Oven Technologies0
Orientation Control of the Microphase-separated Nanostructures of Block Copolymers on Polyimide Substrates0
Polymerizable Olefins Groups in Antimony EUV Photoresists0
Wafer Edge Protection Layer: A Solution for Metal Contamination Issue in Advanced Patterning Process0
Effects of Solvents on the Preparation of PLLA/PEDOT:PSS Conductive Polymer Alloy Films0
A 3D-Simulation and Experimental Study of the Fluid Flow Around a Nano-Step Structure Formed by UV-NIL0
Resist Thickness Dependence of Latent Images in Chemically Amplified Resists Used for Electron Beam Lithography0
Synthesis of Methacryl Monomer Having a 6-Chloropyridyl Group and Their Application to Photo-adhesive Material0
Enhanced Adhesion and Resolution of Negative Photoresists on Copper Substrates with Polyglycerin-Based Methacrylate0
Formation of Double Roughness Structure on PVDF/PMMA Blended Film Using Atmospheric Pressure Low-Temperature Plasma0
Relationship between Defect Risks and Effective Reaction Radius for Deprotection in Chemically Amplified Resist Process for Extreme Ultraviolet Lithography0
Biomimetic Wave Propagation in Magnetic Soft Actuator0
Measurement of Liquid Film Thickness Distribution Formed on a Two-fluid Jet Sprayed Surface Using a Fiber Optic Probe0
Effect of Sugar Chain Binding Mode on Water-soluble Micropatterning Performance and Physical Characteristics0
Finite Element Analysis of Advanced Imprint Process to Multilayered Material0
Droplet-Dispensed Ultraviolet Nanoimprint Lithography in Mixed Condensable Gas of Trans-1,3,3,3-Tetrafluoropropene and Trans-1-Chloro-3,3,3-Trifluoropropene0
Nanoimprint Lithography and Microinjection Molding Using Gas-Permeable Hybrid Mold for Antibacterial Nanostructures0
Unimolecular Benzodioxole-based Photoinitiators for Free Radical and Cationic Photopolymerization Under LED Light Irradiation0
Novel EUV Underlayer Design for Metal Oxide Resist Patterning0
Recent Trend of Advanced LSI Packaging: Introduction for application of polymers0
Fundamental Evaluation of KrF Resist Changing Formulation by EB and EUV Exposure0
Aggregation of Au Colloids using Surface Acoustic Waves0
Preparation of Polyimide-TiO<sub>2</sub> Hybrid Films by Synthesis of Polyamic Acid Having Carboxylic Acid Group Sidechains in the Presence of TiO<sub>2</sub>0
Thermal Conversion of Polyamic Acid Gel to Polyimide Solution Having Amino Group Sidechains0
Developing an Endoscope Lens with Anti-Fogging and Anti-Fouling Properties using Nanoparticle Materials0
Retraction of “Synthesis of Monomers Having a 2-Hydroxypyridyl Group and Their Application to Photo-adhesive Materials” [<i>J. Photopolym. Sci. Technol.</i>, <b>36</b> (2023) 20
Effects of Solvent Polarity and Molecular Assembly on Photoisomerization of <i>p</i>-Hydroxyazobenzene Derivative0
Friction Dynamics of Commercial Artificial Hair0
Environmental Dependence of Chemiluminescence Using Solvatochromic Molecules0
Synthesis of Highly Luminescent CsPbCl<sub>3</sub> Perovskite Nanocrystals with Oleylammonium Chloride as an Alternative Halide Source0
The Design and Synthesis of New NIR-Active Sensitizers for Use in Photochemical Processes and Controlled Polymerizations0
Functionalization of Poly-L-Lactic Acid Microneedle Tips using Hydrogel Photopolymerization0
High-Refractive-Index Photosensitive Siloxane Coatings for Optical Fingerprint Sensor0
Molecular Dynamics Simulation of Pattern Formation for Negative-Type Resists in Electron Beam Lithography0
Novel Photoinitiator System for Simultaneous Physical drying and Free Radical Polymerization of Water-Borne Dispersions with Near-Infrared Excitation0
Durability Test of Replica Mold in UV Nanoimprinting and Enlargement of Mold Patterned Area by Mold Stitching0
Bright Outlook for High-tech Industry0
Non-chemically Amplified Negative Molecular Resist Materials using Polarity Change by EUV Exposure0
Suspensions of Polymer Hydrogel Microparticles with Highly Sensitive Detectability of Glucose0
Randomness of Polymer Microstructure in the Resist Film as Shot Noise0
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