Journal of Vacuum Science & Technology B

Papers
(The median citation count of Journal of Vacuum Science & Technology B is 1. The table below lists those papers that are above that threshold based on CrossRef citation counts [max. 250 papers]. The publications cover those that have been published in the past four years, i.e., from 2022-01-01 to 2026-01-01.)
ArticleCitations
Simplifying in vacuo optical measurements of CVD processes using vacuum-compatible optical fibers88
Stacked hydrogel-based brain-on-chips utilizing capillary force flow pinning33
Thickness dependent field emission study of LaB6 coated Si nanowire arrays25
Heating samples to 2000 °C and above for scanning tunneling microscopy studies in ultrahigh vacuum23
Secondary ion mass spectrometry as a tool to analyze semiconductor opening switch diodes19
In-plasma photo-assisted etching of Si with chlorine aided by an external vacuum ultraviolet source18
Current–voltage characteristics of Ag/Nb:SrTiO3/Ag and Au/Nb:SrTiO3/Ag heterostructures15
Photoassisted electron emission from planar-type electron source based on graphene/oxide/silicon structure14
In situ electron-beam-induced mechanical loading and fracture of suspended strained silicon nanowires14
Top electrode dependence of the write-once-read-many-times resistance switching in BiFeO3 films14
Numerical analysis of high vacuum packaging efficiency for narrow structured devices14
Angular emission evolution of the ZrO/W(100) Schottky emitter12
Tungsten oxide nanowires prepared by thermal oxidation for application in cold cathode flat panel x-ray source12
Numerical simulations of heterojunction GaN nanopillar light emitting diodes12
Comparing the properties and growth of graphene on electrolytic and rolled Cu foils by chemical vapor deposition11
Exploring oxide-nitride-oxide scalloping behavior with small gap structure and chemical analysis after fluorocarbon or hydrofluorocarbon plasma processing11
Broadband optical enhancement of suspended Ge-on-Si infrared absorbers by using backside etching holes and a metallic reflector11
Influence of thermal contact resistance on the field emission characteristics of a carbon nanotube11
High quality factor silicon nitride nanomechanical resonators fabricated by maskless femtosecond laser micromachining11
Novel process integration flow of germanium-on-silicon FinFETs for low-power technologies10
Scanning electron microscope imaging by selective e-beaming using photoelectron beams from semiconductor photocathodes10
Understanding 3D anisotropic reactive ion etching of oxide-metal stacks10
Novel excitation structure to improve the performance of a miniature radio frequency ion thruster10
Effect of inductively coupled plasma etch on the interface barrier behavior of (001) β-Ga2O3 Schottky barrier diode9
Overlay control solution for high aspect ratio etch process induced overlay error9
Investigation on the heat transfer characteristics of flexible vacuum glass based on cross-laminated microcavities9
Effect of glow cleaning bias voltage on microstructure and properties of ion nitriding/multiarc ion plating CrTiAlN composite coatings9
Accelerating multiple patterning lithography layout decomposition with a stochastic analog Boolean satisfiability solver9
Effect of ultraviolet light on field emission performance and lifetime of lateral field emitter devices9
Correction model for photoresist shrinkage in critical dimension scanning electron microscopy based on improved spider wasp optimizer—Optimized support vector regression9
Compositional dependence of direct transition energies in SixGe1−xySny alloys lattice-matched to Ge/GaAs9
Investigation into the effect of a PECVD-deposited SiOx chamber coating on the selective, radical-based NF3 etching of TaN with respect to BEOL low-k9
Fluorescent flow analysis of in situ material exchange in two-photon 3D printing8
Piezoelectric effect of crystal nanodomains on the friction force8
Effect of the TiN-coating-layer properties on the electron emission of volcano-structured silicon field emitter arrays8
Methods for automatically obtaining the sputtering-induced roughness upon depth profiling of polycrystalline films8
Electron emission properties of titanium nitride coated volcano-structured silicon emitters8
