Journal of Vacuum Science & Technology B

Papers
(The TQCC of Journal of Vacuum Science & Technology B is 3. The table below lists those papers that are above that threshold based on CrossRef citation counts [max. 250 papers]. The publications cover those that have been published in the past four years, i.e., from 2021-12-01 to 2025-12-01.)
ArticleCitations
Simplifying in vacuo optical measurements of CVD processes using vacuum-compatible optical fibers80
Stacked hydrogel-based brain-on-chips utilizing capillary force flow pinning32
Thickness dependent field emission study of LaB6 coated Si nanowire arrays25
Heating samples to 2000 °C and above for scanning tunneling microscopy studies in ultrahigh vacuum23
Secondary ion mass spectrometry as a tool to analyze semiconductor opening switch diodes18
In-plasma photo-assisted etching of Si with chlorine aided by an external vacuum ultraviolet source18
Current–voltage characteristics of Ag/Nb:SrTiO3/Ag and Au/Nb:SrTiO3/Ag heterostructures15
In situ electron-beam-induced mechanical loading and fracture of suspended strained silicon nanowires14
Top electrode dependence of the write-once-read-many-times resistance switching in BiFeO3 films14
Numerical analysis of high vacuum packaging efficiency for narrow structured devices14
Photoassisted electron emission from planar-type electron source based on graphene/oxide/silicon structure13
Angular emission evolution of the ZrO/W(100) Schottky emitter13
Numerical simulations of heterojunction GaN nanopillar light emitting diodes12
Scanning electron microscope imaging by selective e-beaming using photoelectron beams from semiconductor photocathodes12
Broadband optical enhancement of suspended Ge-on-Si infrared absorbers by using backside etching holes and a metallic reflector11
Tungsten oxide nanowires prepared by thermal oxidation for application in cold cathode flat panel x-ray source11
Exploring oxide-nitride-oxide scalloping behavior with small gap structure and chemical analysis after fluorocarbon or hydrofluorocarbon plasma processing11
Comparing the properties and growth of graphene on electrolytic and rolled Cu foils by chemical vapor deposition11
High quality factor silicon nitride nanomechanical resonators fabricated by maskless femtosecond laser micromachining10
Wet and dry etching of ultrawide bandgap LiGa5O8 and LiGaO210
Influence of thermal contact resistance on the field emission characteristics of a carbon nanotube10
Novel excitation structure to improve the performance of a miniature radio frequency ion thruster10
Understanding 3D anisotropic reactive ion etching of oxide-metal stacks9
Investigation on the heat transfer characteristics of flexible vacuum glass based on cross-laminated microcavities9
Investigation into the effect of a PECVD-deposited SiOx chamber coating on the selective, radical-based NF3 etching of TaN with respect to BEOL low-k9
Effect of inductively coupled plasma etch on the interface barrier behavior of (001) β-Ga2O3 Schottky barrier diode9
Fabrication of silicon W and G center embedded light-emitting diodes for electroluminescence9
Effect of ultraviolet light on field emission performance and lifetime of lateral field emitter devices9
Effect of glow cleaning bias voltage on microstructure and properties of ion nitriding/multiarc ion plating CrTiAlN composite coatings9
Effect of the TiN-coating-layer properties on the electron emission of volcano-structured silicon field emitter arrays9
Novel process integration flow of germanium-on-silicon FinFETs for low-power technologies9
Compositional dependence of direct transition energies in SixGe1−xySny alloys lattice-matched to Ge/GaAs9
Methods for automatically obtaining the sputtering-induced roughness upon depth profiling of polycrystalline films8
Evaluation of dry stored disposable sensor strip on rapid SARS-CoV-2 detection platform8
Study of zinc doped In0.53Ga0.47As/InP/InAlAs/InP heterostructures by time-of-flight; magnetic secondary ion spectrometry and high-energy x-ray photoelectron spectroscopy8
Piezoelectric effect of crystal nanodomains on the friction force8
Effects of athermal carrier injection on Co-60 gamma-ray damage in SiC merged-PiN Schottky diodes8
Deep cryogenic silicon etching for 3D integrated capacitors: A numerical perspective8
Heat transfer mechanism of electrostatic chuck surface and wafer backside to improve wafer temperature uniformity8
Accelerating multiple patterning lithography layout decomposition with a stochastic analog Boolean satisfiability solver8
Fluorescent flow analysis of in situ material exchange in two-photon 3D printing8
