Journal of Photopolymer Science and Technology

Papers
(The TQCC of Journal of Photopolymer Science and Technology is 1. The table below lists those papers that are above that threshold based on CrossRef citation counts [max. 250 papers]. The publications cover those that have been published in the past four years, i.e., from 2021-11-01 to 2025-11-01.)
ArticleCitations
Positive-Tone Organoantimony Resists10
Synthesis of a Dipyridyl Disulfide Cross-linking Reagent and Its Application to Photo-adhesion of Dissimilar Materials9
Synthesis and Properties of Polyguanamines Containing <i>N</i>-Phenylmelamine Units9
Reliability Study for Photosensitive RDL Material9
Preparation of Rigid Polyimides from Various Dianhydrides and 4,4’’’-Diaminoquaterphenyl and Comparison with Properties of Polyimides from 3,3’’’,4,4’’’-<i>p</i>-Quaterphenyltetracarboxyli7
Comparison of Photoresist Sensitivity between KrF, EB and EUV Exposure7
Chemical Mechanisms of Metal-Based Extreme Ultraviolet Resists7
Photocured Blended Films of Diarylfluorene having Naphthalene Moieties and TiO<sub>2</sub> with High Refractive Indices6
The Photopolymer Science and Technology Award5
Polymeric Antibacterial Surfaces with Nano-pillar Arrays Mimicking Cicada Wings5
Nanoimprint Lithography for Collagen Micropatterning at Low-Temperature 5℃ with TiO<sub>2</sub>-SiO<sub>2</sub> Gas-Permeable Porous Mold5
Theory of Photodecomposable Base in Chemically Amplified Resist5
Magnetically-Actuated Dynamic Culture System for Investigating Mechanical Effects on Biological Growth5
Resist Removal Using Laser Irradiation Combined with Ozone Water Treatment5
Evaluation of Surface-Enhanced Raman Scattering Substrate Consisting of Gold Nanoparticles Grown on Nanoarrays of Boehmite Fabricated using Magnetron Sputtering Process4
Development of Selenonium PAGs in EUV Lithography toward High Sensitivity Achievement4
Low Temperature Curable Low Dk & Df Polyimide for Redistribution Layer4
Functional Group Influence on Block Copolymer Segment Interactions: An Analysis via Flory–Huggins and Hansen Solubility Parameters4
Agitation inside the Liquid Film on Two-Fluid Jet Sprayed Surface4
Characterization of Photoacid Generator Bound Resist with X-ray Absorption Spectroscopy at NewSUBARU4
Synthesis of Highly Luminescent CsPbCl<sub>3</sub> Perovskite Nanocrystals with Oleylammonium Chloride as an Alternative Halide Source3
Breaking Boundaries of Photoinitiators: New Ways to Improve the Reactivity of Radical Polymerization3
Optical Oxygen Measurement using Microneedle of Bioabsorable Polymer3
The Photopolymer Science and Technology Award3
The Effect of Side-Chain Modification via Hydrogen Bonding on the Microphase-Separated Structure of PS-<i>b</i>-P4VP-<i>b</i>-PMMA3
Ultra-hydrophilic Diamond-like Carbon Coating on an Inner Surface of a Small-diameter Long Tube with an Amino Group by AC High-voltage Plasma Discharge3
Synthesis and Photocuring Properties of One-component Polymerizable Thioxanthone-based Photoinitiators with High Migration Stability3
Raman Spectral Data–Driven Analysis of Diamond-like Carbon Films Deposited Using the Radio-frequency Plasma-enhanced Chemical Vapor Deposition Method3
Droplet-Dispensed Ultraviolet Nanoimprint Lithography in Mixed Condensable Gas of Trans-1,3,3,3-Tetrafluoropropene and Trans-1-Chloro-3,3,3-Trifluoropropene3
Synthesis of ABC/ACB-Type Triblock Copolymers Composed of Polystyrene and Polymethacrylate via Living Anionic Polymerization and Analyzing the Effect of Casting Solvents on Higher-Order Structures3
A Novel Process to Reduce Roughness in Chemically Amplified Resist (CAR) for Next-Generation Lithography3
Synthesis of Kapton-type Polyamide Ester and Study of Their Electrophoretic Deposition Function3
Benzothiadiazole-Based Fused-Ring Electron Acceptors for Green-Light Wavelength-Selective Organic Solar Cells3
Antibacterial Property of Si Nanopillars for Anti-Microbial Resistance (AMR) Bacteria3
Multi-Trigger Resist for EUV lithography2
High Speed Ashing of Ion Implanted Photoresist by Microwave Excited Water Vapor Plasma with Powered Substrate2