Study of zinc doped In0.53Ga0.47As/InP/InAlAs/InP heterostructures by time-of-flight; magnetic secondary ion spectrometry and high-energy x-ray photoelectron spectroscopy8
Fabrication of silicon W and G center embedded light-emitting diodes for electroluminescence8
Effects of athermal carrier injection on Co-60 gamma-ray damage in SiC merged-PiN Schottky diodes8
Deep cryogenic silicon etching for 3D integrated capacitors: A numerical perspective8
Resistive switching of two-dimensional Ag2S nanowire networks for neuromorphic applications8
Evaluation of dry stored disposable sensor strip on rapid SARS-CoV-2 detection platform8
Heat transfer mechanism of electrostatic chuck surface and wafer backside to improve wafer temperature uniformity8
Wet and dry etching of ultrawide bandgap LiGa5O8 and LiGaO28
Computational study of mechanical stresses in a cell interacting with micromechanical cues and microfabrication of such cues in Nervous system-on-Chips8
Practical guide for in-house solid-state nanopore fabrication and characterization8
In-depth feasibility study of extreme ultraviolet damascene extension: Patterning, dielectric etch, and metallization7
All field emission models are wrong, … but are any of them useful?7
Numerical simulation study of the flow and diffusion characteristics of trace gas in a gas mixture based on the ellipsoidal statistical Bhatnagar–Gross–Krook model7
Nanofabricating neural networks: Strategies, advances, and challenges7
Electrical characteristics of tungsten-doped InZnSnO thin film transistors by RF magnetron sputtering7
Novel wet transfer technology of manufacturing flexible suspended two-dimensional material devices7
Silicon etching by chlorine plasma: Validation of surface reactions mechanism7
Dry etching characteristics of titanium dioxide grown by different physical vapor deposition processes7
Outgassing rate testbed for in-operation analysis of powered and heated assemblies7
Chaos-enhanced self-adaptive particle swarm optimization with simulated annealing for digital lithography mask optimization7
Through-chip porous layer fabrication by plasma etching with protective film deposition7
Effect of water vapor pressure on positive and negative tone electron-beam patterning of poly(methyl methacrylate)7
Investigation of polymer template removal techniques in three-dimensional thin-shell nanolattices7
Selective growth of graphene films on gallium-focused ion beam irradiated domains7
Digital biosensor for human cerebrospinal fluid detection with single-use sensing strips7
High-precision CD extraction for silver-layered photoresists using Monte Carlo simulation7
Fabrication of sub-micrometer 3D structures for terahertz oscillators by electron beam gray-tone lithography7
Microsphere photolithography using reusable microsphere array mask for low-cost infrared metasurface fabrication7
Absolute measurement of vacuum ultraviolet photon flux in an inductively coupled plasma using a Au thin film7
Micromirror fabrication for co-packaged optics using 3D nanoimprint technology6
Vertical silicon nanowedge formation by repetitive dry and wet anisotropic etching combined with 3D self-aligned sidewall nanopatterning6
Effect of atomic-scale microstructures on TiZrV non-evaporable getter film activation6
Preface to the Special Topic Collection Celebrating the Achievements and Life of Paul H. Holloway6
Nondestructive x-ray reflectivity analysis of Al distributions of ultraviolet-cured spin-coated resist films hybridized with trimethylaluminum6
Combined ultraviolet- and electron-beam lithography with Micro-Resist-Technology GmbH ma-N1400 resist6
Enhancement in neuromorphic NbO2 threshold switching at cryogenic temperatures6
Analysis for roughness-generation mechanism in Ru etching using Cl2/O2-based plasma for advanced interconnect6
Characteristics of a hybrid radio frequency capacitively and inductively coupled plasma using hydrogen gas6
Scanning anode field emission microscopy of a single Si emitter6
Influence of O content on exothermic and self-propagating characteristics of Ti/SiOx multilayer films6
Enhancement of electrical properties of a-IGZO thin film transistor by low temperature (150 °C) microwave annealing for flexible electronics6
Effect of low-pressure postannealing on the electrical properties of VO2 thin films6
Characterization of TaxO5−y thin films grown by HiPIMS reactive sputtering for temperature sensing applications6