Computational study of mechanical stresses in a cell interacting with micromechanical cues and microfabrication of such cues in Nervous system-on-Chips8
Practical guide for in-house solid-state nanopore fabrication and characterization8
Correction model for photoresist shrinkage in critical dimension scanning electron microscopy based on improved spider wasp optimizer—Optimized support vector regression8
Overlay control solution for high aspect ratio etch process induced overlay error8
Electron emission properties of titanium nitride coated volcano-structured silicon emitters8
Resistive switching of two-dimensional Ag2S nanowire networks for neuromorphic applications8
Investigation of polymer template removal techniques in three-dimensional thin-shell nanolattices7
Novel wet transfer technology of manufacturing flexible suspended two-dimensional material devices7
Dry etching characteristics of titanium dioxide grown by different physical vapor deposition processes7
Outgassing rate testbed for in-operation analysis of powered and heated assemblies7
Absolute measurement of vacuum ultraviolet photon flux in an inductively coupled plasma using a Au thin film7
Numerical analysis of Gaussian potential patches model depending on the substrate doping in inhomogeneous Schottky barrier diodes over a wide temperature range7
Digital biosensor for human cerebrospinal fluid detection with single-use sensing strips7
In-depth feasibility study of extreme ultraviolet damascene extension: Patterning, dielectric etch, and metallization7
Silicon etching by chlorine plasma: Validation of surface reactions mechanism7
Selective growth of graphene films on gallium-focused ion beam irradiated domains7
All field emission models are wrong, … but are any of them useful?7
Influence of O content on exothermic and self-propagating characteristics of Ti/SiOx multilayer films6
Efficient plasma-surface interaction surrogate model for sputtering processes based on autoencoder neural networks6
Combined ultraviolet- and electron-beam lithography with Micro-Resist-Technology GmbH ma-N1400 resist6
Electrical characteristics of tungsten-doped InZnSnO thin film transistors by RF magnetron sputtering6
Nanofabricating neural networks: Strategies, advances, and challenges6
Numerical simulation study of the flow and diffusion characteristics of trace gas in a gas mixture based on the ellipsoidal statistical Bhatnagar–Gross–Krook model6
Maximizing the performance of a field emission device by profiling the emitter’s height distribution6
Realizing GaN-based blue laser diode with 7.5 W output power via electron blocking layer thickness adjustment6
Characteristics of a hybrid radio frequency capacitively and inductively coupled plasma using hydrogen gas6
Preface to the Special Topic Collection Celebrating the Achievements and Life of Paul H. Holloway6
Characterization of TaxO5−y thin films grown by HiPIMS reactive sputtering for temperature sensing applications6
Dysprosium liquid metal alloy ion source for magnetic nanostructures6
Study of the structural and electronic properties of Zn1−x−yMgxTiyO structures6
Fabrication of sub-micrometer 3D structures for terahertz oscillators by electron beam gray-tone lithography6
Through-chip porous layer fabrication by plasma etching with protective film deposition6
Micromirror fabrication for co-packaged optics using 3D nanoimprint technology6
Effect of water vapor pressure on positive and negative tone electron-beam patterning of poly(methyl methacrylate)6
Enhancement of electrical properties of a-IGZO thin film transistor by low temperature (150 °C) microwave annealing for flexible electronics6
Effects of high-temperature annealing on vacancy complexes and luminescence properties in multilayer periodic structures with elastically strained GeSiSn layers6
Vertical silicon nanowedge formation by repetitive dry and wet anisotropic etching combined with 3D self-aligned sidewall nanopatterning6
Electrochemical pipette-based analysis on anisotropy in rutile TiO2 for photoelectrochemical hydrogen revolution6
Predicting the effects of plasma-induced damage on p–n junction leakage and its application in the characterization of defect distribution6
Scanning anode field emission microscopy of a single Si emitter6
Chaos-enhanced self-adaptive particle swarm optimization with simulated annealing for digital lithography mask optimization6
Microsphere photolithography using reusable microsphere array mask for low-cost infrared metasurface fabrication6
High-precision CD extraction for silver-layered photoresists using Monte Carlo simulation6
