Journal of Vacuum Science & Technology B

Papers
(The median citation count of Journal of Vacuum Science & Technology B is 1. The table below lists those papers that are above that threshold based on CrossRef citation counts [max. 250 papers]. The publications cover those that have been published in the past four years, i.e., from 2021-04-01 to 2025-04-01.)
ArticleCitations
Electron emission performance analysis and application of carbon nanotube cold cathode prepared by cold pressing process25
Enhancement of performance and reliability in MOSFETs via high-pressure microwave annealing23
Tungsten oxide nanowires prepared by thermal oxidation for application in cold cathode flat panel x-ray source21
Selective metal-carbides hardmask strip with chlorine and oxygen plasma18
Mechanism and solution of sharp defects in trench double-diffused metal-oxide semiconductor polysilicon recess etching17
Observing secondary-electron yield and charging in an insulating material by ultralow-voltage scanning electron microscope17
Carbon impurities in oxide thin films: The effect of annealing and laser irradiation17
Auto-ponderomotive beam guiding up to 9.5 keV16
Sodium adsorption on nanometer-thick TiO2 channel thin-film transistors for enhanced drain currents15
Effects of graphene doping and gas adsorption on the peak positions of graphene plasmon resonance and adsorbate infrared absorption15
MeV proton and neutron damage effects on deep-ultraviolet light-emitting diodes14
Computational study of plasma dynamics and reactive chemistry in a low-pressure inductively coupled CF4/O2 plasma12
Characterization of GeO2 films formed on Ge substrate using high pressure oxidation11
Highly selective GaAs/AlGaAs dry etching using HBr/SF6/He11
Topological impact of a simple self-replication geometric structure with great application potential in vacuum pumping and photovoltaic industry10
Accuracy requirements of the microarrayed Einzel lens10
Fabrication of black GaAs by maskless inductively coupled plasma etching in Cl2/BCl3/O2/Ar chemistry9
Current–voltage characteristics of Ag/Nb:SrTiO3/Ag and Au/Nb:SrTiO3/Ag heterostructures9
Multi-step plasma etching of high aspect ratio silicon nanostructures for metalens fabrication9
Roughness-generation mechanism of Ru etching using Cl2/O2-based plasma for advanced interconnect9
Numerical analysis of high vacuum packaging efficiency for narrow structured devices9
Rubbing-induced site-selective deposition of 2D material patterns on nanomembranes9
Research on the improvement of the adhesion strength of the Cu films deposited on the Al2O3 films9
Soft and hard trimming of imprint resist masks to fabricate silicon nanodisk arrays with different edge roughness9
Engineering of ZrO2-based RRAM devices for low power in-memory computing8
Photoassisted electron emission from planar-type electron source based on graphene/oxide/silicon structure8
Graphene-based capacitive monolithic microphone with optimized air gap thickness and damping8
Cryogenic etching of positively tapered silicon pillars with controllable profiles8
Nanofabrication of high transition temperature superconductive electronics with focused helium ion irradiation8
Optical and electronic properties of Ge1−xSnx/Si alloys grown by remote plasma-enhanced chemical vapor deposition8
Ultralow impact energy dynamic secondary ion mass spectrometry with nonfully oxidizing surface conditions8
Enhancing performance of microbolometers by utilizing low-temperature polycrystalline silicon8
Optical metasurface fabricated using 3D nanoimprint lithography8
Numerical investigation of flow and particles contamination in reticle mini environment for extreme ultraviolet lithography8
Comparison of GeSn alloy films prepared by ion implantation and remote plasma-enhanced chemical vapor deposition methods8
X-ray photoelectron spectroscopy surface oxidation study of remote plasma-enhanced chemical vapor deposition-grown Ge1−xSnx/Si alloys7
Experimental study of flake graphite large-area explosion electron emission cathode performance based on particle size discrepancy7
Chemical and electrical modifications of few-layer graphene films via sub-10 keV electron beam irradiation7
Limitations of the independent control of ion flux and energy distribution function in high-density inductively coupled chlorine plasmas7