Tailoring of structual, optical, and electrical properties of Cu films by sputtering power and deposition atmosphere6
Dysprosium liquid metal alloy ion source for magnetic nanostructures6
Fabrication of plasmonic Au nanostructures on dielectric supports using 10 keV electron beam lithography and tests for SERS biodetection6
Maximizing the performance of a field emission device by profiling the emitter’s height distribution6
Suppressing oxygen vacancy formation in ZrO2 to improve electrical properties by employing MoO2 bottom electrode6
Study of the structural and electronic properties of Zn1−x−yMgxTiyO structures6
Numerical analysis of Gaussian potential patches model depending on the substrate doping in inhomogeneous Schottky barrier diodes over a wide temperature range6
Realizing GaN-based blue laser diode with 7.5 W output power via electron blocking layer thickness adjustment6
New approach of local critical dimension uniformity improvement for via/contact hole etch with direct current superposition6
Experimental investigation of the feasibility of in situ plasma cleaning in normal-conducting copper cavities6
Electrochemical pipette-based analysis on anisotropy in rutile TiO2 for photoelectrochemical hydrogen revolution6
Spectro-ellipsometric probing of wetting, nucleation, and dot/island formation during photo-excited chemical vapor deposition of Ge on SiO2 substrate6
Predicting the effects of plasma-induced damage on p–n junction leakage and its application in the characterization of defect distribution6
Effects of high-temperature annealing on vacancy complexes and luminescence properties in multilayer periodic structures with elastically strained GeSiSn layers6
Interfacial reactivity in the Co/CuO samples as investigated by x-ray photoelectron spectroscopy6
TiN and TaN cointegration for 300 mm superconducting back end of line6
Novel inspection technology for detecting via open using parallel e-beam scanning and graphic design system5
Improvement of electrical characteristics of flexible AZO/Ag/Cu/AZO transparent conductive films by Cu deposition5
Experimental current-voltage-temperature and thermal sensitivity behaviors of an ideal Schottky barrier diode over a wide temperature range5
Yellow luminescence band defect related photocurrent instability of GaN p-i-n ultraviolet photodetectors5
Characterization of pulsed laser deposited La2O2S:Eu3+ thin films and effect of coating with graphene oxide layers5
Structural, surface, and upconversion luminescence properties of pulsed laser-deposited Y2O3:Ho3+,Yb3+ thin films5
Retraction: “Fabry–Perot-cavity-based refractometry without influence of mirror penetration depth” [J. Vac. Sci. Technol. B 39, 065001 (2021)]5
Novel approach for KrF chemically amplified resist optimization assisted by deep learning5
Impact of interparticle contact on discharge capacity in all-solid-state batteries: A 3D simulation approach5
Electrochemical bulk and film-type oxygen sensors: Strategies for detecting extremely low concentration in hydrogen environments5
Plasma confinement by an optoelectronic system5
Si nanocone structure fabricated by a relatively high-pressure hydrogen plasma in the range of 3.3–27 kPa5
Spatial variation of the elemental components of thin films from BiSrCaCuO target deposited using low energy femtosecond pulsed laser deposition in high background gas pressure5
Transition from the regime of thermionic emission to the space-charge limited current regime under strong Shottky effects5
AC thin-film electroluminescence: A historical overview with a look ahead5
Multiplicity features of carbon nanotube emitters5
High off-state voltage (4266 V) diamond metal oxide semiconductor field effect transistors5
Evolution of lithography-to-etch bias in multi-patterning processes5
All field emission experiments are noisy, … are any meaningful?5
Transferable GeSn ribbon photodetectors for high-speed short-wave infrared photonic applications5
Metal-pattern preparation based on selective deposition using soft organofluorine surfaces5
Improved optical and electrical response by glancing angle synthesized Al2O3 nanorod array device5
Study of simulations of double graded InGaN solar cell structures5
Investigation of Rb+ milling rates using an ultracold focused ion beam5
