Journal of Photopolymer Science and Technology

Papers
(The TQCC of Journal of Photopolymer Science and Technology is 2. The table below lists those papers that are above that threshold based on CrossRef citation counts [max. 250 papers]. The publications cover those that have been published in the past four years, i.e., from 2022-05-01 to 2026-05-01.)
ArticleCitations
Positive-Tone Organoantimony Resists12
Synthesis of a Dipyridyl Disulfide Cross-linking Reagent and Its Application to Photo-adhesion of Dissimilar Materials11
Synthesis and Properties of Polyguanamines Containing <i>N</i>-Phenylmelamine Units11
Reliability Study for Photosensitive RDL Material10
Chemical Mechanisms of Metal-Based Extreme Ultraviolet Resists10
Preparation of Rigid Polyimides from Various Dianhydrides and 4,4’’’-Diaminoquaterphenyl and Comparison with Properties of Polyimides from 3,3’’’,4,4’’’-<i>p</i>-Quaterphenyltetracarboxyli9
Dissolution Kinetics near Bottom Interface of a Poly(4-hydroxystyrene-co-(methyl methacrylate)-co-(methacrylic acid)) Film in Tetraalkylammonium Hydroxide Aqueous Developers9
Photocured Blended Films of Diarylfluorene having Naphthalene Moieties and TiO<sub>2</sub> with High Refractive Indices9
Chiral Photomechanical Behavior of Azobenzene-based Molecular Glass Particles Observed in Hydroxypropyl Cellulose Hydrogel7
Magnetically-Actuated Dynamic Culture System for Investigating Mechanical Effects on Biological Growth7
The Photopolymer Science and Technology Award6
Comparison of Photoresist Sensitivity between KrF, EB and EUV Exposure6
Resist Removal Using Laser Irradiation Combined with Ozone Water Treatment5
Theory of Photodecomposable Base in Chemically Amplified Resist5
Polymeric Antibacterial Surfaces with Nano-pillar Arrays Mimicking Cicada Wings5
Development of Selenonium PAGs in EUV Lithography toward High Sensitivity Achievement5
Nanoimprint Lithography for Collagen Micropatterning at Low-Temperature 5℃ with TiO<sub>2</sub>-SiO<sub>2</sub> Gas-Permeable Porous Mold5
Agitation inside the Liquid Film on Two-Fluid Jet Sprayed Surface4
Low Temperature Curable Low Dk & Df Polyimide for Redistribution Layer4
Functional Group Influence on Block Copolymer Segment Interactions: An Analysis via Flory–Huggins and Hansen Solubility Parameters4
Characterization of Photoacid Generator Bound Resist with X-ray Absorption Spectroscopy at NewSUBARU4
Optical Oxygen Measurement using Microneedle of Bioabsorable Polymer4
The Photopolymer Science and Technology Award4
The Effect of Side-Chain Modification via Hydrogen Bonding on the Microphase-Separated Structure of PS-<i>b</i>-P4VP-<i>b</i>-PMMA4
Evaluation of Surface-Enhanced Raman Scattering Substrate Consisting of Gold Nanoparticles Grown on Nanoarrays of Boehmite Fabricated using Magnetron Sputtering Process4
Raman Spectral Data–Driven Analysis of Diamond-like Carbon Films Deposited Using the Radio-frequency Plasma-enhanced Chemical Vapor Deposition Method4
Benzothiadiazole-Based Fused-Ring Electron Acceptors for Green-Light Wavelength-Selective Organic Solar Cells4
Synthesis of Highly Luminescent CsPbCl<sub>3</sub> Perovskite Nanocrystals with Oleylammonium Chloride as an Alternative Halide Source3
High Resolution and Low Stress Photo-Definable Polyimide3
Behavior of Secondary Electrons: Estimation of the Ionization Yield in Poly(hydroxystyrene) under EUV Irradiation Based on Binary Encounter Theory and Continuous Slowing-Down Spectrum3
A Novel Process to Reduce Roughness in Chemically Amplified Resist (CAR) for Next-Generation Lithography3
The Removal of Acid Violet 7 from Aqueous Solutions by Photocatalytic-Poly(Ethylene Glycol Dimethacrylate-<i>co</i>-4-Vinylpyridine)-Titanium Dioxide Nanocomposite Beads: Kinetic, Isotherm3
Antibacterial Property of Si Nanopillars for Anti-Microbial Resistance (AMR) Bacteria3
Ultra-hydrophilic Diamond-like Carbon Coating on an Inner Surface of a Small-diameter Long Tube with an Amino Group by AC High-voltage Plasma Discharge3
Composite Membrane of Bi<sub>2</sub>WO<sub>6</sub>-NCQDs Laminated Hetero-junction Loaded on PES Support for Photo-catalytic Degradation of Organic Pollutants3
Visible-Light Sensitive Reworkable Resins for Dental Application: Improved Stability3
Spatial Distribution Analysis of Functional Groups in Resist Thin Film Using Reflection-Mode Resonant Soft X-ray Scattering3