GaAs/GeSn/Ge n–i–p diodes and light emitting diodes formed via grafting7
Numerical simulations of heterojunction GaN nanopillar light emitting diodes7
In situ determination of sputtered Ni–Cu film composition from emission intensities7
Plasma-assisted thermal-cyclic atomic-layer etching of tungsten and control of its selectivity to titanium nitride7
Temperature dependence of the infrared dielectric function and the direct bandgap of InSb from 80 to 725 K7
Stacked hydrogel-based brain-on-chips utilizing capillary force flow pinning7
Comparative studies of metamorphic and strained InGaAs p-type semiconductor - intrinsic absorption layer - n-type semiconductor photodetector for low-temperature CH4 detection7
Field emission arrays from graphite fabricated by laser micromachining7
ZnO/Ag/graphene transparent conductive oxide film with ultrathin Ag layer7
Impact of photovoltaic effect on performance enhancement of triboelectric nanogenerator for energy harvesting applications6
Comment on “Restoration of the original depth distribution from the SIMS profile using the depth resolution function in framework of RMR model” [J. Vac. Sci. Technol. B 41, 024003 (2023)]6
Fabrication of pyramid-shaped gold tip for adiabatic nanofocusing of surface plasmon polaritons6
Thickness dependent field emission study of LaB6 coated Si nanowire arrays6
Strain-tuned optical properties of bilayer silicon at midinfrared wavelengths6
Erratum: “Electronic structure of InSb (001), (110), and (111)B surfaces” [J. Vac. Sci. Technol. B 41, 032808 (2023)]6
Influence of thermal contact resistance on the field emission characteristics of a carbon nanotube6
Behavior of the field enhancement due to mutual depolarization on a pair of triangular emitters at short and large separations6
Top electrode dependence of the write-once-read-many-times resistance switching in BiFeO3 films6
Physical vapor deposition simulator by graphical processor unit ray casting6
Fluorescence alignment simulation for atomic-scale position adjustment in ultraviolet nanoimprint lithography6
High quality factor silicon nitride nanomechanical resonators fabricated by maskless femtosecond laser micromachining6
Trilayer process for T-gate and Γ-gate lithography using ternary developer and proximity effect correction superposition6
Vacuum technique of nanodiamond dispersing on a substrate from an aqueous suspension6
In situ metrology of direct-write laser ablation using optical emission spectroscopy6
Investigation of the deposition of α-tantalum (110) films on a-plane sapphire substrate by molecular beam epitaxy for superconducting circuit6
Evolution of lithography-to-etch bias in multi-patterning processes5
Ion-beam-assisted growth of cesium-antimonide photocathodes5
Nonevaporable getter-MEMS for generating UHV conditions in small volumina5
Low-macroscopic field emission structure: Using the shape of the conductor to identify a local difference in electric potential5
Experimental research on airflow efficiency of dynamic gas lock for extreme ultraviolet lithography5
High-temperature characteristics of GaN/InGaN multiple-quantum-well UV photodetectors fabricated on sapphire substrate: Analysis of photovoltaic and carrier transit time properties5
E-mode AlGaN/GaN HEMTs using p-NiO gates5
In situ electron-beam-induced mechanical loading and fracture of suspended strained silicon nanowires5
Effect of the kinetic energy on particle ejection process from carbon nanotubes bombarded by kilo-electron-volt C605
A novel design of a retarding field electron energy analyzer with a cavity electrode providing extremely high energy resolution5
Sensitivity of thermal conductivity vacuum gauges for constant current and constant temperature operation5
Computational analysis of vertical comb-drive microactuator with extended mirror for manipulation of light5
In-plasma photo-assisted etching of Si with chlorine aided by an external vacuum ultraviolet source5
Comparing the properties and growth of graphene on electrolytic and rolled Cu foils by chemical vapor deposition5
Simplified CVD route to near-zero thickness silicon nitride films5
Fabrication of microstructures on curved hydrogel substrates5
Exploring electromechanical utility of GaAs interdigitated transducers; using finite-element-method-based parametric analysis and experimental comparison5