Measuring and understanding the nanomechanical properties of halide perovskites and their correlation to structure—A perspective5
Membrane-electrode junction properties for optimum potentiometric hydrogen sensor response5
Effect of quality improvement in active region on temperature characteristics of GaN-based ultraviolet laser diode5
Thank you to our 2024 reviewers!5
SiMiC: Context-aware silicon microstructure characterization using attention-based convolutional neural networks for field-emission tip analysis5
High-precision thermal characterization technique with dual-laser Raman thermometry5
Effect of substrate rotation speed on AlGaN nanowire deep ultraviolet light-emitting diodes by molecular beam epitaxy5
Thermal evaporation of thin Li films5
Novel surface wave technique for moderate-pressure plasma measurements5
Method for monitoring high aspect ratio contact dry etching process using calibration and normalization method for optical emission spectroscopy5
Optical and electronic spin properties of fluorescent micro- and nanodiamonds upon prolonged ultrahigh-temperature annealing5
Electrochemical imaging correlated to hydrogen evolution reaction on transition metal dichalcogenide, WS25
Improved impedance matching speed with gradient descent for advanced RF plasma system5
Design of plasma strip chamber for uniform gas supply with fluid flow simulation5
Investigation of tilted etching of Si3N4 using CF4/O2 plasma: Process development and mechanism study5
Integrated silicon electron source for high vacuum microelectromechanical system devices4
Thermal sensitivity and current-voltage-temperature characteristics in Pt/epitaxy n-Si/n+Si structures as a function of Schottky contact area4
Surface deposition of nanometer scale carbon structures on Bi2Sr2CaCu2O8 + δ using a low-cost scanning electron microscope4
Effects of gases on the field emission performance of silicon gated field emitter array4
Research on the improvement of the adhesion strength of the Cu films deposited on the Al2O3 films4
Morphology of Ge thin films crystallized by Au-induced layer exchange at low temperature (220 °C)4
Experimental study of flake graphite large-area explosion electron emission cathode performance based on particle size discrepancy4
Role of tin clustering in band structure and thermodynamic stability of GeSn by atomistic modeling4
Bilayer metal etch mask strategy for deep diamond etching4
Si content in methacrylamide-containing A- b -(B- r -C) block copolymers and its impact on reactive ion et4
Infrared optical properties of SiGeSn and GeSn layers grown by molecular beam epitaxy4
4H-SiC layer with multiple trenches in lateral double-diffused metal-oxide-semiconductor transistors for high temperature and high voltage applications4
Selectively patterned Mg-doped GaN by SiNx-driven hydrogen injection4
Enhancing plasma uniformity in SiH4/NH3 capacitively coupled plasmas via dielectric structure adjustment positioning adjacent to the power electrode4
Roughness-generation mechanism of Ru etching using Cl2/O2-based plasma for advanced interconnect4
MeV proton and neutron damage effects on deep-ultraviolet light-emitting diodes4
Characterization of iron-based alloy catalysts for atmospheric pressure chemical vapor deposition of carbon nanofibers via in situ transmission electron microscopy4
Effect of the kinetic energy on particle ejection process from carbon nanotubes bombarded by kilo-electron-volt C604
In situ mass spectrometric investigation to probe GeSn growth dynamics and mechanisms in the chemical vapor deposition processes4
Fabrication of ultrahigh aspect ratio Si nanopillar and nanocone arrays4
Optimization of silicon etch rate in a CF4/Ar/O2 inductively coupled plasma4
Physics based model of an AlGaN/GaN vacuum field effect transistor4
Grain growth of Cu wires during Joule heat welding4
Soft and hard trimming of imprint resist masks to fabricate silicon nanodisk arrays with different edge roughness4
Magnetized, radiofrequency-driven hollow cathode chemical-vapor deposition of ultrathick hydrogenated amorphous carbon4
Heating of Cs2Te photocathode via field emission and radiofrequency pulsed heating: Implication toward breakdown4
Selective wet etching of atomic layer deposited ferroelectric hafnium zirconium oxide and hafnium oxide thin films4
