Journal of Photopolymer Science and Technology

Papers
(The TQCC of Journal of Photopolymer Science and Technology is 1. The table below lists those papers that are above that threshold based on CrossRef citation counts [max. 250 papers]. The publications cover those that have been published in the past four years, i.e., from 2021-07-01 to 2025-07-01.)
ArticleCitations
Synthesis of a Dipyridyl Disulfide Cross-linking Reagent and Its Application to Photo-adhesion of Dissimilar Materials9
Positive-Tone Organoantimony Resists8
Synthesis and Properties of Polyguanamines Containing <i>N</i>-Phenylmelamine Units8
Chemical Mechanisms of Metal-Based Extreme Ultraviolet Resists8
Comparison of Photoresist Sensitivity between KrF, EB and EUV Exposure6
Preparation of Rigid Polyimides from Various Dianhydrides and 4,4’’’-Diaminoquaterphenyl and Comparison with Properties of Polyimides from 3,3’’’,4,4’’’-<i>p</i>-Quaterphenyltetracarboxyli6
Reliability Study for Photosensitive RDL Material6
Polymeric Antibacterial Surfaces with Nano-pillar Arrays Mimicking Cicada Wings4
Resist Removal Using Laser Irradiation Combined with Ozone Water Treatment4
Theory of Photodecomposable Base in Chemically Amplified Resist4
Optical Oxygen Measurement using Microneedle of Bioabsorable Polymer4
Nanoimprint Lithography for Collagen Micropatterning at Low-Temperature 5℃ with TiO<sub>2</sub>-SiO<sub>2</sub> Gas-Permeable Porous Mold4
Agitation inside the Liquid Film on Two-Fluid Jet Sprayed Surface3
Synthesis of ABC/ACB-Type Triblock Copolymers Composed of Polystyrene and Polymethacrylate via Living Anionic Polymerization and Analyzing the Effect of Casting Solvents on Higher-Order Structures3
Synthesis of Kapton-type Polyamide Ester and Study of Their Electrophoretic Deposition Function3
Development of Selenonium PAGs in EUV Lithography toward High Sensitivity Achievement3
Evaluation of Surface-Enhanced Raman Scattering Substrate Consisting of Gold Nanoparticles Grown on Nanoarrays of Boehmite Fabricated using Magnetron Sputtering Process3
Droplet-Dispensed Ultraviolet Nanoimprint Lithography in Mixed Condensable Gas of Trans-1,3,3,3-Tetrafluoropropene and Trans-1-Chloro-3,3,3-Trifluoropropene3
Characterization of Photoacid Generator Bound Resist with X-ray Absorption Spectroscopy at NewSUBARU3
Low Temperature Curable Low Dk & Df Polyimide for Redistribution Layer3
High-Refractive-Index Photosensitive Siloxane Coatings for Optical Fingerprint Sensor3
Functional Group Influence on Block Copolymer Segment Interactions: An Analysis via Flory–Huggins and Hansen Solubility Parameters3
Synthesis of Highly Luminescent CsPbCl<sub>3</sub> Perovskite Nanocrystals with Oleylammonium Chloride as an Alternative Halide Source2
A Novel Process to Reduce Roughness in Chemically Amplified Resist (CAR) for Next-Generation Lithography2
Multi-Trigger Resist for EUV lithography2
Fabrication of Moth-eye-structured Films with Two Types of Resin Separated by Micro-order Regions2
Spatial Distribution Imaging of Resist Thin Film with Micrometer Resolution using Reflection Type Soft X-ray Projection Microscope2
Ultra-hydrophilic Diamond-like Carbon Coating on an Inner Surface of a Small-diameter Long Tube with an Amino Group by AC High-voltage Plasma Discharge2
Visible-Light Sensitive Reworkable Resins for Dental Application: Improved Stability2
Evaluation of Basic Behavior of Acrylic Polymer Changing Composition by KrF, ArF and EUV Exposure2
Spatial Distribution Analysis of Functional Groups in Resist Thin Film Using Reflection-Mode Resonant Soft X-ray Scattering2
Behavior of Secondary Electrons: Estimation of the Ionization Yield in Poly(hydroxystyrene) under EUV Irradiation Based on Binary Encounter Theory and Continuous Slowing-Down Spectrum2
Composite Membrane of Bi<sub>2</sub>WO<sub>6</sub>-NCQDs Laminated Hetero-junction Loaded on PES Support for Photo-catalytic Degradation of Organic Pollutants2
The Removal of Acid Violet 7 from Aqueous Solutions by Photocatalytic-Poly(Ethylene Glycol Dimethacrylate-<i>co</i>-4-Vinylpyridine)-Titanium Dioxide Nanocomposite Beads: Kinetic, Isotherm2
High Speed Ashing of Ion Implanted Photoresist by Microwave Excited Water Vapor Plasma with Powered Substrate2