Modification of discharge sequences to control the random dispersion of flake particles during wafer etching5
Electron transport in macroscopic borosilicate capillaries with bending angles of 90° and 360°5
Comparison of temperature, current density, and light intensity distributions of nano-resistor patterns for an improved solid state incandescent light emitting device simulation model5
Rapid detection of radiation susceptible regions in electronics5
Si-capping-induced surface roughening on the strip structures of Ge selectively grown on an Si substrate5
Atomic-resolution lithography with an on-chip scanning tunneling microscope5
Degradation of GaN field emitter arrays induced by O2 exposure5
Morphology of Ge thin films crystallized by Au-induced layer exchange at low temperature (220 °C)5
Field electron emission and field ion microscope images of layered material MoS25
Response to “Comment on ‘Restoration of the original depth distribution from the SIMS profile using the depth resolution function in framework of RMR model’” [J. Vac. Sci. Technol. B 41, 024003 (205
Impact of electrical aging on x-ray image quality and dose rate with vertically aligned carbon nanotube based cold cathode electron beam (C-beam)5
Time response measurement of pulsed electron beam from InGaN photocathode5
Vacuum system of the Space Plasma Environment Research Facility5
Scanning electron microscope imaging by selective e-beaming using photoelectron beams from semiconductor photocathodes4
Heating samples to 2000 °C and above for scanning tunneling microscopy studies in ultrahigh vacuum4
Heat-transfer modeling of the gas gap under a wafer4
Thin films residual stress profile evaluation using test microstructures: Illustrated on an example of AlN film4
Fundamental study on the selective etching of SiGe and Si in ClF3 gas for nanosheet gate-all-around transistor manufacturing: A first principle study4
Fabrication of silicon W and G center embedded light-emitting diodes for electroluminescence4
Thank you to our 2024 reviewers!4
Surface wetting on micromilled and laser-etched aluminum with ion-beam postprocessing4
Strong-field electron emission from gold needle tips4
Organotrialkoxysilane-mediated synthesis of Ni–Pd nanocatalysts at lower concentrations of noble metal: Catalysts for faster hydrogen evolution kinetics4
Gradient-composition upper-waveguide and electron-blocking layers for enhanced performance in near-ultraviolet laser diodes4
Oxygen-free transport of samples in silane-doped inert gas atmospheres for surface analysis4
Comparative study of thermal desorption and pumping performance for TiZrV-, Pd-, or Pd/TiZrV-coated copper tubes4
Rapid preparation of amorphous Al2O3 on graphene surface by plasma electrolysis technology4
Does the blue luminescence of Eu-doped β-NaYF4 originate from Eu2+ ions?4
Multiple electron beam generation from InGaN photocathode4
Enzymatic degradation of cellulosic fabrics modified with atomic layer deposited aluminum oxide thin films4
Focusing electrode effect on the EUV lighting technology based on C-beam irradiation technique4
Near zero-field magnetoresistance and defects in gallium nitride pn junctions4
Thermal analysis with high accuracy of multi-beam mask fabrication4
Infrared optical properties of SiGeSn and GeSn layers grown by molecular beam epitaxy4
Diffusive separation in rarefied plume interaction4
Compositional dependence of direct transition energies in SixGe1−xySny alloys lattice-matched to Ge/GaAs4
Strain engineering in III-V photonic components through structuration of SiNx films4
Nanometer-scale capillary-driven flow and molecular weight govern polymer nanostructure deposition from a heated tip4
Atomic layer deposition of YSZ electrolytes for solid-state battery development: Beyond lithium4
Integrated interferometry for in-process monitoring of critical dimension in vertical NAND flash memory dry etch4
Using block-copolymer nanolithography as a tool to sensitively evaluate variation in chemical dry etching rates of semiconductor materials with sub-5 nm resolution4
Seesaw-type modulation of secondary electron emission characteristics of polytetrafluoroethylene-MgO composite coating4
Comparative research on the secondary electron yields and photon-stimulated desorption of Ti and Pd/Ti bilayer thin films4