Dynamic switching operation of diamond MOSFETs with NO2 p-type doping and Al2O3 gate insulation and passivation4
Magneto-transport study on Sn-rich Sn1−xGex thin films enabled by CdTe buffer layer3
Comparison of surface morphology and roughness of silicon surfaces etched using pulsed and continuous flow XeF3
Shape tuning of large area silicon nanotip arrays through reactive ion etching3
Future of plasma etching for microelectronics: Challenges and opportunities3
Scalable fabrication of vertically arranged Bi2Se3 crossbar arrays for memristive device applications3
Depth-resolved characterization of mechanically weakened surface layers in vacuum ultraviolet-irradiated cycloolefin polymer films using micro slurry-jet erosion test and ToF-SIMS analysis3
Role of the oxidation conditions on the orientation of TiNxOy grown by atomic layer deposition: Impact on the optical and electrical properties3
Upgrading of the modified Knudsen equation and its verification for calculating the gas flow rate through cylindrical tubes3
Influence of electron beam irradiation on nanoscale adhesion during colloidal probe experiments inside the scanning electron microscope3
Cryomicroscopy of low melting point metals3
Miniature plasma source for in situ extreme ultraviolet lithographic scanner cleaning3
Epitaxial SiGeSn grown on Si by ion implantation3
Effects of iCVD organic passivation in oxide thin-film transistors under repetitive bending stress for electrical and mechanical stability3
Secondary ion mass spectrometry analysis of metal oxides using 70 keV argon, carbon dioxide, and water gas cluster ion beams3
Resistivity improvement of flexible transparent conductive films with Cu inserted intermediate layer3
3D structure of box-and-grid electron multiplier with higher electron collection efficiency3
Tracing degradation mechanisms of epitaxially grown GaAsSb on InP by InSb formation at elevated temperatures3
Negative differential resistance in photoassisted field emission from Si nanowires3
Molecular dynamics study of silicon atomic layer etching by chlorine gas and argon ions3
Cost-effective fabrication of RF AlGaN/GaN HEMTs on surface activated bonding-bonded SiC-SiC substrate3
Effects of ion implantation with arsenic and boron in germanium-tin layers3
Study on the etching mechanism of quartz using dual-frequency (60 MHz/400 KHz) capacitively coupled C4F8/Ar/O2 plasma3
Direct writing immersion laser lithography on graphene monolayers using two-photon absorption3
Atmospheric pressure plasma treatment of chitosan-acrylic acid blends3
Plasma enhanced activation of ion implanted dopants3
Fabrication of hierarchical nanostructures using binary colloidal nanosphere assembly3
Real-time determination of sputtered TiC film composition using optical emission spectroscopy3
Electronic structure of InSb (001), (110), and (111)B surfaces3
On the brightness, transverse emittance, and transverse coherence of field emission beam3
Zernike model for overlay control and tool monitor for lithography and etch process3
Vacuum control system for the Space Plasma Environment Research Facility3
Extreme contact shrink for back end of line connectivity3
Growth of CdS heterojunctions on Cd0.9Zn0.1Te single crystals with H2S3
Multiple connected artificial synapses based on electromigrated Au nanogaps3
Hybrid sputtering approach for reliable TOF-SIMS depth profiling of inorganic–organic multilayer films3
Plasmon resonance-based study of the peroxidaselike catalytic effect of gold nanoparticles3
Thermal sensing capability and current–voltage–temperature characteristics in Pt/n-GaP/Al/Ti Schottky diodes3
Self-alignment of whole wafers using patterning for capillary forces3
High sensitivity CIP2A detection for oral cancer using a rapid transistor-based biosensor module3
Identification of dust particles on a periodic nanostructured substrate using scanning electron microscope imaging3
Desorption model of volatile Ru species induced by partial chlorination on Ru(0001) under an O2/Cl2-based plasma process3
Structure optimization of Spindt-type emitter fabricated by triode high power pulsed magnetron sputtering3
Physical modeling of side wall deposition by inclined electron beam evaporation3
Molecular beam epitaxy growth and characterization of GePb alloys3
Is the linear relationship between the slope and intercept observed in field emission S-K plots an artifact?3