Interfacial reactivity in the Co/CuO samples as investigated by x-ray photoelectron spectroscopy6
Effect of atomic-scale microstructures on TiZrV non-evaporable getter film activation6
Effect of low-pressure postannealing on the electrical properties of VO2 thin films5
Effect of substrate rotation speed on AlGaN nanowire deep ultraviolet light-emitting diodes by molecular beam epitaxy5
Electrochemical bulk and film-type oxygen sensors: Strategies for detecting extremely low concentration in hydrogen environments5
Novel surface wave technique for moderate-pressure plasma measurements5
Impact of interparticle contact on discharge capacity in all-solid-state batteries: A 3D simulation approach5
Investigation of Rb+ milling rates using an ultracold focused ion beam5
Metal-pattern preparation based on selective deposition using soft organofluorine surfaces5
Plasma confinement by an optoelectronic system5
Novel inspection technology for detecting via open using parallel e-beam scanning and graphic design system5
Effect of quality improvement in active region on temperature characteristics of GaN-based ultraviolet laser diode5
Membrane-electrode junction properties for optimum potentiometric hydrogen sensor response5
Suppressing oxygen vacancy formation in ZrO2 to improve electrical properties by employing MoO2 bottom electrode5
Tailoring of structual, optical, and electrical properties of Cu films by sputtering power and deposition atmosphere5
Fabrication of plasmonic Au nanostructures on dielectric supports using 10 keV electron beam lithography and tests for SERS biodetection5
Spectro-ellipsometric probing of wetting, nucleation, and dot/island formation during photo-excited chemical vapor deposition of Ge on SiO2 substrate5
Improved optical and electrical response by glancing angle synthesized Al2O3 nanorod array device5
Yellow luminescence band defect related photocurrent instability of GaN p-i-n ultraviolet photodetectors5
Transferable GeSn ribbon photodetectors for high-speed short-wave infrared photonic applications5
Multiplicity features of carbon nanotube emitters5
Spatial variation of the elemental components of thin films from BiSrCaCuO target deposited using low energy femtosecond pulsed laser deposition in high background gas pressure5
High-precision thermal characterization technique with dual-laser Raman thermometry5
Si nanocone structure fabricated by a relatively high-pressure hydrogen plasma in the range of 3.3–27 kPa5
Electrochemical imaging correlated to hydrogen evolution reaction on transition metal dichalcogenide, WS25
AC thin-film electroluminescence: A historical overview with a look ahead5
New approach of local critical dimension uniformity improvement for via/contact hole etch with direct current superposition5
Characterization of pulsed laser deposited La2O2S:Eu3+ thin films and effect of coating with graphene oxide layers5
Experimental investigation of the feasibility of in situ plasma cleaning in normal-conducting copper cavities5
Improved impedance matching speed with gradient descent for advanced RF plasma system5
Analysis for roughness-generation mechanism in Ru etching using Cl2/O2-based plasma for advanced interconnect5
All field emission experiments are noisy, … are any meaningful?5
Improvement of electrical characteristics of flexible AZO/Ag/Cu/AZO transparent conductive films by Cu deposition5
Structural, surface, and upconversion luminescence properties of pulsed laser-deposited Y2O3:Ho3+,Yb3+ thin films5
High off-state voltage (4266 V) diamond metal oxide semiconductor field effect transistors5
Retraction: “Fabry–Perot-cavity-based refractometry without influence of mirror penetration depth” [J. Vac. Sci. Technol. B 39, 065001 (2021)]5
Investigation of tilted etching of Si3N4 using CF4/O2 plasma: Process development and mechanism study5
Novel approach for KrF chemically amplified resist optimization assisted by deep learning5
Measuring and understanding the nanomechanical properties of halide perovskites and their correlation to structure—A perspective5
Method for monitoring high aspect ratio contact dry etching process using calibration and normalization method for optical emission spectroscopy5
Design of plasma strip chamber for uniform gas supply with fluid flow simulation5
Transition from the regime of thermionic emission to the space-charge limited current regime under strong Shottky effects5
TiN and TaN cointegration for 300 mm superconducting back end of line5
Thermal evaporation of thin Li films5
Nondestructive x-ray reflectivity analysis of Al distributions of ultraviolet-cured spin-coated resist films hybridized with trimethylaluminum5