High-Refractive-Index Photosensitive Siloxane Coatings for Optical Fingerprint Sensor2
Printing of Random Needle-like Resist Patterns Utilizing Laser Speckle Lithography2
EUV Lithography: Past, Present and Future2
Synthesis and Structural Characterization of Polyimide Containing Diphenylsiloxane Unit2
Novel Temporary Bonding/Debonding System Enabling Advanced Packaging Process2
Spatial Distribution Imaging of Resist Thin Film with Micrometer Resolution using Reflection Type Soft X-ray Projection Microscope2
Spin-on Metal Oxide Hard Mask as Underlayer for EUV Lithography with Chemically Amplified Resist2
Evaluation of Basic Behavior of Acrylic Polymer Changing Composition by KrF, ArF and EUV Exposure2
Visible-Light Sensitive Reworkable Resins for Dental Application: Improved Stability2
Printing of Random Patterns on Stepped Surfaces Using Speckle Lithography2
High Resolution and Low Stress Photo-Definable Polyimide2
Improvement of Sensitivity and Resolution by Carboxylic Acid Type Dissolution Inhibitor in Three-Component Chemically Amplified Photosensitive Polyimide2
Present Status of EUV Interference Lithography at NewSUBARU2
Novel Low <i>D<sub>f</sub></i> Photosensitive Materials for Redistribution Layer2
Stochastic Simulation Study of Pattern Formation in EUV resists with Photo-Decomposable Quenchers2
Spatial Distribution Analysis of Functional Groups in Resist Thin Film Using Reflection-Mode Resonant Soft X-ray Scattering2
The Removal of Acid Violet 7 from Aqueous Solutions by Photocatalytic-Poly(Ethylene Glycol Dimethacrylate-<i>co</i>-4-Vinylpyridine)-Titanium Dioxide Nanocomposite Beads: Kinetic, Isotherm2
Composite Membrane of Bi<sub>2</sub>WO<sub>6</sub>-NCQDs Laminated Hetero-junction Loaded on PES Support for Photo-catalytic Degradation of Organic Pollutants2
Behavior of Secondary Electrons: Estimation of the Ionization Yield in Poly(hydroxystyrene) under EUV Irradiation Based on Binary Encounter Theory and Continuous Slowing-Down Spectrum2
Repeated <i>trans</i>↔<i>cis</i> Isomerization and Fluorescence Regulation of a Carbazole-Based Azobenzene Derivative by Acid/Base Addition2
TiO<sub>2</sub>-SiO<sub>2</sub> Radical-Based Gas-Permeable Mold for High-Precision UV Nanoimprint Lithography2
Influence of Alkyl Length on the Morphology and Higher-Order Structure of Poly(amic acid) Flower-Like Particles2
Soft Motion of Dielectric Driven Balloon Actuator2
Fabrication of Moth-eye-structured Films with Two Types of Resin Separated by Micro-order Regions2
Evaluation of Electron Blur for Different Electron Energies1
The Photopolymer Science and Technology Award1
Synthesis of Methacryl Monomer Having a 6-Chloropyridyl Group and Their Application to Photo-adhesive Material1
Fundamental Evaluation of KrF Resist Changing Formulation by EB and EUV Exposure1
Physical and Chemical Drying of Coatings with NIR Absorbers to Replace Oven Technologies1
Investigation of Control of Water Contact Angle by Composition Control of SiCO<sub>x</sub>H<sub>y</sub> Film Formed on Si Substrate1
Synthesis and Photovoltaic Properties of Non-Fullerene Acceptors with Quinoxaline-Based Central Unit1
Relationship between Defect Risks and Effective Reaction Radius for Deprotection in Chemically Amplified Resist Process for Extreme Ultraviolet Lithography1
Analysis of Deprotection Activation Energy of Dissolution Inhibitors in Three-Component Chemically Amplified Novolac-based Resists (2)1
The Photopolymer Science and Technology Award1
Evaluating the Anti-biofilm Performance of Si and Resin Based Nanopillars1
Mechanistic Studies of Positive-Tone Organoantimony Resists1
Substitution Effect on Self-Assembly and the Resulting Fluorescence Efficiency of Triangular Azo Chromophores1
Immobilization of CYP1A2 and CYP Reductase onto Self-assembled Phospholipid Layer and Evaluation of their Activity1
Grazing-Incidence Soft-X-ray Scattering for the Chemical Structure Size Distribution Analysis in EUV Resist1
Bright Outlook for High-tech Industry1