Determining the oxygen detection limit with magnetic sector dynamic secondary ion mass spectrometry (SIMS)4
Exploring oxide-nitride-oxide scalloping behavior with small gap structure and chemical analysis after fluorocarbon or hydrofluorocarbon plasma processing4
Retraction: “Dependence of structural and optical properties of In0.23Ga0.77As/GaAs quantum wells on misfit dislocations: Different critical thickness for dislocation generation and degradation of opt4
Dynamic switching operation of diamond MOSFETs with NO2 p-type doping and Al2O3 gate insulation and passivation4
Electrochemically fabricated ultrafine nickel masks for the fabrication of MoS2-based devices4
Noise reduction and peak detection in x-ray diffraction data by linear and nonlinear methods4
Thermally stable radio frequency power and noise behaviors of AlGaN/GaN high electron mobility transistor without voltage-blocking buffer layer design4
Controlled preparation of tungsten diselenide thin films via chemical vapor deposition4
Electrical characterization of gate stack charge traps in floating body gate-all-around field-effect-transistors4
Synthesis of silver-decorated titanium dioxide nanostructured films for enhanced visible light photocatalysis4
Tapered quantum cascade lasers with isolated channel emitting at 9 μm4
Physical vapor deposition of Yb-doped Cs2AgSbBr6 films4
Synthesis of NiS2 nanomaterial as wide range pressure sensor4
Temperature dependence of the optical phonon reflection band in GaP4
In situ mass spectrometric investigation to probe GeSn growth dynamics and mechanisms in the chemical vapor deposition processes3
Effect of ultraviolet light on field emission performance and lifetime of lateral field emitter devices3
Understanding 3D anisotropic reactive ion etching of oxide-metal stacks3
Simulation analyses of carrier dynamics in npn-type GaN-heterojunction bipolar transistors with different hole-concentration p-base layers3
Thermal-field emission from cones and wires3
Electron emission properties of titanium nitride coated volcano-structured silicon emitters3
Investigation into the effect of a PECVD-deposited SiOx chamber coating on the selective, radical-based NF3 etching of TaN with respect to BEOL low-k3
Defect formation in InGaAs/AlSb/InAs memory devices3
Radiation damage in GaN/AlGaN and SiC electronic and photonic devices3
Photoinduced carrier transport mechanism in pn- and nn-GaN/GaON heterojunctions3
Secondary ion mass spectrometry quantification: Do you remember when a factor of 2 was good enough?3
Diagnostics of target-cavity confined plasmas produced by nanosecond pulsed laser ablation of graphite3
Reduction of exposing time in massively-parallel E-beam systems3
Selectively patterned Mg-doped GaN by SiNx-driven hydrogen injection3
Fabrication of ultrathin suspended membranes from atomic layer deposition films3
Bilayer metal etch mask strategy for deep diamond etching3
Optimization of silicon etch rate in a CF4/Ar/O2 inductively coupled plasma3
Effect of inductively coupled plasma etch on the interface barrier behavior of (001) β-Ga2O3 Schottky barrier diode3
Ordered silicon nanocone fabrication by using pseudo-Bosch process and maskless etching3
Wet and dry etching of ultrawide bandgap LiGa5O8 and LiGaO23
Roll-to-roll reactive ion etching of large-area nanostructure arrays in Si: Process development, characterization, and optimization3
Grain growth of Cu wires during Joule heat welding3
Multipurpose active scanning probe cantilevers for near-field spectroscopy, scanning tunnel imaging, and atomic-resolution lithography3
Hybrid cross correlation and line-scan alignment strategy for CMOS chips electron-beam lithography processing3
Preface for the Special Topic Collection Honoring Dr. Gary McGuire’s Research and Leadership as Editor of the Journal of Vacuum Science & Technology for Three Decades3
Novel excitation structure to improve the performance of a miniature radio frequency ion thruster3
High current field emission from Si nanowires on pillar structures3
Coaxial ion source: Pressure dependence of gas flow and field ion emission3
Optoelectronic performance characterization of MoS2 photodetectors for low frequency sensing applications3