Enhancement in neuromorphic NbO2 threshold switching at cryogenic temperatures5
Study of simulations of double graded InGaN solar cell structures5
Fabrication of ultrahigh aspect ratio Si nanopillar and nanocone arrays4
Thermal sensitivity and current-voltage-temperature characteristics in Pt/epitaxy n-Si/n+Si structures as a function of Schottky contact area4
Study on the etching mechanism of quartz using dual-frequency (60 MHz/400 KHz) capacitively coupled C4F8/Ar/O2 plasma4
Effects of gases on the field emission performance of silicon gated field emitter array4
Effect of the kinetic energy on particle ejection process from carbon nanotubes bombarded by kilo-electron-volt C604
Research on the improvement of the adhesion strength of the Cu films deposited on the Al2O3 films4
Thank you to our 2024 reviewers!4
Soft and hard trimming of imprint resist masks to fabricate silicon nanodisk arrays with different edge roughness4
Selective wet etching of atomic layer deposited ferroelectric hafnium zirconium oxide and hafnium oxide thin films4
Dynamic switching operation of diamond MOSFETs with NO2 p-type doping and Al2O3 gate insulation and passivation4
Infrared optical properties of SiGeSn and GeSn layers grown by molecular beam epitaxy4
4H-SiC layer with multiple trenches in lateral double-diffused metal-oxide-semiconductor transistors for high temperature and high voltage applications4
Selectively patterned Mg-doped GaN by SiNx-driven hydrogen injection4
Integrated silicon electron source for high vacuum microelectromechanical system devices4
Experimental study of flake graphite large-area explosion electron emission cathode performance based on particle size discrepancy4
Heating of Cs2Te photocathode via field emission and radiofrequency pulsed heating: Implication toward breakdown4
Characterization of iron-based alloy catalysts for atmospheric pressure chemical vapor deposition of carbon nanofibers via in situ transmission electron microscopy4
Evolution of lithography-to-etch bias in multi-patterning processes4
Optical and electronic spin properties of fluorescent micro- and nanodiamonds upon prolonged ultrahigh-temperature annealing4
Roughness-generation mechanism of Ru etching using Cl2/O2-based plasma for advanced interconnect4
Role of tin clustering in band structure and thermodynamic stability of GeSn by atomistic modeling4
Optimization of silicon etch rate in a CF4/Ar/O2 inductively coupled plasma4
Physics based model of an AlGaN/GaN vacuum field effect transistor4
In situ mass spectrometric investigation to probe GeSn growth dynamics and mechanisms in the chemical vapor deposition processes4
Hybrid cross correlation and line-scan alignment strategy for CMOS chips electron-beam lithography processing4
Morphology of Ge thin films crystallized by Au-induced layer exchange at low temperature (220 °C)4
MeV proton and neutron damage effects on deep-ultraviolet light-emitting diodes4
Experimental current-voltage-temperature and thermal sensitivity behaviors of an ideal Schottky barrier diode over a wide temperature range4
Enhancing plasma uniformity in SiH4/NH3 capacitively coupled plasmas via dielectric structure adjustment positioning adjacent to the power electrode4
Magnetized, radiofrequency-driven hollow cathode chemical-vapor deposition of ultrathick hydrogenated amorphous carbon4
Magnetron co-sputtered μm-thick Mo–Cu films as structural material with low heat extension for key parts of high-power millimeter-band vacuum microelectronic devices4
Grain growth of Cu wires during Joule heat welding4
Magneto-transport study on Sn-rich Sn1−xGex thin films enabled by CdTe buffer layer3
Physical modeling of side wall deposition by inclined electron beam evaporation3
Machine learning aided optimization of drag pump performance3
Self-alignment of whole wafers using patterning for capillary forces3
On the brightness, transverse emittance, and transverse coherence of field emission beam3
Effects of ion implantation with arsenic and boron in germanium-tin layers3
Resistivity improvement of flexible transparent conductive films with Cu inserted intermediate layer3
Synthesis and characterization of electron beam irradiation-induced damage in polycrystalline metal thin films3
Cryomicroscopy of low melting point metals3
Fabrication and characteristics of double-gate zinc oxide nanowire field emitter arrays3
Direct writing immersion laser lithography on graphene monolayers using two-photon absorption3
Miniature plasma source for in situ extreme ultraviolet lithographic scanner cleaning3