The Impact of (Poly)glycerol in Developer on the Dissolution and Sensitivity of Positive-tone Photosensitive Polyimides1
Photomechanical Rolling Motion of Mixed Molecular Glass Microspheres Containing an Azobenzene-based Amorphous Molecular Material1
A 3D-Simulation and Experimental Study of the Fluid Flow Around a Nano-Step Structure Formed by UV-NIL1
High Packing Efficiency Deployment Method Using Swelling Hydrogels Inspired by Out-of-Plane Biological Deformation1
Metal Purifiers Specific to Lithography Related Chemicals1
Going Beyond the Ohnishi Parameter: Correlating Dissociation Energies to Polymer Etch Rates1
Crack Resistance Evaluation Method of Photoimageable Dielectrics for Redistribution Layer1
Biomimetic Wave Propagation in Magnetic Soft Actuator1
Designing Er<sup>3+</sup>/Ho<sup>3+</sup>-Doped Near-Infrared (NIR-II) Fluorescent Ceramic Particles for Avoiding Optical Absorption by Water1
Surface Cleaning and Modification of Oxide Films by Atomic Hydrogen Annealing1
Emission Patterning Using a Novel Amorphous Molecular Fluorophore with Three Cyanostilbene Moieties1
Preparation of a Polysilane–Methacrylate Copolymer with Two Methacrylate Species1
Molecular Assemblies of Minor Trigonal Molecules Regulated with the Help of Major Light-sensitive Components1
Expanding the Formation Region of Double Gyroid Structures from ABC Triblock Terpolymers by Solution Casting1
Heat Treatment for a Membrane Composed of Polymer Nanofibers and a Perfluorosulfonic-Acid Polymer Matrix: Effect on Proton-Exchange-Membrane Properties1
Photo-reactivity of 2,4,6-Tris(benzylthio)-1,3,5-triazines and Accompanying Refractive Index Change1
Erratum to “Synthesis, Properties, and Photovoltaic Characteristics of Arch- and S-shaped Naphthobisthiadiazole-based Acceptors”[J. Photopolym. Sci. Technol. 34 (2021) 285-290]1
Nanoimprint Lithography and Microinjection Molding Using Gas-Permeable Hybrid Mold for Antibacterial Nanostructures1
Formation and Stability of Cs<sub>2</sub>SnBr<sub>6</sub> Perovskite Nanocrystals from CsSn<sub>2</sub>Br<sub>5</sub> Nanocubes1
Thermal, Optical, and Dielectric Properties of Bio-based Polyimides Derived from an Isosorbide-containing Dianhydride and Diamines with Long Alkyl Chains1
Molecular Dynamics Study of Dependence of Loading Pressure on Shear Properties of Organic Nanofilms1
Negative Photo-Definable Polyimide Dry Films for Fine and High Aspect Ratio Patterning1
Recent Status of the Stochastic Issues of Photoresist Materials in EUV Lithography1
Three-dimensional Numerical Simulation of Liquid Film Formation and the Distribution of Cleaning Solutions on a Rotating Disk1
Degradation of Modified Polystyrenes Having Degradable Units by Near Infrared Light Irradiation in The Presence of A Photon Upconversion Nanoparticle and A Photoacid Generator1
Preparation of poly(methyl methacrylate) photochromic microcapsules containing spiro-pyran by solvent volatilization1
Surface Modification of Fluoropolymers by Atomic Hydrogen1
Enhanced Adhesion and Resolution of Negative Photoresists on Copper Substrates with Polyglycerin-Based Methacrylate1
Durability Test of Replica Mold in UV Nanoimprinting and Enlargement of Mold Patterned Area by Mold Stitching1
Synthesis of Star-shaped Miktoarm Terpolymers Composed of Polyisoprene, Polystyrene, and Poly (2,2,2-trifluoroethyl methacrylate) via Arm-first Approach1
Synthesis of Imide-based Semiconducting Polymers by Nonstoichiometric Step-growth Polycondensation via Intramolecular Catalyst-transfer System1
Development of Dimethylaminotolane-Incorporated Poly(<i>N</i>-Isopropylacrylamide) Gel Exhibiting External Stimuli Responsive Fluorescence1
Characteristic of Immunosorbent Assay using Micro Capillary Arrays coated by SiCOxHy CVD Films1
Hybrid Soft Replica Molds for Residual Layer-Free Patterning1
Influence of Counteranions on the Performance of Tin-based EUV Photoresists1
Flexible in-plane Micro-Supercapacitor Prepared by Laser Annealing and Ablation of a Graphene/Polyamide Acid Composite1
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