Acquisition of field ion microscope image using deflector during atom probe analysis3
Postdeposition annealing effect on atomic-layer-deposited Al2O3 gate insulator on (001) β-Ga2O33
Measurements of He-Ar, He-N2, and He-air thermal creep slip and accommodation coefficients at high temperatures3
Evaluation of dry stored disposable sensor strip on rapid SARS-CoV-2 detection platform3
Investigating the pattern transfer fidelity of Norland Optical Adhesive 81 for nanogrooves by microtransfer molding3
On the charge density and potential near the surface of a field emitter3
Rapid SARS-CoV-2 diagnosis using disposable strips and a metal-oxide-semiconductor field-effect transistor platform3
Design, modeling, and fabrication of high frequency Oersted lines for electron spin manipulation in silicon based quantum devices3
Monitoring of rapid thermal anneal with secondary ion mass spectrometry3
Role of tin clustering in band structure and thermodynamic stability of GeSn by atomistic modeling3
Low power silicon evaporation source—Construction, performances, and applications3
Effects of H+ ion bombardment on GaAs photocathode surface with Cs-O and Cs-F activation layers3
Endoscope-assisted manipulator for precooling and deposition in low-temperature scanning tunneling microscope systems3
Analytic study of exposure contrast over feature edge in electron-beam lithography3
Gate offset and emitter design effects of triode cold cathode electron beams on focal spot sizes for x-ray imaging techniques3
Modeling and algorithm of three-dimensional metrology with critical dimension scanning electron microscope3
Morphologic and electronic changes induced by thermally supported hydrogen cleaning of GaAs(110) facets3
Leakage rate detection of ConFlat seals in aluminum and stainless steel flanges under mechanical loads for quantum optical experiments in space3
Multiple material stack grayscale patterning using electron-beam lithography and a single plasma etching step3
Novel low-temperature and high-flux hydrogen plasma source for extreme-ultraviolet lithography applications3
Self-aligned fabrication of vertical, fin-based structures3
Microstructure, creep properties, and electrical resistivity of magnetron sputtering deposited SAC305 thin films3
Physics based model of an AlGaN/GaN vacuum field effect transistor3
Hardmask engineering by mask encapsulation for enabling next generation reactive ion etch scaling3
Overlay control solution for high aspect ratio etch process induced overlay error3
Investigating pathways for deep-UV photolithography of large-area nanopost-based metasurfaces with high feature-size contrast3
Development of GeSn epitaxial films with strong direct bandgap luminescence in the mid-wave infrared region using a commercial chemical vapor deposition reactor3
Review on remote phonon scattering in transistors with metal-oxide-semiconductor structures adopting high-k gate dielectrics2
Depth-resolved cathodoluminescence and surface photovoltage spectroscopies of gallium vacancies in β-Ga2O3 with neutron irradiation and forming gas anneals2
Fabrication of blazed gratings by tilted reactive ion beam etching with the side mask for augmented reality applications2
Magnetron co-sputtered μm-thick Mo–Cu films as structural material with low heat extension for key parts of high-power millimeter-band vacuum microelectronic devices2
Generalized performance optimization for massively-parallel electron-beam systems2
Design and fabrication of a micro-opto-mechanical-systems accelerometer based on intensity modulation of light fabricated by a modified deep-reactive-ion-etching process using silicon-on-insulator waf2
Computational study of mechanical stresses in a cell interacting with micromechanical cues and microfabrication of such cues in Nervous system-on-Chips2
Measurement of field emission array current distributions by metal-coated CMOS image sensors2
Role of dose optimization in Ru atomic layer deposition for low resistivity films2
Nanofabricating neural networks: Strategies, advances, and challenges2
Structure optimization of Spindt-type emitter fabricated by triode high power pulsed magnetron sputtering2
Optical metrology of characterizing wetting states2
Influence of the Cl2 etching on the Al2O3/GaN metal–oxide–semiconductor interface2
Threshold switching stabilization of NbO2 films via nanoscale devices2