Spin-on Metal Oxide Hard Mask as Underlayer for EUV Lithography with Chemically Amplified Resist2
High Resolution and Low Stress Photo-Definable Polyimide2
Erratum to “Synthesis, Properties, and Photovoltaic Characteristics of Arch- and S-shaped Naphthobisthiadiazole-based Acceptors”[J. Photopolym. Sci. Technol. 34 (2021) 285-290]1
Thermal, Optical, and Dielectric Properties of Bio-based Polyimides Derived from an Isosorbide-containing Dianhydride and Diamines with Long Alkyl Chains1
Relationship between Defect Risks and Effective Reaction Radius for Deprotection in Chemically Amplified Resist Process for Extreme Ultraviolet Lithography1
Photomechanical Rolling Motion of Mixed Molecular Glass Microspheres Containing an Azobenzene-based Amorphous Molecular Material1
Preparation of a Polysilane–Methacrylate Copolymer with Two Methacrylate Species1
Degradation of Modified Polystyrenes Having Degradable Units by Near Infrared Light Irradiation in The Presence of A Photon Upconversion Nanoparticle and A Photoacid Generator1
Immobilization of CYP1A2 and CYP Reductase onto Self-assembled Phospholipid Layer and Evaluation of their Activity1
Recent Status of the Stochastic Issues of Photoresist Materials in EUV Lithography1
Stochastic Simulation Study of Pattern Formation in EUV resists with Photo-Decomposable Quenchers1
Novel Temporary Bonding/Debonding System Enabling Advanced Packaging Process1
Printing of Random Patterns on Stepped Surfaces Using Speckle Lithography1
Present Status of EUV Interference Lithography at NewSUBARU1
The Photopolymer Science and Technology Award1
Hybrid Soft Replica Molds for Residual Layer-Free Patterning1
Molecular Dynamics Study of Dependence of Loading Pressure on Shear Properties of Organic Nanofilms1
A 3D-Simulation and Experimental Study of the Fluid Flow Around a Nano-Step Structure Formed by UV-NIL1
Surface Modification of Fluoropolymers by Atomic Hydrogen1
Durability Test of Replica Mold in UV Nanoimprinting and Enlargement of Mold Patterned Area by Mold Stitching1
Characteristic of Immunosorbent Assay using Micro Capillary Arrays coated by SiCOxHy CVD Films1
Going Beyond the Ohnishi Parameter: Correlating Dissociation Energies to Polymer Etch Rates1
The Photopolymer Science and Technology Award1
Bright Outlook for High-tech Industry1
Photo-reactivity of 2,4,6-Tris(benzylthio)-1,3,5-triazines and Accompanying Refractive Index Change1
Soft Motion of Dielectric Driven Balloon Actuator1
Printing of Random Needle-like Resist Patterns Utilizing Laser Speckle Lithography1
Biomimetic Wave Propagation in Magnetic Soft Actuator1
Grazing-Incidence Soft-X-ray Scattering for the Chemical Structure Size Distribution Analysis in EUV Resist1
Heat Treatment for a Membrane Composed of Polymer Nanofibers and a Perfluorosulfonic-Acid Polymer Matrix: Effect on Proton-Exchange-Membrane Properties1
Negative Photo-Definable Polyimide Dry Films for Fine and High Aspect Ratio Patterning1
Formation and Stability of Cs<sub>2</sub>SnBr<sub>6</sub> Perovskite Nanocrystals from CsSn<sub>2</sub>Br<sub>5</sub> Nanocubes1
Synthesis and Structural Characterization of Polyimide Containing Diphenylsiloxane Unit1
Expanding the Formation Region of Double Gyroid Structures from ABC Triblock Terpolymers by Solution Casting1
Investigation of Control of Water Contact Angle by Composition Control of SiCO<sub>x</sub>H<sub>y</sub> Film Formed on Si Substrate1
Mechanistic Studies of Positive-Tone Organoantimony Resists1
Fundamental Evaluation of KrF Resist Changing Formulation by EB and EUV Exposure1
Nanoimprint Lithography and Microinjection Molding Using Gas-Permeable Hybrid Mold for Antibacterial Nanostructures1
Influence of Counteranions on the Performance of Tin-based EUV Photoresists1
Novel Low <i>D<sub>f</sub></i> Photosensitive Materials for Redistribution Layer1
Surface Cleaning and Modification of Oxide Films by Atomic Hydrogen Annealing1
Flexible in-plane Micro-Supercapacitor Prepared by Laser Annealing and Ablation of a Graphene/Polyamide Acid Composite1
Evaluation of Electron Blur for Different Electron Energies1
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