Spin-on Metal Oxide Hard Mask as Underlayer for EUV Lithography with Chemically Amplified Resist3
Droplet-Dispensed Ultraviolet Nanoimprint Lithography in Mixed Condensable Gas of Trans-1,3,3,3-Tetrafluoropropene and Trans-1-Chloro-3,3,3-Trifluoropropene3
Synthesis and Photocuring Properties of One-component Polymerizable Thioxanthone-based Photoinitiators with High Migration Stability3
Breaking Boundaries of Photoinitiators: New Ways to Improve the Reactivity of Radical Polymerization3
Investigation of the Mechanism and Critical Parameters for the Lift-Off Lithography Process with Negative Photoresist3
Evaluation of Basic Behavior of Acrylic Polymer Changing Composition by KrF, ArF and EUV Exposure3
Multi-Trigger Resist for EUV lithography3
Fabrication of Moth-eye-structured Films with Two Types of Resin Separated by Micro-order Regions3
Synthesis of Kapton-type Polyamide Ester and Study of Their Electrophoretic Deposition Function3
Synthesis of ABC/ACB-Type Triblock Copolymers Composed of Polystyrene and Polymethacrylate via Living Anionic Polymerization and Analyzing the Effect of Casting Solvents on Higher-Order Structures3
High-Refractive-Index Photosensitive Siloxane Coatings for Optical Fingerprint Sensor3
Printing of Random Needle-like Resist Patterns Utilizing Laser Speckle Lithography2
Elucidating The Role of Electrons in Extreme Ultraviolet Patterning Variability2
Photo-reactivity of 2,4,6-Tris(benzylthio)-1,3,5-triazines and Accompanying Refractive Index Change2
Photomechanical Rolling Motion of Mixed Molecular Glass Microspheres Containing an Azobenzene-based Amorphous Molecular Material2
Preparation of a Polysilane–Methacrylate Copolymer with Two Methacrylate Species2
Durability Test of Replica Mold in UV Nanoimprinting and Enlargement of Mold Patterned Area by Mold Stitching2
Nanoimprint Lithography and Microinjection Molding Using Gas-Permeable Hybrid Mold for Antibacterial Nanostructures2
Influence of Alkyl Length on the Morphology and Higher-Order Structure of Poly(amic acid) Flower-Like Particles2
Photopolymerization Induced by Upconversion Emission for Poly(pentaerythritol acrylate) Shell Coating on NaYF<sub>4</sub> Nanoparticle Surface Toward Ratiometric Optical Thermometry2
EUV Lithography: Past, Present and Future2
Printing of Random Patterns on Stepped Surfaces Using Speckle Lithography2
Present Status of EUV Interference Lithography at NewSUBARU2
Novel Temporary Bonding/Debonding System Enabling Advanced Packaging Process2
The Photopolymer Science and Technology Award2
Synthesis of Imide-based Semiconducting Polymers by Nonstoichiometric Step-growth Polycondensation via Intramolecular Catalyst-transfer System2
Characteristic of Immunosorbent Assay using Micro Capillary Arrays coated by SiCOxHy CVD Films2
Influence of Counteranions on the Performance of Tin-based EUV Photoresists2
Stochastic Simulation Study of Pattern Formation in EUV resists with Photo-Decomposable Quenchers2
TiO<sub>2</sub>-SiO<sub>2</sub> Radical-Based Gas-Permeable Mold for High-Precision UV Nanoimprint Lithography2
Novel Low <i>D<sub>f</sub></i> Photosensitive Materials for Redistribution Layer2
Repeated <i>trans</i>↔<i>cis</i> Isomerization and Fluorescence Regulation of a Carbazole-Based Azobenzene Derivative by Acid/Base Addition2
Ultrasound-Assisted Degradation of Stimuli-Sensitive Polymers which Generate Bubbles using TiO<sub>2</sub> and Photoacid Generators: Properties and Reaction Mechanism2
Soft Motion of Dielectric Driven Balloon Actuator2
Biomimetic Wave Propagation in Magnetic Soft Actuator2
Mechanistic Studies of Positive-Tone Organoantimony Resists2
Surface Cleaning and Modification of Oxide Films by Atomic Hydrogen Annealing2
Immobilization of CYP1A2 and CYP Reductase onto Self-assembled Phospholipid Layer and Evaluation of their Activity2
Expanding the Formation Region of Double Gyroid Structures from ABC Triblock Terpolymers by Solution Casting2
Improvement of Sensitivity and Resolution by Carboxylic Acid Type Dissolution Inhibitor in Three-Component Chemically Amplified Photosensitive Polyimide2
Synthesis and Structural Characterization of Polyimide Containing Diphenylsiloxane Unit2
Spatial Distribution Imaging of Resist Thin Film with Micrometer Resolution using Reflection Type Soft X-ray Projection Microscope2
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