High-performance normally off AlGaN/GaN high electron mobility transistor with p-type h-BN cap layer2
Long term field emission current stability characterization of planar field emitter devices2
Joule heating of an emitter on the cathode surface by field electron emission current with an account of the nonisolation of the apex2
Calibrated in-vacuum quantum efficiency system for metallic and III-V thin-film photocathodes2
Film characteristics of atmospheric pressure plasma-treated chitosan solution2
Investigation on the heat transfer characteristics of flexible vacuum glass based on cross-laminated microcavities2
Large-area fabrication of nanometer-scale features on GaN using e-beam lithography2
Hafnium oxide films grown on silicon substrates by electron beam-induced deposition2
Rate-controlled cycle etching of GaN by cycle exposure to BCl3 and F2-added Ar plasma at a substrate temperature of 400 °C2
Operational experiences and upgrade of China Spallation Neutron Source Linac vacuum system2
Facile fabrication of nanoporous structure on β titanium alloy to eliminate stress shielding for bone implant2
Volatile vapor knife of immersion lithography hood using solutal Marangoni effect2
Viability of HFO-1234ze(E) (trans-1,3,3,3-tetrafluoropropene) as a low global warming potential silicon dioxide etch gas2
Design and large-scale nanofabrication of plasmonic solar light absorbers2
A novel thermionic crystal electron emission effect similar to Kikuchi lines2
Enhanced optoelectronic properties of magnetron sputtered ITO/Ag/ITO multilayers by electro-annealing2
Thermal sensitivity and current-voltage-temperature characteristics in Pt/epitaxy n-Si/n+Si structures as a function of Schottky contact area2
Proposal that interpretation of field emission current–voltage characteristics should be treated as a specialized form of electrical engineering2
Rapid prototyping of etch test structures for hard mask development using electron beam lithography2
Optical properties of Mo and amorphous MoOx, and application to antireflection coatings for metals2
Practical guide for in-house solid-state nanopore fabrication and characterization2
Effects of gases on the field emission performance of silicon gated field emitter array2
Rubidium focused ion beam induced platinum deposition2
Integrated silicon electron source for high vacuum microelectromechanical system devices2
Study on the etching mechanism of quartz using dual-frequency (60 MHz/400 KHz) capacitively coupled C4F8/Ar/O2 plasma2
In situ plasma pin-up clean process for backside bevel polymer removal, defect reduction, and queue time relaxation2
Field emission: Applying the “magic emitter” validity test to a recent paper, and related research-literature integrity issues2
Quantum efficiency characteristics of low-threading-dislocation-density InGaN photocathode grown on GaN substrate2
In situ monitoring of sapphire nanostructure etching using optical emission spectroscopy2
On the origins of the m/z = 19 signals in residual gas analysis2
Zr-Al 16 wt. % and Na2CrO4 composite particles used for Na dispenser and its reaction kinetic2
Supercapacitor characteristics of MoS2 and MoOx coated onto honeycomb-shaped carbon nanotubes2
Model for the current plateau observed on the (310) plane of a room temperature W field electron source2
On the origin and evolution of hotspots in multipatterning processes2
Piezoelectric effect of crystal nanodomains on the friction force2
Inelastic cotunneling in the Coulomb-blockade transport of donor-atom transistors2
Heat transfer mechanism of electrostatic chuck surface and wafer backside to improve wafer temperature uniformity2
Novel wet transfer technology of manufacturing flexible suspended two-dimensional material devices2
Novel process integration flow of germanium-on-silicon FinFETs for low-power technologies2
Close-packed silicon field emitter arrays with integrated anode fabricated by electron-beam lithography2
4H-SiC layer with multiple trenches in lateral double-diffused metal-oxide-semiconductor transistors for high temperature and high voltage applications2
Surface treatment of carbon fiber reinforced polymer for adhesive bonding with pioneer epoxy using atmospheric pressure plasma jet2
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