Comparison of surface morphology and roughness of silicon surfaces etched using pulsed and continuous flow XeF3
Hybrid sputtering approach for reliable TOF-SIMS depth profiling of inorganic–organic multilayer films3
Zernike model for overlay control and tool monitor for lithography and etch process3
Experimental considerations in electron beam transport on a nanophotonic chip using alternating phase focusing3
Mitigation of electronic crosstalk interference in graphene transistor biosensors3
3D structure of box-and-grid electron multiplier with higher electron collection efficiency3
Extreme contact shrink for back end of line connectivity3
Identification of dust particles on a periodic nanostructured substrate using scanning electron microscope imaging3
Growth of CdS heterojunctions on Cd0.9Zn0.1Te single crystals with H2S3
Ferroelectricity in amorphous aluminum oxynitride films synthesized by inductively coupled plasma assisted atomic layer deposition3
Atmospheric pressure plasma treatment of chitosan-acrylic acid blends3
Structure optimization of Spindt-type emitter fabricated by triode high power pulsed magnetron sputtering3
Solar-thermal cold-wall chemical vapor deposition reactor design and characterization for graphene synthesis3
Long, stitch-free slot waveguide with s-bend tapered couplers for IR-sensing applications using electron beam lithography3
Shape tuning of large area silicon nanotip arrays through reactive ion etching3
Phase-shifted counterpropagating atmospheric pressure plasma jets: Characterization and interaction with materials3
Plasmon resonance-based study of the peroxidaselike catalytic effect of gold nanoparticles3
Permeation of oxygen and water into a plasma-enhanced chemical vapor deposited silicon nitride film as function of deposition pressure3
Is the linear relationship between the slope and intercept observed in field emission S-K plots an artifact?3
Multiple connected artificial synapses based on electromigrated Au nanogaps3
Role of the oxidation conditions on the orientation of TiNxOy grown by atomic layer deposition: Impact on the optical and electrical properties3
High sensitivity CIP2A detection for oral cancer using a rapid transistor-based biosensor module3
Bilayer metal etch mask strategy for deep diamond etching3
Epitaxial SiGeSn grown on Si by ion implantation3
Secondary ion mass spectrometry analysis of metal oxides using 70 keV argon, carbon dioxide, and water gas cluster ion beams3
Plasma enhanced activation of ion implanted dopants3
Effects of iCVD organic passivation in oxide thin-film transistors under repetitive bending stress for electrical and mechanical stability3
Negative differential resistance in photoassisted field emission from Si nanowires3
Future of plasma etching for microelectronics: Challenges and opportunities3
Cost-effective fabrication of RF AlGaN/GaN HEMTs on surface activated bonding-bonded SiC-SiC substrate3
Depth-resolved characterization of mechanically weakened surface layers in vacuum ultraviolet-irradiated cycloolefin polymer films using micro slurry-jet erosion test and ToF-SIMS analysis3
Effect of sputter power on red-shifted optoelectronic properties in magnetron sputtered Ag/ZnO thin films3
Thermal sensing capability and current–voltage–temperature characteristics in Pt/n-GaP/Al/Ti Schottky diodes3
Molecular dynamics study of silicon atomic layer etching by chlorine gas and argon ions3
Desorption model of volatile Ru species induced by partial chlorination on Ru(0001) under an O2/Cl2-based plasma process3
Influence of electron beam irradiation on nanoscale adhesion during colloidal probe experiments inside the scanning electron microscope3
High current silicon nanowire field emitter arrays3
Tracing degradation mechanisms of epitaxially grown GaAsSb on InP by InSb formation at elevated temperatures3
Real-time determination of sputtered TiC film composition using optical emission spectroscopy3
Honeycomb-shaped vertically aligned carbon nanotubes decorated with molybdenum trioxide as an electrochemical sensor for glucose3
Controlling the etch selectivity of silicon using low-RF power HBr reactive ion etching3
Nanoimprint lithography guiding templates for advanced magnetic media fabrication3
Cluster-induced desorption/ionization mass spectrometry of Ir(ppy)33
Systematic study of InP/InGaAsP heated plasma etching and roughness improvement for integrated optical devices3
Thermochemical prediction of runaway energetic reactions involving organometallic (Al, In) and silane precursors in deposition tools3
Molecular beam epitaxy growth and characterization of GePb alloys3
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