High current silicon nanowire field emitter arrays3
Controlling the etch selectivity of silicon using low-RF power HBr reactive ion etching3
Modeling of water outgassing from polymers incorporating surface adsorption and desorption3
Machine learning aided optimization of drag pump performance3
Electron transport mechanisms in amorphous zinc oxysulfide thin films3
Solar-thermal cold-wall chemical vapor deposition reactor design and characterization for graphene synthesis3
Fabrication and characteristics of double-gate zinc oxide nanowire field emitter arrays3
Permeation of oxygen and water into a plasma-enhanced chemical vapor deposited silicon nitride film as function of deposition pressure3
Systematic study of InP/InGaAsP heated plasma etching and roughness improvement for integrated optical devices3
Phase-shifted counterpropagating atmospheric pressure plasma jets: Characterization and interaction with materials3
Honeycomb-shaped vertically aligned carbon nanotubes decorated with molybdenum trioxide as an electrochemical sensor for glucose3
Nanoimprint lithography guiding templates for advanced magnetic media fabrication3
Cluster-induced desorption/ionization mass spectrometry of Ir(ppy)33
Random graphene adlayer morphologies grown on microfaceted Cu surfaces for physical unclonable functions3
Development for high-aspect-ratio hole etching with hydrogen fluoride gas based cryogenic process3
Long, stitch-free slot waveguide with s-bend tapered couplers for IR-sensing applications using electron beam lithography3
Mitigation of electronic crosstalk interference in graphene transistor biosensors3
Ferroelectricity in amorphous aluminum oxynitride films synthesized by inductively coupled plasma assisted atomic layer deposition3
Effect of sputter power on red-shifted optoelectronic properties in magnetron sputtered Ag/ZnO thin films3
Synthesis and characterization of electron beam irradiation-induced damage in polycrystalline metal thin films3
Role of dose optimization in Ru atomic layer deposition for low resistivity films2
Study of process parameters and characteristics properties of W coatings deposited by rf plasma sputtering2
Resistive switching characteristics of TiO2 films prepared by DC magnetron sputtering: Effects of nitrogen composition and phase structure2
Co-optimizing of H-curing, stress, and thermal annealing—A more effective way for realizing FEOL-BEOL compatible eMRAM chip2
On the origins of the m/z = 19 signals in residual gas analysis2
Interpreting the field emission equation for large area field emitters2
Low-temperature AlxGa1−xN growth by combined electron cyclotron resonance sputtering and magnetron sputtering2
Design and fabrication of a micro-opto-mechanical-systems accelerometer based on intensity modulation of light fabricated by a modified deep-reactive-ion-etching process using silicon-on-insulator waf2
On the chemistry mechanism for low-pressure chlorine process plasmas2
Measurement of field emission array current distributions by metal-coated CMOS image sensors2
Effect of praseodymium coating on electron emission from a nanoscale gold field emitter array2
Effect of varying threading dislocation densities on the optical properties of InGaN/GaN quantum wells with intentionally created V-shaped pits2
Design and large-scale nanofabrication of plasmonic solar light absorbers2
Facile fabrication of nanoporous structure on β titanium alloy to eliminate stress shielding for bone implant2
Impurity analysis of synthetic diamond for electronics and quantum physics2
Evolution of hard carbon layers on Ti-45Al-2Nb-2Mn-1B by plasma enhanced chemical vapor deposition of hydrocarbons and hydrogen2
Processing of experimental current-voltage characteristics of single tip emitters taking into account the functional dependence of the emission area on the applied voltage2
Close-packed silicon field emitter arrays with integrated anode fabricated by electron-beam lithography2
Carbon nanotube collimator as an vacuum ultraviolet window2
Radiation damage in GaN/AlGaN and SiC electronic and photonic devices2
Development of “GaSb-on-silicon” metamorphic substrates for optoelectronic device growth2
Fabrication of hollow silicon microneedles using grayscale lithography and deep reactive ion etching2
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